JPH0343229Y2 - - Google Patents
Info
- Publication number
- JPH0343229Y2 JPH0343229Y2 JP3189787U JP3189787U JPH0343229Y2 JP H0343229 Y2 JPH0343229 Y2 JP H0343229Y2 JP 3189787 U JP3189787 U JP 3189787U JP 3189787 U JP3189787 U JP 3189787U JP H0343229 Y2 JPH0343229 Y2 JP H0343229Y2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- lid
- graphite
- outer crucible
- inner crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3189787U JPH0343229Y2 (enrdf_load_stackoverflow) | 1987-03-06 | 1987-03-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3189787U JPH0343229Y2 (enrdf_load_stackoverflow) | 1987-03-06 | 1987-03-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63139497U JPS63139497U (enrdf_load_stackoverflow) | 1988-09-13 |
JPH0343229Y2 true JPH0343229Y2 (enrdf_load_stackoverflow) | 1991-09-10 |
Family
ID=30838055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3189787U Expired JPH0343229Y2 (enrdf_load_stackoverflow) | 1987-03-06 | 1987-03-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0343229Y2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100375341B1 (ko) * | 2000-08-18 | 2003-03-10 | 대백신소재주식회사 | 흑연화 처리용 도가니 |
JP7291197B2 (ja) * | 2021-07-15 | 2023-06-14 | キヤノントッキ株式会社 | 成膜装置、成膜方法及び蒸発源ユニット |
-
1987
- 1987-03-06 JP JP3189787U patent/JPH0343229Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS63139497U (enrdf_load_stackoverflow) | 1988-09-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5941510B2 (ja) | 酸化ベリリウム膜とその形成方法 | |
US4828870A (en) | Method of forming a thin aluminum film | |
US3925187A (en) | Apparatus for the formation of coatings on a substratum | |
US5079224A (en) | Production method of superconductive thin film and a device thereof | |
JPH0343229Y2 (enrdf_load_stackoverflow) | ||
JPS63137159A (ja) | 結晶性金属薄膜の形成方法 | |
JPS6063372A (ja) | 高硬度窒化ホウ素薄膜の製造方法 | |
JPS5919190B2 (ja) | 鉛皮膜の製造方法 | |
JPH0456761A (ja) | 薄膜形成装置 | |
JPH0259862B2 (enrdf_load_stackoverflow) | ||
Nakamura et al. | Synthesis of aluminium nitride thin films by ion-vapour deposition method | |
JPS6134173A (ja) | 高硬度窒化ホウ素膜の製造方法 | |
JPS63211594A (ja) | 蛍光体薄膜の製造装置 | |
JPS60181262A (ja) | 高硬度窒化ホウ素膜の製造方法 | |
JP2003282557A (ja) | 成膜方法 | |
JPS63202889A (ja) | 蛍光体薄膜の製造方法および装置 | |
JPH01119663A (ja) | 薄膜形成装置 | |
JPH08288273A (ja) | TiNバリア膜の製造方法およびその装置 | |
JP2004011007A (ja) | 成膜方法 | |
JPS63213664A (ja) | イオンプレ−テイング装置 | |
JPS63307261A (ja) | 薄膜形成装置 | |
JPS6017070A (ja) | 薄膜形成方法及びその装置 | |
JPH0586474B2 (enrdf_load_stackoverflow) | ||
JP2002226969A (ja) | 超伝導膜の形成方法及び形成装置 | |
JPS62247571A (ja) | Mos形半導体装置の製造方法 |