JPH0328699B2 - - Google Patents

Info

Publication number
JPH0328699B2
JPH0328699B2 JP57019737A JP1973782A JPH0328699B2 JP H0328699 B2 JPH0328699 B2 JP H0328699B2 JP 57019737 A JP57019737 A JP 57019737A JP 1973782 A JP1973782 A JP 1973782A JP H0328699 B2 JPH0328699 B2 JP H0328699B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
ink transfer
layer
transfer layer
ink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57019737A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58139140A (ja
Inventor
Tadashi Akama
Junichi Fujikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP1973782A priority Critical patent/JPS58139140A/ja
Publication of JPS58139140A publication Critical patent/JPS58139140A/ja
Publication of JPH0328699B2 publication Critical patent/JPH0328699B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1973782A 1982-02-12 1982-02-12 感光性樹脂凹版材 Granted JPS58139140A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1973782A JPS58139140A (ja) 1982-02-12 1982-02-12 感光性樹脂凹版材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1973782A JPS58139140A (ja) 1982-02-12 1982-02-12 感光性樹脂凹版材

Publications (2)

Publication Number Publication Date
JPS58139140A JPS58139140A (ja) 1983-08-18
JPH0328699B2 true JPH0328699B2 (en, 2012) 1991-04-19

Family

ID=12007639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1973782A Granted JPS58139140A (ja) 1982-02-12 1982-02-12 感光性樹脂凹版材

Country Status (1)

Country Link
JP (1) JPS58139140A (en, 2012)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6695678B2 (ja) * 2015-10-15 2020-05-20 マクセルホールディングス株式会社 グラビアオフセット印刷用凹版およびその製造方法
CN113168091B (zh) * 2018-12-19 2024-06-04 东丽株式会社 布帛用的树脂凹版印刷版的制造方法以及布帛印刷物的制造方法
JP2020075515A (ja) * 2020-02-12 2020-05-21 マクセルホールディングス株式会社 グラビアオフセット印刷用凹版およびその製造方法

Also Published As

Publication number Publication date
JPS58139140A (ja) 1983-08-18

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