JPH03254175A - Metal base wiring board - Google Patents
Metal base wiring boardInfo
- Publication number
- JPH03254175A JPH03254175A JP5215290A JP5215290A JPH03254175A JP H03254175 A JPH03254175 A JP H03254175A JP 5215290 A JP5215290 A JP 5215290A JP 5215290 A JP5215290 A JP 5215290A JP H03254175 A JPH03254175 A JP H03254175A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- metal
- inorganic coating
- thermocuring
- wiring board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 27
- 239000002184 metal Substances 0.000 title claims abstract description 27
- 229920005989 resin Polymers 0.000 claims abstract description 19
- 239000011347 resin Substances 0.000 claims abstract description 19
- 239000011888 foil Substances 0.000 claims abstract description 8
- 239000008199 coating composition Substances 0.000 claims description 9
- 229920001187 thermosetting polymer Polymers 0.000 claims description 5
- 239000002131 composite material Substances 0.000 abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 6
- 229920000877 Melamine resin Polymers 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 4
- 239000005011 phenolic resin Substances 0.000 abstract description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000956 alloy Substances 0.000 abstract description 3
- 229910045601 alloy Inorganic materials 0.000 abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 abstract description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 239000010949 copper Substances 0.000 abstract description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052759 nickel Inorganic materials 0.000 abstract description 3
- 239000003960 organic solvent Substances 0.000 abstract description 3
- 229910052725 zinc Inorganic materials 0.000 abstract description 3
- 239000011701 zinc Substances 0.000 abstract description 3
- 229910000831 Steel Inorganic materials 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract description 2
- 239000010959 steel Substances 0.000 abstract description 2
- 238000001029 thermal curing Methods 0.000 abstract 4
- 230000003449 preventive effect Effects 0.000 abstract 2
- KCZFLPPCFOHPNI-UHFFFAOYSA-N alumane;iron Chemical compound [AlH3].[Fe] KCZFLPPCFOHPNI-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- -1 polybutylene terephthalate Polymers 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920006337 unsaturated polyester resin Polymers 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電子機器、電気機器、コンピューター、通信機
器等に用いられる金属ベース配線基板に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a metal-based wiring board used in electronic equipment, electrical equipment, computers, communication equipment, etc.
従来の金属ベース配線基板は金属板の上面及び又は下面
に樹脂層を介し、金属箔を配設一体化してなり、その放
熱性を買われ多様な用途に用いられているが更に耐熱性
を向上させたいという要望があった。Conventional metal-based wiring boards are made by integrally disposing metal foil on the top and/or bottom of a metal plate with a resin layer interposed between them, and are used in a variety of applications due to their heat dissipation properties, but the heat resistance has been further improved. There was a request to do so.
従来の技術で述べたように、従来の金属ベース配線基板
についてはその耐熱性を向上させたいという要望が強い
。As described in the related art section, there is a strong desire to improve the heat resistance of conventional metal-based wiring boards.
本発明は従来の技術における上述の問題点に鑑みてなさ
れたもので、その目的とするところは耐熱性に優れた金
属ベース配線基板を提供することにある。The present invention has been made in view of the above-mentioned problems in the prior art, and its object is to provide a metal-based wiring board with excellent heat resistance.
本発明は金属板の上面及び又は下面に樹脂層を配し、最
外側に熱硬化性樹脂プライマーを介して無機質被覆組成
物層を配した金属箔を配設一体化してなることを特徴と
する金属ベース配線基板のため、無機質被覆組成物によ
り上記目的を達成することができたもので、以下本発明
の詳細な説明する。The present invention is characterized in that a resin layer is disposed on the upper and/or lower surface of a metal plate, and a metal foil having an inorganic coating composition layer disposed on the outermost side via a thermosetting resin primer is arranged and integrated. The above object can be achieved by using an inorganic coating composition for a metal-based wiring board, and the present invention will be described in detail below.
本発明に用いる金属板としてはアルミニウム、鋼、鉄、
銅、亜鉛、ニッケル等の単独、合金、複合板を用いるこ
とができ、厚みは0.1〜10ynmであることが好ま
しく、更に金属板表面を物理処理、化学処理で活性化、
粗面化し層間接着性を向上させることもできる。熱硬化
性樹脂ブライマーとしては、アルキルエーテル化メラミ
ン樹脂、フェノール樹脂、変性フェノール樹脂、不飽和
ポリエステル樹脂、エポキシ樹脂、熱硬化型アクリル樹
脂、メラミン・アルキッド樹脂、アクリル・メラミン樹
脂、アクリル・ウレタン樹脂、有機樹脂とケイ素化合物
との複合化樹脂などであり、これらを単独であるいは複
数種を組み合わせて使用することができる。また、ブラ
イマーを塗布したあとの乾燥硬化をより効率的に省エネ
ルギー的に実施するために、紫外線等の光エネルギーの
照射によって硬化する樹脂や、光エネルギーと熱によっ
て硬化する光硬化熱硬化併用型の樹脂も使用することが
できる。Metal plates used in the present invention include aluminum, steel, iron,
Single, alloy, or composite plates of copper, zinc, nickel, etc. can be used, and the thickness is preferably 0.1 to 10 ynm, and the surface of the metal plate is activated by physical treatment or chemical treatment.
It is also possible to roughen the surface and improve interlayer adhesion. Thermosetting resin brimers include alkyl etherified melamine resins, phenolic resins, modified phenolic resins, unsaturated polyester resins, epoxy resins, thermosetting acrylic resins, melamine/alkyd resins, acrylic/melamine resins, acrylic/urethane resins, These include composite resins of organic resins and silicon compounds, and these can be used alone or in combination. In addition, in order to carry out the dry curing process after applying the brimer more efficiently and in an energy-saving manner, we have developed resins that harden by irradiation with light energy such as ultraviolet rays, and resins that harden using light energy and heat. Resins can also be used.
ブライマーを塗布するにあたっては、ブライマーを適当
な有機溶剤に溶解乃至分散させて、へヶ塗り、スプレー
、ディッピング、流し塗り、転写等の任意の塗装方法で
行なうことができ、乾燥硬化させるもので、ブライマー
の硬化膜の厚みは特に限定しないがO,1〜5ξクロン
が好ましい。即ち0.1ミクロン未満では密着強度が不
安定で、5ミクロンをこえると無機質被覆組成物にクラ
ンクを発生させるためである。ブライマーはその塗膜が
鉛筆硬度でIH組以上ものが接着性でよく好ましい。When applying the brimer, the brimer is dissolved or dispersed in a suitable organic solvent, and can be applied by any coating method such as dipping, spraying, dipping, flow coating, or transfer, and is then dried and cured. Although the thickness of the cured film of the brimer is not particularly limited, it is preferably 0.1 to 5ξ thick. That is, if the thickness is less than 0.1 micron, the adhesion strength is unstable, and if it exceeds 5 microns, cranks will occur in the inorganic coating composition. Brimer has a pencil hardness of IH class or higher for good adhesion and is preferred.
無機質被覆組成物としては熱硬化性を有し有機溶媒中に
ゾル状に分散された状態のものを用いるもので、アルキ
ルトリアルコキシシランの部分加水分解物、メチルトリ
アルコキシシランとフェニルトリアルコキシシランの部
分加水分解物、アルキルトリアルコキシシランとテトラ
アルコキシシランの部分加水分解物、アルキルトリアル
コキシシランの部分加水分解物、アルキルトリヒドロキ
シシランとコロイダルシリカ、アルキルトリアルコキシ
シランとテトラアルコキシシランとシランカップリング
剤の部分加水分解物等である。無機質被覆組成物には必
要に応じて硬化剤、硬化促進剤、レベリング剤、増粘剤
、安定化剤、着色剤等を添加することもできる。塗布方
法はブライマーと同しく任意である。樹脂層としてはフ
ェノール樹脂、クレゾール樹脂、エポキシ樹脂、不飽和
ポリエステル樹脂、メラミン樹脂、ポリイミド、ポリブ
タジェン、ポリアミド、ポリアミトイ旦ト、ポリスルフ
ォン、ポリフェニレンサルファイド、ポリフェニレンオ
キサイド、ポリブチレンテレフタレート、ポリエチレン
テレフタレート、弗化樹脂等の単独、変性物、混合物等
の塗布層、樹脂含浸基材層、樹脂シート層等の単独、複
合層が用いられるが好ましくは樹脂層厚を均一化しやす
い樹脂含浸基材を用いることが望ましい。The inorganic coating composition used is one that has thermosetting properties and is dispersed in the form of a sol in an organic solvent. Partial hydrolyzate, partial hydrolyzate of alkyltrialkoxysilane and tetraalkoxysilane, partial hydrolyzate of alkyltrialkoxysilane, alkyltrihydroxysilane and colloidal silica, alkyltrialkoxysilane and tetraalkoxysilane and silane coupling agent These include partial hydrolysates of A curing agent, a curing accelerator, a leveling agent, a thickener, a stabilizer, a coloring agent, etc. can also be added to the inorganic coating composition as required. The application method is arbitrary, same as with the braiser. The resin layer includes phenolic resin, cresol resin, epoxy resin, unsaturated polyester resin, melamine resin, polyimide, polybutadiene, polyamide, polyamide, polysulfone, polyphenylene sulfide, polyphenylene oxide, polybutylene terephthalate, polyethylene terephthalate, and fluorinated resin. Single or composite layers such as single, modified or mixed coating layers, resin-impregnated base material layers, resin sheet layers, etc. are used, but it is preferable to use resin-impregnated base materials that can easily make the resin layer thickness uniform. .
金属箔としては厚みは0.018〜0.07mmの銅、
アルミニウム、鉄、ニッケル、亜鉛等の単独、合金、複
合板を用いることが好ましく、必要に応じて接着面を物
理処理や化学処理で表面処理しておくこともできる。The metal foil is copper with a thickness of 0.018 to 0.07 mm,
It is preferable to use a single plate, an alloy plate, or a composite plate of aluminum, iron, nickel, zinc, etc., and the adhesive surface may be surface-treated by physical treatment or chemical treatment, if necessary.
一体化手段としてはプレス、多段プレス、マルチロール
、ダブルベルト等による加圧下積層成形や無圧積層成形
の各れでもよく、特に限定するものではない。The integration means may be laminated under pressure or pressureless laminated using a press, multi-stage press, multi-roll, double belt, etc., and is not particularly limited.
以下本発明を実施例にもとづいて説明する。The present invention will be explained below based on examples.
厚みl mmの鉄板片面をサンドペーパーで研磨後、乾
燥後厚みがIOSクロンになるようにエポキシ樹脂ブラ
イマーを塗布、乾燥後、該塗布面に硬化後の膜厚が10
ミクロンになるように無機質被覆組成物をスプレー塗布
後、120°Cで10分間乾燥し、更に160 ’Cで
30分間加熱硬化した無機W被覆組成物層付金属板に、
厚み0.1 +nmのエポキシ樹脂含浸ガラス布2枚を
重ね、更にその上に厚み35ミクロンw4箔を重ね成形
圧力30kg/c+f1165°Cで90分間積層威形
して金属ベース配線基板を得た。この時用いた無機質被
覆組成物は、還流冷却器付の加水分解容器にイソプロピ
ルアルコール68重量部(以下単に部と記す)、テトラ
エトキシシラン38部、メチルトリエトキシシラン72
部、0.05 N塩酸36部を入れ5時間加熱反応して
アルキルトリアルコキシシランとテトラアルコキシシラ
ンの部分加水分解物として得られたものである。After sanding one side of an iron plate with a thickness of 1 mm, apply epoxy resin brimer so that the thickness becomes IOS Kron after drying, and after drying, the film thickness after curing is 10 mm.
After spraying the inorganic coating composition to a micron thickness, it was dried at 120°C for 10 minutes, and then heated and cured at 160'C for 30 minutes.
Two sheets of epoxy resin-impregnated glass cloth with a thickness of 0.1 + nm were stacked, and a 35-micron-thick W4 foil was further stacked on top of the cloth and laminated for 90 minutes at a molding pressure of 30 kg/c+f at 1165° C. to obtain a metal base wiring board. The inorganic coating composition used at this time was placed in a hydrolysis vessel equipped with a reflux condenser, containing 68 parts by weight of isopropyl alcohol (hereinafter simply referred to as parts), 38 parts of tetraethoxysilane, and 72 parts of methyltriethoxysilane.
36 parts of 0.05N hydrochloric acid were added thereto and heated for 5 hours to obtain a partial hydrolyzate of alkyltrialkoxysilane and tetraalkoxysilane.
〔比較例1〕
実施例の無機質被覆組成物を塗布しない厚み35ミクロ
ンの銅箔を用いた以外は実施例と同様に処理して金属ベ
ース配線基板を得た。[Comparative Example 1] A metal-based wiring board was obtained in the same manner as in the example except that a 35 micron thick copper foil was not coated with the inorganic coating composition of the example.
〔比較例2〕
実施例のエポキシ樹脂プライマーを除去した以外は実施
例と同様に処理して金属ベース配線基板を得た。[Comparative Example 2] A metal-based wiring board was obtained in the same manner as in the example except that the epoxy resin primer of the example was removed.
実施例及び比較例1と2の金属ベース配線基板の性能は
第1表のようである。Table 1 shows the performance of the metal-based wiring boards of Examples and Comparative Examples 1 and 2.
第 1 表
〔発明の効果〕
本発明は上述した如く構成されている。特許請求の範囲
に記載した構成を有する金属ベース配線基板においては
防錆性が向上する効果がある。Table 1 [Effects of the Invention] The present invention is constructed as described above. The metal base wiring board having the structure described in the claims has the effect of improving rust prevention.
433−433-
Claims (1)
外側に熱硬化性樹脂プライマーを介して無機質被覆組成
物層を配した金属箔を配設一体化してなることを特徴と
する金属ベース配線基板。(1) A resin layer is arranged on the upper and/or lower surface of a metal plate, and a metal foil with an inorganic coating composition layer arranged on the outermost side via a thermosetting resin primer is arranged and integrated. Metal-based wiring board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5215290A JPH03254175A (en) | 1990-03-02 | 1990-03-02 | Metal base wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5215290A JPH03254175A (en) | 1990-03-02 | 1990-03-02 | Metal base wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03254175A true JPH03254175A (en) | 1991-11-13 |
Family
ID=12906889
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5215290A Pending JPH03254175A (en) | 1990-03-02 | 1990-03-02 | Metal base wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03254175A (en) |
-
1990
- 1990-03-02 JP JP5215290A patent/JPH03254175A/en active Pending
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