JPH0344420B2 - - Google Patents
Info
- Publication number
- JPH0344420B2 JPH0344420B2 JP61197208A JP19720886A JPH0344420B2 JP H0344420 B2 JPH0344420 B2 JP H0344420B2 JP 61197208 A JP61197208 A JP 61197208A JP 19720886 A JP19720886 A JP 19720886A JP H0344420 B2 JPH0344420 B2 JP H0344420B2
- Authority
- JP
- Japan
- Prior art keywords
- buried layer
- semiconductor integrated
- semiconductor device
- trench
- collector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 14
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 12
- 229920005591 polysilicon Polymers 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 238000000926 separation method Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 5
- 238000005468 ion implantation Methods 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 238000001020 plasma etching Methods 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 6
- 238000002955 isolation Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19720886A JPS6354741A (ja) | 1986-08-25 | 1986-08-25 | 半導体集積装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19720886A JPS6354741A (ja) | 1986-08-25 | 1986-08-25 | 半導体集積装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6354741A JPS6354741A (ja) | 1988-03-09 |
| JPH0344420B2 true JPH0344420B2 (de) | 1991-07-05 |
Family
ID=16370620
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19720886A Granted JPS6354741A (ja) | 1986-08-25 | 1986-08-25 | 半導体集積装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6354741A (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02183552A (ja) * | 1989-01-09 | 1990-07-18 | Nec Corp | 集積回路の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57113267A (en) * | 1980-11-19 | 1982-07-14 | Ibm | Method of producing semiconductor device |
-
1986
- 1986-08-25 JP JP19720886A patent/JPS6354741A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57113267A (en) * | 1980-11-19 | 1982-07-14 | Ibm | Method of producing semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6354741A (ja) | 1988-03-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |