JPH032230B2 - - Google Patents

Info

Publication number
JPH032230B2
JPH032230B2 JP61232204A JP23220486A JPH032230B2 JP H032230 B2 JPH032230 B2 JP H032230B2 JP 61232204 A JP61232204 A JP 61232204A JP 23220486 A JP23220486 A JP 23220486A JP H032230 B2 JPH032230 B2 JP H032230B2
Authority
JP
Japan
Prior art keywords
less
target material
chromium
hot
purity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61232204A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62174373A (ja
Inventor
Mutsuo Kazuyasu
Takeo Mizuguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Publication of JPS62174373A publication Critical patent/JPS62174373A/ja
Publication of JPH032230B2 publication Critical patent/JPH032230B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
JP23220486A 1985-10-04 1986-09-30 クロムタ−ゲツト材及びその製造方法 Granted JPS62174373A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60-221457 1985-10-04
JP22145785 1985-10-04

Publications (2)

Publication Number Publication Date
JPS62174373A JPS62174373A (ja) 1987-07-31
JPH032230B2 true JPH032230B2 (enrdf_load_stackoverflow) 1991-01-14

Family

ID=16767023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23220486A Granted JPS62174373A (ja) 1985-10-04 1986-09-30 クロムタ−ゲツト材及びその製造方法

Country Status (1)

Country Link
JP (1) JPS62174373A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2757287B2 (ja) * 1989-11-02 1998-05-25 日立金属株式会社 タングステンターゲットの製造方法
US20070017803A1 (en) * 2005-07-22 2007-01-25 Heraeus, Inc. Enhanced sputter target manufacturing method
EP1923480A3 (en) * 2005-07-22 2008-06-18 Heraeus, Inc. Enhanced sputter target manufacturing method
CN103785838B (zh) * 2012-11-01 2016-06-01 宁波江丰电子材料股份有限公司 铬靶材的制作方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4126451A (en) * 1977-03-30 1978-11-21 Airco, Inc. Manufacture of plates by powder-metallurgy
JPS6058289B2 (ja) * 1979-05-18 1985-12-19 三菱マテリアル株式会社 高クロム合金材の製造法
DE3037617A1 (de) * 1980-10-04 1982-04-22 W.C. Heraeus Gmbh, 6450 Hanau Verfahren zur herstellung von targets aus chrom oder chrom-legierungen
JPS5855502A (ja) * 1981-09-28 1983-04-01 Toyo Soda Mfg Co Ltd 金属クロム板の製造法
JPS604241A (ja) * 1983-06-22 1985-01-10 Nec Corp 半導体装置

Also Published As

Publication number Publication date
JPS62174373A (ja) 1987-07-31

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees