JPS6199104A - Preparation of color filter - Google Patents

Abstract

PURPOSE:To form a pattern with high precision by forming a photoresist pattern for lift-off on a substrate, coating it with a hardenable colorant and hardening it to forma colorant film, and then, peeling the photoresist pattern together with the colorant film. CONSTITUTION:The whole surface of the substrate is coated with the lift-off photoresist 7, and the photoresist pattern 8 is formed by patternwise exposure and development. The whole surface of the pattern 8 is coated with the mixture 9 of a thermosetting resin and the colorant, and after hardening, the pattern 8 is peeled together with the colorant film 9 to form the color filter pattern of the first hue 10. Likewise, the color filter patterns 14, 18 from the second hue are formed.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for manufacturing a force 2 filter used in color televisions and other color display devices.

<Prior art> As a conventional method for producing color filters, a second person coats a film material 2 on a substrate 1 as shown in the figure with a photosensitive agent, a coloring agent, and gold, and then coats a colored film material 2 on the substrate 1 as shown in the figure. A pattern is exposed using mask 3 as shown in FIG. 2C and developed. A two-color coloring composition 4 is applied thereon (FIG. 2D), followed by pattern exposure and development (FIG. 1423). 'Furthermore, a fifth color coloring composition 5 is applied (Fig. 2F), and a three-color color filter is obtained by pattern exposure and development (Fig. 2F).
Figure G).

<Problems to be solved by the invention> In the above-mentioned conventional technology, a sensitizer is added to the colored film agent, but since the colorant is also included, the sensitivity inevitably deteriorates, so a sensitizer is added. Next time I need it. However, since the sensitizer is colored yellow, it is important to create a color filter with the desired spectral characteristics.In addition, since light is absorbed by the colorant, it is necessary to create a color filter with the desired spectral characteristics. Another drawback is that the agent is difficult to harden, which in turn impairs patterning accuracy.

This invention solves the above-mentioned drawbacks of the prior art, and involves coating and patterning a photoresist for lift-off on a substrate, and applying a coloring agent to a thermosetting resin on the substrate. After applying and curing the colored film agent, the photoresist pattern is peeled off together with the colored film agent thereon to form a color filter pattern.

<Example> A photoresist 7f for lift-off is applied to the entire surface of the substrate 6 (FIG. 1A). Then, an F-photoresist pattern 8 is formed by pattern exposure and development (FIG. 1B). On top of that, a thermosetting resin is mixed with a coloring agent to create a colored film agent of 9 tons.
- Apply 311 cloth to the entire surface (1st C-). Thermosetting resins include polyamide, polyimide, and acrylic resins, and colorants include water-soluble dyes such as oil-soluble dyes and acid dyes. Heat this to harden the colored film agent 9! After the photoresist pattern 8
The film is swollen with a developer, washed with water after cooling, and then peeled off together with the colored film agent 9 to form a first color filter pattern 10t (FIG. 1D). On top of that, a 7-otoresist 11 for lift-off is applied over the entire surface (FIG. 1E). F photoresist pattern 12t for pattern exposure and development
- form (Figure 412).

Apply 13t of second color film agent to the entire surface and cure C8
Figure 10). The photoresist pattern 12 is peeled off together with the colored film agent 15 thereon to form a second color filter pattern 14 (FIG. 1H). Further, a photoresist 15 is coated on top of the photoresist (Fig. 1 I), and a photoresist pattern 16 is formed by pattern exposure and development.
IJ diagram), the third color coloring film agent 17 is dispersed and cured (
Figure 1). The photoresist pattern 16t and the colored film agent 17 thereon are peeled off to form a color filter pattern 18 between three colors (FIG. 1L).

In this way, a three-color filter pattern is completed.

<Effects of the Invention> According to the present invention, since the colored film agent does not contain a photosensitizer or sensitizer, the film agent does not interfere with the coloring agent, and patterning of the color filter is performed using a lift-off photoresist. It can be formed with a good 19 degrees, and furthermore, when dispensing the second and subsequent colors, there is no risk of color mixing because the previously formed nine color filter pattern portions are covered by the photoresist.

[Brief explanation of the drawing]

The 1st person - 1L figure shows the embodiment of the present invention as a process'! The cross-sectional view shown in X and FIGS. 2A-2G are cross-sectional views showing the conventional example in the order of steps. 6...Substrate 8...Photoresist pattern 9...
Colored film agent 10... Color filter pattern --2.
... Photoresist pattern j3 ... Coloring film agent 14 ... Force 2 - Filter pattern 16 ...
... Photoresist pattern 17 ... Coloring film agent

Claims (1)

[Claims] A photoresist pattern for lift-off is formed on a substrate, a colored film agent made of a thermosetting resin with a coloring agent added thereto is applied and cured, and then the photoresist pattern is coated with the colored film agent on it. A method for manufacturing a color filter, which comprises peeling the filter together with the color filter to form a color filter pattern.