JPH03267138A - 真空処理装置 - Google Patents

真空処理装置

Info

Publication number
JPH03267138A
JPH03267138A JP12386090A JP12386090A JPH03267138A JP H03267138 A JPH03267138 A JP H03267138A JP 12386090 A JP12386090 A JP 12386090A JP 12386090 A JP12386090 A JP 12386090A JP H03267138 A JPH03267138 A JP H03267138A
Authority
JP
Japan
Prior art keywords
vacuum
vacuum processing
vacuum chamber
introducing
preliminary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12386090A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0448492B2 (enrdf_load_stackoverflow
Inventor
Kiyoshi Imada
今田　潔
Susumu Ueno
進 上野
Hirokazu Nomura
野村　洋和
Hiroaki Kobayashi
弘明 小林
Kenji Hatada
研司 畑田
Kazuhiko Abe
安部　和彦
Yoshitada Hata
畑　慶忠
Masaya Tokai
東海　正家
Kenichi Kato
健一 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Hitachi Ltd
Toray Industries Inc
Original Assignee
Shin Etsu Chemical Co Ltd
Hitachi Ltd
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Hitachi Ltd, Toray Industries Inc filed Critical Shin Etsu Chemical Co Ltd
Priority to JP12386090A priority Critical patent/JPH03267138A/ja
Publication of JPH03267138A publication Critical patent/JPH03267138A/ja
Publication of JPH0448492B2 publication Critical patent/JPH0448492B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
JP12386090A 1990-05-14 1990-05-14 真空処理装置 Granted JPH03267138A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12386090A JPH03267138A (ja) 1990-05-14 1990-05-14 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12386090A JPH03267138A (ja) 1990-05-14 1990-05-14 真空処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP8492380A Division JPS5718737A (en) 1980-06-21 1980-06-21 Apparatus for continuous plasma treatment

Publications (2)

Publication Number Publication Date
JPH03267138A true JPH03267138A (ja) 1991-11-28
JPH0448492B2 JPH0448492B2 (enrdf_load_stackoverflow) 1992-08-06

Family

ID=14871183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12386090A Granted JPH03267138A (ja) 1990-05-14 1990-05-14 真空処理装置

Country Status (1)

Country Link
JP (1) JPH03267138A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103057133A (zh) * 2011-10-19 2013-04-24 苏州市奥普斯等离子体科技有限公司 一种高分子材料表面改性等离子体处理方法及其装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103057133A (zh) * 2011-10-19 2013-04-24 苏州市奥普斯等离子体科技有限公司 一种高分子材料表面改性等离子体处理方法及其装置

Also Published As

Publication number Publication date
JPH0448492B2 (enrdf_load_stackoverflow) 1992-08-06

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