JPH0318178B2 - - Google Patents

Info

Publication number
JPH0318178B2
JPH0318178B2 JP58108155A JP10815583A JPH0318178B2 JP H0318178 B2 JPH0318178 B2 JP H0318178B2 JP 58108155 A JP58108155 A JP 58108155A JP 10815583 A JP10815583 A JP 10815583A JP H0318178 B2 JPH0318178 B2 JP H0318178B2
Authority
JP
Japan
Prior art keywords
pattern
layer
processed
resin film
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58108155A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59231535A (ja
Inventor
Hideaki Itakura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP58108155A priority Critical patent/JPS59231535A/ja
Publication of JPS59231535A publication Critical patent/JPS59231535A/ja
Publication of JPH0318178B2 publication Critical patent/JPH0318178B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58108155A 1983-06-14 1983-06-14 パタ−ンの形成方法 Granted JPS59231535A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58108155A JPS59231535A (ja) 1983-06-14 1983-06-14 パタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58108155A JPS59231535A (ja) 1983-06-14 1983-06-14 パタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS59231535A JPS59231535A (ja) 1984-12-26
JPH0318178B2 true JPH0318178B2 (enExample) 1991-03-11

Family

ID=14477340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58108155A Granted JPS59231535A (ja) 1983-06-14 1983-06-14 パタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS59231535A (enExample)

Also Published As

Publication number Publication date
JPS59231535A (ja) 1984-12-26

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