JPH0330299B2 - - Google Patents
Info
- Publication number
- JPH0330299B2 JPH0330299B2 JP11063782A JP11063782A JPH0330299B2 JP H0330299 B2 JPH0330299 B2 JP H0330299B2 JP 11063782 A JP11063782 A JP 11063782A JP 11063782 A JP11063782 A JP 11063782A JP H0330299 B2 JPH0330299 B2 JP H0330299B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- transfer base
- support
- base
- wafer support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001179 sorption measurement Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 51
- 239000000428 dust Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11063782A JPS593944A (ja) | 1982-06-29 | 1982-06-29 | ウエハ−搬送装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11063782A JPS593944A (ja) | 1982-06-29 | 1982-06-29 | ウエハ−搬送装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS593944A JPS593944A (ja) | 1984-01-10 |
| JPH0330299B2 true JPH0330299B2 (cg-RX-API-DMAC7.html) | 1991-04-26 |
Family
ID=14540771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11063782A Granted JPS593944A (ja) | 1982-06-29 | 1982-06-29 | ウエハ−搬送装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS593944A (cg-RX-API-DMAC7.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60264338A (ja) * | 1984-06-11 | 1985-12-27 | Furukawa Electric Co Ltd:The | 光フアイバ母材の製造方法 |
| JP2728766B2 (ja) * | 1990-07-18 | 1998-03-18 | 株式会社東芝 | 半導体の処理方法およびその装置 |
| JP2754297B2 (ja) * | 1991-09-30 | 1998-05-20 | 株式会社フジクラ | レーザ治療用光ファイバ |
-
1982
- 1982-06-29 JP JP11063782A patent/JPS593944A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS593944A (ja) | 1984-01-10 |
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