JPH0346333Y2 - - Google Patents
Info
- Publication number
- JPH0346333Y2 JPH0346333Y2 JP7333283U JP7333283U JPH0346333Y2 JP H0346333 Y2 JPH0346333 Y2 JP H0346333Y2 JP 7333283 U JP7333283 U JP 7333283U JP 7333283 U JP7333283 U JP 7333283U JP H0346333 Y2 JPH0346333 Y2 JP H0346333Y2
- Authority
- JP
- Japan
- Prior art keywords
- ferromagnetic thin
- thin film
- detection
- magnetic sensor
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 79
- 230000005294 ferromagnetic effect Effects 0.000 claims description 77
- 238000001514 detection method Methods 0.000 claims description 71
- 239000000758 substrate Substances 0.000 claims description 43
- 230000005291 magnetic effect Effects 0.000 claims description 41
- 239000010410 layer Substances 0.000 claims description 5
- 239000011241 protective layer Substances 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005405 multipole Effects 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000001947 vapour-phase growth Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910000914 Mn alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000008642 heat stress Effects 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- ZAUUZASCMSWKGX-UHFFFAOYSA-N manganese nickel Chemical compound [Mn].[Ni] ZAUUZASCMSWKGX-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- BSIDXUHWUKTRQL-UHFFFAOYSA-N nickel palladium Chemical compound [Ni].[Pd] BSIDXUHWUKTRQL-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Measuring Magnetic Variables (AREA)
- Transmission And Conversion Of Sensor Element Output (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7333283U JPS59179321U (ja) | 1983-05-17 | 1983-05-17 | 磁気センサ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7333283U JPS59179321U (ja) | 1983-05-17 | 1983-05-17 | 磁気センサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59179321U JPS59179321U (ja) | 1984-11-30 |
| JPH0346333Y2 true JPH0346333Y2 (en, 2012) | 1991-09-30 |
Family
ID=30203459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7333283U Granted JPS59179321U (ja) | 1983-05-17 | 1983-05-17 | 磁気センサ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59179321U (en, 2012) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2572139B2 (ja) * | 1990-01-25 | 1997-01-16 | 旭化成工業株式会社 | 磁気抵抗センサー |
| JP4178006B2 (ja) * | 2002-07-25 | 2008-11-12 | 朝日電装株式会社 | 角度センサ |
-
1983
- 1983-05-17 JP JP7333283U patent/JPS59179321U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59179321U (ja) | 1984-11-30 |
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