JPH0325402Y2 - - Google Patents

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Publication number
JPH0325402Y2
JPH0325402Y2 JP1985135649U JP13564985U JPH0325402Y2 JP H0325402 Y2 JPH0325402 Y2 JP H0325402Y2 JP 1985135649 U JP1985135649 U JP 1985135649U JP 13564985 U JP13564985 U JP 13564985U JP H0325402 Y2 JPH0325402 Y2 JP H0325402Y2
Authority
JP
Japan
Prior art keywords
ring
substrate
block body
shaped
substrate holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985135649U
Other languages
Japanese (ja)
Other versions
JPS6244433U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985135649U priority Critical patent/JPH0325402Y2/ja
Publication of JPS6244433U publication Critical patent/JPS6244433U/ja
Application granted granted Critical
Publication of JPH0325402Y2 publication Critical patent/JPH0325402Y2/ja
Expired legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Description

【考案の詳細な説明】 (産業上の利用分野) 本考案は、分子線エピタキシヤル成長装置にお
いて基板結晶を保持する装置に関するものであ
る。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to an apparatus for holding a substrate crystal in a molecular beam epitaxial growth apparatus.

(考案の概要) 本考案は分子線エピタキシヤル成長装置におけ
る基板保持装置において、リング状のブロツク本
体と、閉合自在の弾性を有する基板保持用のリン
グとを具備し、前記のブロツク本体のリング状体
の上部に外周がブロツク本体の周縁より凸出し、
内周はブロツク本体の内周と同一のフランジ部を
設け、前記のフランジ部の上面に、先端が内側に
向う逆L字状の複数のリング係合部を形成し、か
つブロツク本体の内壁に基板を支持する基板保持
部を設け、前記の基板保持用のリングは、両端に
開口部を有し、かつ前記のブロツク本体のリング
保持部に対応する箇所に内周に向つて突出するU
字状の係合爪を形成することにより、操作性を向
上せしめることにある。
(Summary of the invention) The present invention provides a substrate holding device for a molecular beam epitaxial growth apparatus, which includes a ring-shaped block body and a substrate-holding ring having elasticity that can be freely closed. The outer periphery of the upper part of the body protrudes from the periphery of the block body,
The inner periphery is provided with a flange part that is the same as the inner periphery of the block body, and the upper surface of the flange part is formed with a plurality of inverted L-shaped ring engaging parts with the tips facing inward, and the inner wall of the block body is A substrate holding section for supporting the substrate is provided, and the substrate holding ring has openings at both ends, and a U projecting toward the inner periphery at a location corresponding to the ring holding section of the block main body.
The object is to improve operability by forming a letter-shaped engaging claw.

(従来技術および考案が解決しようとする問題
点) 分子線エピタキシヤル成長法は、超高真空中に
おいて、単体元素を蒸発させ、基板結晶上に単結
晶薄膜として成長させる、結晶成長技術の1つで
ある。この分子線エピタキシヤル装置において、
従来は、基板保持用にモリブテン(Mo)ブロツ
クを用い、このモリブテンブロツクにウエハを取
付けるのにインジウム(In)等ではつけていた。
しかし、Inを用いた取付け方法では、大型ウエハ
の取付けが困難なことや、成長を終了させた後に
基板裏面のInを塩酸等で溶去する工程、ホルダに
付いたInを溶かす工程が必要であり、作業効率が
はなはだ悪いという欠点があつた。一方、Inを用
いない方法もいくつか報告されている。第2図に
示すように支持体21上にウエハ22を載せ、お
さえ板23をネジ止めする方法が提案されてい
る。この方法では基板を直接おさえることによつ
て、基板結晶に歪が入ることや、ネジ止めのスペ
ースを必要とするため、大きなブロツクを用いる
必要があることなどの欠点があつた。加えて、部
品点数が多いために、ブロツク洗浄や基板固定に
手間がかかるのも欠点であつた。
(Prior art and problems to be solved by the invention) Molecular beam epitaxial growth is a crystal growth technique that evaporates a single element in an ultra-high vacuum and grows it as a single crystal thin film on a substrate crystal. It is. In this molecular beam epitaxial device,
Conventionally, a molybdenum (Mo) block was used to hold the substrate, and a material such as indium (In) was used to attach the wafer to the molybdenum block.
However, with the attachment method using In, it is difficult to attach large wafers, and after the growth is finished, it requires a process to dissolve the In on the back of the substrate with hydrochloric acid, etc., and a process to dissolve the In attached to the holder. However, it had the disadvantage of extremely poor work efficiency. On the other hand, some methods that do not use In have also been reported. As shown in FIG. 2, a method has been proposed in which a wafer 22 is placed on a support 21 and a presser plate 23 is screwed. This method has drawbacks such as straining the substrate crystal by directly holding the substrate, and the need to use large blocks because it requires space for screw fixing. In addition, due to the large number of parts, cleaning the block and fixing the board was time-consuming.

また第3図に示すように、支持体21に載せた
ウエハ22をおさえる固定用のリング25を支持
体21に針金24で止める方法も、前述と同様の
欠点を有している。さらに第4図に示すように、
支持体21に載せたウエハ22を固定用リング2
5の爪26でおさえる方法も提案されているが、
この方法では、ウエハの着脱ごとに爪を曲げ又は
のばしてウエハをおさえるため、爪部分が塑性変
形を受けるために多数回の再使用にたえないこと
や、操作性が悪いという欠点があつた。
Further, as shown in FIG. 3, the method of fixing the fixing ring 25 for holding down the wafer 22 placed on the support 21 to the support 21 with a wire 24 also has the same drawbacks as described above. Furthermore, as shown in Figure 4,
The wafer 22 placed on the support 21 is fixed to the fixing ring 2.
A method of suppressing it with the claw 26 of 5 has also been proposed,
In this method, the claws are bent or extended to hold the wafer each time the wafer is attached or removed, so the claws undergo plastic deformation, making it difficult to reuse many times and having poor operability. .

(問題点を解決するための手段) 本考案は上記のIn等の接着用金属を用いたり、
ネジ止めや針金止め、つめ付きリングを用いたり
する方法に伴う作業効率の悪さを解決し、操作性
の良い基板保持装置を提供することを目的とす
る。
(Means for solving the problem) The present invention uses adhesive metals such as the above-mentioned In,
The purpose of the present invention is to provide a substrate holding device with good operability by solving the inefficiency of work associated with methods such as using screws, wires, and rings with claws.

第1図は本考案における分子線エピタキシヤル
成長装置における基板保持装置を示すもので、a
は斜視図、bは第1図において本体1のA−A線
に沿う断面図を示す。図において1はリング状の
ブロツク本体で、この上部に外周がブロツク本体
1の周縁より突出し、内周はブロツク本体1の内
周と同一であるフランジ部2を形成する。さらに
このフランジ部の上面に、先端が内側に向う逆L
字形の3個のリング係合部3を等間隔に配置す
る。これによつてフランジ部2の上面とリング係
合部3の内側の突出部3aの下面との間に係合用
の凹部3bが形成される。4はブロツク本体1の
内壁に形成された基板保持部4で、この基板保持
部4の上面と、フランジ部2の内壁との間に基板
(図示せず)を収納するための空所が形成される。
FIG. 1 shows a substrate holding device in a molecular beam epitaxial growth apparatus according to the present invention.
1 is a perspective view, and b is a sectional view taken along the line A-A of the main body 1 in FIG. In the figure, reference numeral 1 denotes a ring-shaped block body, and a flange portion 2 is formed on its upper part, the outer periphery of which protrudes from the periphery of the block body 1, and the inner periphery of which is the same as the inner periphery of the block body 1. Furthermore, on the top surface of this flange part, there is an inverted L with the tip facing inward.
Three letter-shaped ring engaging portions 3 are arranged at equal intervals. As a result, an engaging recess 3b is formed between the upper surface of the flange portion 2 and the lower surface of the inner protrusion 3a of the ring engaging portion 3. Reference numeral 4 denotes a substrate holding portion 4 formed on the inner wall of the block body 1, and a space for storing a substrate (not shown) is formed between the upper surface of this substrate holding portion 4 and the inner wall of the flange portion 2. be done.

11は基板支持用のリングでバネ性を有する材
料より構成され、両端に開口部12を有し、この
両端に夫々外側に突出するフツク部11a,11
bが設けられる。またブロツク本体1のリング係
合部3に対応する箇所に内側に向つて突出するU
字形の係合爪13を形成する。この係合爪13の
外周には凹部14が形成され、後述するようにこ
の凹部は、ブロツク本体1のリング係合部3の凹
部3bと係合するものである。
Reference numeral 11 denotes a ring for supporting the substrate, which is made of a material having spring properties, and has openings 12 at both ends, and hook portions 11a and 11 that protrude outward from each end.
b is provided. In addition, there is a U projecting inwardly at a location corresponding to the ring engaging portion 3 of the block body 1.
A letter-shaped engagement claw 13 is formed. A recess 14 is formed on the outer periphery of the engaging pawl 13, and this recess engages with the recess 3b of the ring engaging portion 3 of the block body 1, as will be described later.

次に作用について説明する。 Next, the effect will be explained.

ブロツク本体1のフランジ部2と、基板保持部
4との間に、基板を載せる。次に基板支持用のリ
ングの孔15にリング着脱用工具の先端を挿入
し、リング11を内側に縮める。ついでこのリン
グの係合爪13の凹部13aを、ブロツク本体1
のリング係合部3の凹部3bに係合するように、
基板支持用リングをブロツク本体1に挿入し、リ
ング着脱用工具をリングよりはずすと、リング自
身の弾性力で外側にひろがり、係合爪13がブロ
ツク本体1のリング係合部と完全に係合する。こ
の場合リングの係合爪13により、基板を保持す
る。
A substrate is placed between the flange portion 2 of the block body 1 and the substrate holding portion 4. Next, the tip of a ring attachment/detachment tool is inserted into the hole 15 of the substrate support ring, and the ring 11 is contracted inward. Next, insert the recess 13a of the engagement claw 13 of this ring into the block body 1.
so as to engage with the recess 3b of the ring engaging portion 3,
When the board support ring is inserted into the block body 1 and the ring attachment/detachment tool is removed from the ring, the ring expands outward due to its own elastic force, and the engagement claw 13 completely engages with the ring engagement part of the block body 1. do. In this case, the board is held by the engaging claws 13 of the ring.

また係合爪13と基板(図示せず)との間に僅
かのすきまを保つように、基板保持部4の深さが
調節されている。従つて基板には応力が加わらな
い。
Further, the depth of the substrate holding portion 4 is adjusted so as to maintain a slight gap between the engaging claw 13 and the substrate (not shown). Therefore, no stress is applied to the substrate.

また4aはブロツクの内壁に形成した段状の基
板保持部より内方に凸出したでつぱりで、この部
分は予め形成した基板の周縁の直線状部分と対向
するので、基板は相対的にブロツクに対して回転
しない。
Further, 4a is a protrusion that protrudes inward from the stepped substrate holding portion formed on the inner wall of the block, and this portion faces the linear portion of the peripheral edge of the substrate formed in advance, so that the substrate is relatively It does not rotate relative to the block.

基板をブロツク本体より取りはずす場合は、リ
ングの孔15にリング着脱用工具の先端を挿入
し、リング11を内側に縮め、リング11をブロ
ツク本体1よりはずし、基板をブロツク本体より
取りはずすことができる。このような構造になつ
ているから、従来の保持方法に比べて格段に迅速
に基板の着脱ができる。また、塑性変形を伴なわ
ないので、本考案の装置は半永久的に使用でき、
かつ部品点数が少ないので、洗浄等も迅速に行う
ことができる。なおこの実施例ではブロツク本
体、基板保持リングとしてMoを用いたが、この
他にもタングステン等の高融点金属を用いても同
様の効果が得られる。
When removing the board from the block body, insert the tip of a ring attachment/detachment tool into the hole 15 of the ring, contract the ring 11 inward, remove the ring 11 from the block body 1, and remove the board from the block body. With this structure, the substrate can be attached and detached much more quickly than with conventional holding methods. In addition, since it does not involve plastic deformation, the device of this invention can be used semi-permanently.
In addition, since the number of parts is small, cleaning etc. can be performed quickly. In this embodiment, Mo was used for the block body and the substrate holding ring, but the same effect can be obtained by using other high melting point metals such as tungsten.

(考案の効果) 本考案は叙上のように構成されているので、 (イ) 基板の着脱が迅速に行うことができる。(Effect of idea) Since the present invention is structured as described above, (a) Boards can be quickly attached and detached.

(ロ) 部品点数が少く、かつ半永久的に使用するこ
とができる。
(b) It has a small number of parts and can be used semi-permanently.

(ハ) 取りつけた基板に対して、不必要な応力を加
えることがないので、基板を劣化せしめること
がない。
(c) Since unnecessary stress is not applied to the attached board, the board will not deteriorate.

等の効果を有する。It has the following effects.

なお、本考案によればブロツク本体に設けたリ
ング係合部を、電子線回折時に入射電子線及び回
折電子線の通路の外に配置することにより、電子
線による基板表面の観察を容易に行うことでき
る。
According to the present invention, the ring engagement portion provided on the block body is placed outside the path of the incident electron beam and the diffracted electron beam during electron beam diffraction, thereby facilitating observation of the substrate surface using the electron beam. I can do that.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の基板保持装置を、第2図乃至
第4図は従来の基板保持装置を示す。 1……ブロツク本体、2……フランジ部、3…
…リング係合部、3b……凹部、4……基板保持
部、11……基板支持用リング、12……開口、
13……係合爪、14……凹部、15……孔。
FIG. 1 shows a substrate holding device of the present invention, and FIGS. 2 to 4 show conventional substrate holding devices. 1...Block body, 2...Flange part, 3...
...Ring engaging portion, 3b...Concave portion, 4...Substrate holding portion, 11...Substrate support ring, 12...Opening,
13... Engaging claw, 14... Recess, 15... Hole.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] リング状のブロツク本体と、閉合自在の弾性を
有する基板保持用のリングとを具備し、前記のブ
ロツク本体のリング状体の上部にウエハ載置用の
フランジ部を設け、前記のフランジ部の上面に、
先端が内側に向う逆L字状の複数のリング係合部
を形成し、かつブロツク本体の内壁に基板を支持
する基板保持部を設け、前記の基板保持用のリン
グは、開口部を有し、かつ前記のブロツク本体の
リング保持部に対応する箇所に内周に向つて突出
するU字状の係合爪を形成することを特徴とする
分子線エピタキシヤル成長装置における基板保持
装置。
The block body is equipped with a ring-shaped block body and a ring for holding a substrate with elasticity that can be freely closed, and a flange portion for placing a wafer is provided on the upper part of the ring-shaped body of the block body, and To,
A plurality of inverted L-shaped ring engaging portions are formed with tips facing inward, and a substrate holding portion for supporting the substrate is provided on the inner wall of the block body, and the substrate holding ring has an opening. A substrate holding device for a molecular beam epitaxial growth apparatus, characterized in that a U-shaped engagement claw protruding toward the inner circumference is formed at a location corresponding to the ring holding portion of the block main body.
JP1985135649U 1985-09-06 1985-09-06 Expired JPH0325402Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985135649U JPH0325402Y2 (en) 1985-09-06 1985-09-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985135649U JPH0325402Y2 (en) 1985-09-06 1985-09-06

Publications (2)

Publication Number Publication Date
JPS6244433U JPS6244433U (en) 1987-03-17
JPH0325402Y2 true JPH0325402Y2 (en) 1991-06-03

Family

ID=31038036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985135649U Expired JPH0325402Y2 (en) 1985-09-06 1985-09-06

Country Status (1)

Country Link
JP (1) JPH0325402Y2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60112691A (en) * 1983-11-18 1985-06-19 Anelva Corp Substrate supporting device for molecular beam epitaxial growth device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60112691A (en) * 1983-11-18 1985-06-19 Anelva Corp Substrate supporting device for molecular beam epitaxial growth device

Also Published As

Publication number Publication date
JPS6244433U (en) 1987-03-17

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