JPS6321577Y2 - - Google Patents

Description

[Detailed Description of the Invention] The present invention relates to a substrate holder for liquid phase epitaxial (LPE) film growth.

In recent years, there has been a desire to develop a liquid phase epitaxial (LPE) film growth system that is capable of growing large-area single-crystal substrates and is highly capable of mass production.

Conventionally, a horizontal multilayer sliding type device has been widely used as an LPE film growth device for compound semiconductors. In the case of such a horizontal multilayer sliding growth device, the size of the substrate that can be grown is at most 20 × 20
Only square substrates of about mm square can be used, and it has been difficult to grow crystal films with uniform component ratios and thicknesses on larger substrates.

In view of this situation, the inventors of the present invention
In the application No. 58-5511, an LPE film growth apparatus using a vertical furnace capable of rotating the substrate was devised. This type of equipment has the advantage of being able to grow a substrate with a uniform composition ratio and thickness on a large-diameter substrate, but on the other hand, since the growth is done in batches one by one, it reduces costs for mass production. The drawback was that it was not possible to achieve this.

The present invention was developed in view of the above points, and an object of the present invention is to provide a substrate holder for LPE film growth that can simultaneously form epitaxial layers on a plurality of large-area substrates.

To summarize the present invention, the substrate holder for liquid phase epitaxial film growth according to the present invention includes a substrate holder body provided with a mounting portion for attaching to the substrate holder support shaft, a retaining ring, the substrate holder body and the retaining ring. and at least one or more intermediate holding rings that are screwed together and held between the rings, and the intermediate holding ring is capable of holding the substrate between the substrate holder main body, the intermediate holding ring, or the holding ring, and The present invention is characterized in that an open portion is formed so that the raw material melt can come into contact with the substrate.

Hereinafter, one embodiment of the present invention will be described based on the drawings.

FIG. 1 is a schematic cross-sectional view showing the outline of a liquid phase epitaxial growth apparatus. In the figure, 1 is a reaction tube, 2 is a crucible for holding a raw material melt, 3 is a substrate, 4 is a substrate holder, and 5 is a rotating This is a substrate holder support shaft that can be moved up and down.

As is clear from FIG. 1, the epitaxial growth apparatus includes a crucible 2 that holds a crystal raw material melt inside a reaction tube 1, and a crucible 2 that holds a crystal raw material melt in the upper part of the crucible 2. A substrate holder 4 is provided that supports a substrate 3 that is brought into contact with it to form a grown film, and this substrate holder 4 is connected to a substrate holder support shaft 5 that is rotatable and movable up and down.

In such an apparatus, in order to grow an epitaxially grown film, the substrate holder support shaft 5 is
This is carried out by rotating and lowering the substrate 3 to bring the raw material melt into contact with the substrate 3 placed on the substrate holder 4.

An embodiment of the substrate holder according to the present invention used in such a growth apparatus is shown in FIGS. 2 to 5. In the figure, 40 is a substrate holder main body, 41 is a substrate holder support part, and 42 is a substrate holding ring.

As is clear from FIGS. 2 and 3, the substrate holder 4 includes a disk-shaped substrate holder main body 40, a substrate holder support portion 41 vertically disposed on the central axis of the substrate holder main body 40, and a substrate holder main body 40. 40, and the substrate 3 is held between the retaining ring 42 and the substrate holder main body 40.
are sandwiched between them, so that the substrate 3 is held by the substrate holder 4.

As is clear from FIG. 2, the substrate holder main body 40 is provided with a threaded groove on its circumferential portion, and a corresponding threaded groove is formed on the inner wall of one of the retaining rings 42, so that they can be screwed together. I'm starting to do that.

The substrate holder support part 41 is formed with an engagement groove 410 for engaging with an engagement pin 50 provided on the substrate holder support shaft 5 and connecting with the substrate holder support shaft 5. Both can be freely attached and detached by the engagement pin 50.

The holding ring 42 has four retaining claws 420 (see FIG. 3) on its circumference so that the substrate 3 can be held between it and an intermediate holding ring 423, which will be described later.

FIG. 4 is a sectional view of an embodiment of the substrate holder according to the present invention, in which 31, 32, 33 are substrates;
421 and 422 are intermediate holding rings, and 423 is a holding ring.

In this embodiment, the substrate holder 4 has a plurality of intermediate retaining rings 421 and 422. The intermediate retaining rings 421 and 422 include an upper threaded portion 43 having a threaded groove for screwing with the substrate body 40 or the intermediate retaining ring itself, and a threaded portion 43 for screwing with the retaining ring or the intermediate retaining ring. It has a lower threaded portion 44 with grooves, and a substrate holding stand 45 for holding the substrates 31, 32, etc. is formed below the upper threaded portion 43, and
An opening 46 is provided on the side of the holding table 45 so that the raw material melt comes into contact with the substrates 31, 32, etc.

When the substrate 31 is placed on the substrate holding base 45 of such an intermediate holding ring 421 and screwed onto the substrate holder main body 40 at the upper threaded portion 43, the substrate 31 is held between the substrate holder main body 40 and the intermediate holding ring 421. It will be done. Similarly, by placing the substrate 32 on the holding stand 45 of the intermediate holding ring 422 and screwing together the lower threaded portion 44 of the intermediate holding ring 421 and the upper threaded portion 43 of the other intermediate holding ring 422, Thus, the substrate 32 is held. By stacking the intermediate holding rings 421 and 422 in this manner, it becomes possible to hold a plurality of substrates. Such an intermediate holding ring is attached to the holding base 4.
Since the open portion 46 is provided on the side of the substrate 5, the raw material melt effectively contacts the substrates 31, 32 even if the substrates 31, 32 are stacked as described above.

After the intermediate holding rings 421 and 422 are screwed and stacked in this way, the substrate 33 is further attached to the holding ring 4.
23 and the intermediate holding ring 422.

The aforementioned intermediate retaining ring is 1 depending on the number of substrates.
They can be stacked in layers, two or more. That is, the number of intermediate retaining rings is not limited in the present invention.

By bringing the substrate held in the substrate holder 40 into contact with the raw material melt held in the crucible 2 as described above, it is possible to simultaneously grow epitaxial growth films on a plurality of substrates. It is what it is.

Note that the material of the substrate holder is not fundamentally limited. For example, ceramics such as graphite, boron nitride, silicon nitride, quartz glass, etc. can be used as appropriate.

As explained above, the substrate holder according to the present invention can hold a plurality of large-area substrates, and growth layers can be simultaneously grown on these substrates, so it can be used for manufacturing compound semiconductor solar cells, etc. , extremely useful.

[Brief explanation of the drawing]

FIG. 1 is a schematic sectional view of a liquid phase epitaxial growth apparatus, FIG. 2 is a side sectional view of an embodiment of the present invention, and FIG. 3 is a view of the embodiment as seen from the direction of arrow A in FIG. FIG. 4 is a perspective view for explaining the structure of the embodiment, and FIG. 5 is a perspective view of the intermediate holding ring of the embodiment. 1... Reaction tube, 2... Crucible, 3... Substrate, 4
... Substrate holder, 5 ... Support shaft, 40 ... Substrate holder main body, 42 ... Retaining ring, 421, 422
...Intermediate retaining ring.

Claims (1)

[Scope of utility model registration request] It has a substrate holder body provided with a mounting part for attachment to the substrate holder support shaft, a retaining ring, and at least one or more intermediate retaining rings screwed and sandwiched between the substrate holder body and the retaining ring,
The intermediate holding ring is capable of holding the substrate between the substrate holder main body, the intermediate holding ring, or the holding ring, and has an open portion so that the raw material melt can come into contact with the substrate. A substrate holder for liquid-phase epitaxial film growth.