JPH0332U - - Google Patents

Info

Publication number
JPH0332U
JPH0332U JP5418290U JP5418290U JPH0332U JP H0332 U JPH0332 U JP H0332U JP 5418290 U JP5418290 U JP 5418290U JP 5418290 U JP5418290 U JP 5418290U JP H0332 U JPH0332 U JP H0332U
Authority
JP
Japan
Prior art keywords
chamber
electrode
wafer
utility
model registration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5418290U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5418290U priority Critical patent/JPH0332U/ja
Publication of JPH0332U publication Critical patent/JPH0332U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP5418290U 1990-05-25 1990-05-25 Pending JPH0332U (enrdf_load_html_response)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5418290U JPH0332U (enrdf_load_html_response) 1990-05-25 1990-05-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5418290U JPH0332U (enrdf_load_html_response) 1990-05-25 1990-05-25

Publications (1)

Publication Number Publication Date
JPH0332U true JPH0332U (enrdf_load_html_response) 1991-01-07

Family

ID=31576020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5418290U Pending JPH0332U (enrdf_load_html_response) 1990-05-25 1990-05-25

Country Status (1)

Country Link
JP (1) JPH0332U (enrdf_load_html_response)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421175A (en) * 1977-07-18 1979-02-17 Tokyo Ouka Kougiyou Kk Improvement of plasma reaction processor
JPS5487477A (en) * 1977-12-23 1979-07-11 Kokusai Electric Co Ltd Device for etching and stripping semiconductor wafer
JPS5588335A (en) * 1978-12-07 1980-07-04 Kokusai Electric Co Ltd Automatic conveying mechanism for plasma etching/ stripping device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421175A (en) * 1977-07-18 1979-02-17 Tokyo Ouka Kougiyou Kk Improvement of plasma reaction processor
JPS5487477A (en) * 1977-12-23 1979-07-11 Kokusai Electric Co Ltd Device for etching and stripping semiconductor wafer
JPS5588335A (en) * 1978-12-07 1980-07-04 Kokusai Electric Co Ltd Automatic conveying mechanism for plasma etching/ stripping device

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