JPH031642B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a color filter for color separation used in color imaging devices and the like.

BACKGROUND ART Conventionally, when forming a filter for a single-plate color solid-state imaging device or a filter for a normal single-tube color image pickup tube, a method of dyeing a gelatin pattern with an organic dye has been used.

FIG. 1 shows this type of manufacturing method conventionally used for filters for single-tube color solid-state imaging devices. In the figure, a gelatin photosensitive film 2 is coated on the surface of a Si element 1 (FIG. 1a), and a gelatin pattern 3 is formed by an exposure method (FIG. 1b). Next, this is dyed with an organic dye (Fig. 1c) to form a filter pattern 4, but in order to avoid color mixing when layering filter patterns from the second color onwards,
Cover with a protective film 5 (FIG. 2d). This protective film 5
Then, the portion above the bonding pad 6 is removed by deep ultraviolet exposure to enable wiring between the Si element 1 and the package (FIG. 1e).

As described above, in conventional methods of manufacturing color filters, gelatin is used because it is easy to dye. However, the gelatin photosensitive film has a low γ value, poor resolution, and strong dark reaction, so the thickness of the gelatin pattern formed by exposure and development is likely to vary due to the influence of working conditions. Therefore, since the film thickness of the gelatin pattern varies greatly during dyeing, the spectral characteristics vary widely. Further, a dyeing step is required, but at that time, changes in spectral characteristics are likely to occur due to changes in the dyeing solution over time. Further, in connection with the above-mentioned resolution and dark reaction, fogging tends to occur in the openings of the pattern, which impairs normal spectral characteristics.

The present invention was made in view of the above circumstances, and its purpose is to provide a color filter that enables pattern formation with high dimensional accuracy and high resolution, has small variations in spectral characteristics, and does not cause fogging at the aperture. An object of the present invention is to provide a method for manufacturing a color filter that can be obtained.

In order to achieve such an object, the method for manufacturing a color filter according to the present invention uses an ultraviolet curing resin containing an organic dye as the filter layer, and pattern formation is performed by a lift-off method using a positive resist. . Hereinafter, the method for manufacturing a color filter according to the present invention will be explained in detail using Examples.

FIG. 2 is a process diagram showing a method of manufacturing a color filter according to the present invention. In the figure, Si element 1
A positive resist is applied onto the surface of the substrate, exposed and developed using an ordinary 1/10 reduction projection exposure apparatus, etc. to form a predetermined positive resist pattern 7 (FIG. 2a).
Next, an ultraviolet curing resist 8 containing a cyan organic dye is applied to a predetermined thickness (FIG. 2b).
Next, the entire surface is exposed to ultraviolet rays to cure the ultraviolet curing resist 8, and at the same time, the positive resist pattern 7 is exposed (FIG. 2c). Next, after the positive resist pattern 7 is swollen with a developer, it is spray-washed and removed together with the ultraviolet curable resist 8 thereon to obtain a predetermined filter pattern 9 (FIG. 2d). At this time, the positive resist pattern 7 on the bonding pad 6 and the ultraviolet curing resist 8 thereon are also removed at the same time (FIG. 2e).
After pattern formation, post-baking is performed to further complete curing. This post-bake may be replaced by full exposure to ultraviolet light. For the second and subsequent color filter layers, the above ultraviolet curing resist 8 is also used.
The same process as described above may be repeated, only by replacing the cyan organic dye contained in the dye with an organic dye of each color.

In this way, to get the filter pattern,
Since the positive resist pattern 7 having a high γ value and a negligible dark reaction is used, the dimensional accuracy of the pattern is high and the resolution is improved. In this regard, a positive resist pattern 7 with high dimensional accuracy
A filter layer consisting of an ultraviolet curable resist 8 containing an organic dye is formed thereon, and after the positive resist pattern 7 is removed, the portions left in the openings are used to form a desired filter pattern 9 by a lift-off method. Therefore, fogging does not occur in the pattern openings due to reflection from the surface of the Si element during exposure, unlike when the conventional filter pattern itself is formed by direct exposure. Furthermore, since the thickness of the filter layer is determined only by the film thickness at the time of coating, the variation in thickness can be suppressed to about half that of the conventional method in which it is determined through exposure and development. Therefore, the width of variation in spectral characteristics can also be reduced by almost half. Furthermore, since there is no need for a dyeing operation after coating, there is no need to form a protective film when laminating filter layers for the second and subsequent colors.

In addition, in the above-mentioned embodiment, when manufacturing a filter for a single-plate color solid-state image sensor, in particular,
Although only the case of the so-called monolithic method in which the filter is formed directly on the surface of the Si element 1 has been described, the present invention is not limited to this, and can also be applied to, for example, manufacturing a filter for a normal single-tube color image pickup tube. Of course. In that case, the filter
The only difference is that it is formed not on a Si element but on a transparent glass substrate.

As explained above, according to the method for manufacturing a color filter according to the present invention, after applying an ultraviolet curing resin containing an organic dye as a filter layer onto a substrate on which a positive resist pattern is formed in the portion corresponding to the opening of the filter pattern, By peeling off and removing the positive resist pattern along with the filter layer above it to form a desired filter pattern, it is possible to form a pattern with high dimensional accuracy and high resolution, and the variation in spectral characteristics is small and the aperture is covered. This has the excellent effect of forming a color filter without color.

[Brief explanation of the drawing]

FIG. 1 is a sectional view showing a color filter at each step of a conventional manufacturing method, and FIG. 2 is a sectional view showing a color filter at each step of a color filter manufacturing method according to the present invention. 1...Si element, 7...Positive resist pattern,
8...Ultraviolet curable resist, 9...Filter pattern.

Claims (1)

[Claims] 1. A step of applying a positive resist onto a substrate, a step of forming the positive resist into a predetermined pattern by exposure and development, and a step of applying an ultraviolet curable resin containing an organic dye onto the substrate on which the positive resist pattern has been formed. a step of coating the entire surface, a step of exposing the entire surface to ultraviolet rays to cure the ultraviolet curable resin and exposing the positive resist pattern, and peeling and removing the exposed positive resist pattern together with the above ultraviolet curable resin thereon. A method for manufacturing a color filter, comprising the step of forming a filter pattern made of the remaining ultraviolet curable resin.