JPS62174373A - クロムタ−ゲツト材及びその製造方法 - Google Patents
クロムタ−ゲツト材及びその製造方法Info
- Publication number
- JPS62174373A JPS62174373A JP23220486A JP23220486A JPS62174373A JP S62174373 A JPS62174373 A JP S62174373A JP 23220486 A JP23220486 A JP 23220486A JP 23220486 A JP23220486 A JP 23220486A JP S62174373 A JPS62174373 A JP S62174373A
- Authority
- JP
- Japan
- Prior art keywords
- less
- target material
- purity
- powder
- chromium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013077 target material Substances 0.000 title claims abstract description 23
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 38
- 239000011651 chromium Substances 0.000 title claims description 31
- 229910052804 chromium Inorganic materials 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000002775 capsule Substances 0.000 claims abstract description 26
- 239000010935 stainless steel Substances 0.000 claims abstract description 10
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 10
- 238000000137 annealing Methods 0.000 claims abstract description 8
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 7
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 7
- 239000010959 steel Substances 0.000 claims abstract description 7
- 239000012535 impurity Substances 0.000 claims abstract description 6
- 238000007789 sealing Methods 0.000 claims abstract description 3
- 239000004033 plastic Substances 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 238000001513 hot isostatic pressing Methods 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 239000000843 powder Substances 0.000 abstract description 10
- 238000007740 vapor deposition Methods 0.000 abstract description 5
- 238000000465 moulding Methods 0.000 abstract 3
- 230000002706 hydrostatic effect Effects 0.000 abstract 2
- 238000012856 packing Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 20
- 239000013078 crystal Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 239000011575 calcium Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000000748 compression moulding Methods 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 239000011630 iodine Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000005056 compaction Methods 0.000 description 3
- 238000005242 forging Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000005482 strain hardening Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60-221457 | 1985-10-04 | ||
| JP22145785 | 1985-10-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62174373A true JPS62174373A (ja) | 1987-07-31 |
| JPH032230B2 JPH032230B2 (enrdf_load_stackoverflow) | 1991-01-14 |
Family
ID=16767023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23220486A Granted JPS62174373A (ja) | 1985-10-04 | 1986-09-30 | クロムタ−ゲツト材及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62174373A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03150356A (ja) * | 1989-11-02 | 1991-06-26 | Hitachi Metals Ltd | タングステンまたはモリブデンターゲットおよびその製造方法 |
| EP1746173A3 (en) * | 2005-07-22 | 2007-05-09 | Heraeus, Inc. | Enhanced sputter target manufacturing method |
| EP1923481A3 (en) * | 2005-07-22 | 2008-06-18 | Heraeus, Inc. | Enhanced sputter target manufacturing method |
| CN103785838A (zh) * | 2012-11-01 | 2014-05-14 | 宁波江丰电子材料有限公司 | 铬靶材的制作方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4126451A (en) * | 1977-03-30 | 1978-11-21 | Airco, Inc. | Manufacture of plates by powder-metallurgy |
| JPS55154551A (en) * | 1979-05-18 | 1980-12-02 | Mitsubishi Metal Corp | Manufacture of high chromium alloy material |
| JPS5792103A (en) * | 1980-10-04 | 1982-06-08 | Heraeus Gmbh W C | Manufacture of target from chromium or chromium base alloy |
| JPS5855502A (ja) * | 1981-09-28 | 1983-04-01 | Toyo Soda Mfg Co Ltd | 金属クロム板の製造法 |
| JPS604241A (ja) * | 1983-06-22 | 1985-01-10 | Nec Corp | 半導体装置 |
-
1986
- 1986-09-30 JP JP23220486A patent/JPS62174373A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4126451A (en) * | 1977-03-30 | 1978-11-21 | Airco, Inc. | Manufacture of plates by powder-metallurgy |
| JPS55154551A (en) * | 1979-05-18 | 1980-12-02 | Mitsubishi Metal Corp | Manufacture of high chromium alloy material |
| JPS5792103A (en) * | 1980-10-04 | 1982-06-08 | Heraeus Gmbh W C | Manufacture of target from chromium or chromium base alloy |
| JPS5855502A (ja) * | 1981-09-28 | 1983-04-01 | Toyo Soda Mfg Co Ltd | 金属クロム板の製造法 |
| JPS604241A (ja) * | 1983-06-22 | 1985-01-10 | Nec Corp | 半導体装置 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03150356A (ja) * | 1989-11-02 | 1991-06-26 | Hitachi Metals Ltd | タングステンまたはモリブデンターゲットおよびその製造方法 |
| EP1746173A3 (en) * | 2005-07-22 | 2007-05-09 | Heraeus, Inc. | Enhanced sputter target manufacturing method |
| EP1923481A3 (en) * | 2005-07-22 | 2008-06-18 | Heraeus, Inc. | Enhanced sputter target manufacturing method |
| CN103785838A (zh) * | 2012-11-01 | 2014-05-14 | 宁波江丰电子材料有限公司 | 铬靶材的制作方法 |
| CN103785838B (zh) * | 2012-11-01 | 2016-06-01 | 宁波江丰电子材料股份有限公司 | 铬靶材的制作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH032230B2 (enrdf_load_stackoverflow) | 1991-01-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |