JPH033733U - - Google Patents
Info
- Publication number
- JPH033733U JPH033733U JP6407589U JP6407589U JPH033733U JP H033733 U JPH033733 U JP H033733U JP 6407589 U JP6407589 U JP 6407589U JP 6407589 U JP6407589 U JP 6407589U JP H033733 U JPH033733 U JP H033733U
- Authority
- JP
- Japan
- Prior art keywords
- gas introduction
- ceiling
- reaction chamber
- reaction gas
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012495 reaction gas Substances 0.000 claims 2
- 238000009792 diffusion process Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 239000000376 reactant Substances 0.000 description 1
Description
第１図は本考案の一実施例を示す骨子図、第２
図は該実施例でウエーハを処理した場合の生成膜
膜厚分布図、第３図は従来例を示す骨子図、第４
図は該従来例でウエーハを処理した場合の生成膜
膜厚分布図である。
３……反応室、６，６ａ，６ｂ……ウエーハ、
９……天井、１０……反応ガス導入路、１１……
ガス導入口を示す。
Figure 1 is a schematic diagram showing one embodiment of the present invention, Figure 2
The figure is a distribution diagram of the film thickness produced when a wafer is processed in this embodiment, Figure 3 is a schematic diagram showing the conventional example, and Figure 4
The figure is a film thickness distribution diagram of a produced film when a wafer is processed in the conventional example. 3... Reaction chamber, 6, 6a, 6b... Wafer,
9...Ceiling, 10...Reactant gas introduction channel, 11...
Shows gas inlet.
Claims (1)
入路を形成し、反応ガス導入口を反応室の天井に
開口せしめたことを特徴とする縦形拡散装置。 A vertical diffusion device characterized in that a reaction gas introduction path is formed along the side and ceiling surfaces of a reaction chamber, and a reaction gas introduction port is opened at the ceiling of the reaction chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6407589U JPH033733U (en) | 1989-06-01 | 1989-06-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6407589U JPH033733U (en) | 1989-06-01 | 1989-06-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH033733U true JPH033733U (en) | 1991-01-16 |
Family
ID=31594690
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6407589U Pending JPH033733U (en) | 1989-06-01 | 1989-06-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH033733U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005320043A (en) * | 2004-05-11 | 2005-11-17 | Wakon Danbooru Kk | Corrugated fiberboard beam and paper-made pallet using the same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01130523A (en) * | 1987-11-17 | 1989-05-23 | Toshiba Ceramics Co Ltd | Vertical furnace for heat-treating semiconductor |
-
1989
- 1989-06-01 JP JP6407589U patent/JPH033733U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01130523A (en) * | 1987-11-17 | 1989-05-23 | Toshiba Ceramics Co Ltd | Vertical furnace for heat-treating semiconductor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005320043A (en) * | 2004-05-11 | 2005-11-17 | Wakon Danbooru Kk | Corrugated fiberboard beam and paper-made pallet using the same |