JPS5942281B2 - Molding method of fine pattern color filter film - Google Patents

Molding method of fine pattern color filter film

Info

Publication number
JPS5942281B2
JPS5942281B2 JP50071213A JP7121375A JPS5942281B2 JP S5942281 B2 JPS5942281 B2 JP S5942281B2 JP 50071213 A JP50071213 A JP 50071213A JP 7121375 A JP7121375 A JP 7121375A JP S5942281 B2 JPS5942281 B2 JP S5942281B2
Authority
JP
Japan
Prior art keywords
color filter
filter film
mask
fine pattern
decolorizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50071213A
Other languages
Japanese (ja)
Other versions
JPS51147335A (en
Inventor
政行 館脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP50071213A priority Critical patent/JPS5942281B2/en
Publication of JPS51147335A publication Critical patent/JPS51147335A/en
Publication of JPS5942281B2 publication Critical patent/JPS5942281B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は微細パターンの色フィルタ膜、例えば単管式撮
像管例えば、トリニコン(商品名)に用いる色フィルタ
膜の形成方法に係る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a finely patterned color filter film, for example, a color filter film used in a single-tube image pickup tube, such as Trinikon (trade name).

先づ本発明の理解を容易にするために従来の微細パター
ンの色フィルタ膜の形成方法を第1図を参照して説明し
よう。
First, in order to facilitate understanding of the present invention, a conventional method for forming a finely patterned color filter film will be explained with reference to FIG.

第1図Aに示す如く、ガラス等の基板上に所定の色、例
えば緑Gに染色された染色媒体層を全面的に被着する。
次いで、この染色媒体層2の最終的に緑の微細パターン
を得んとする部分以外を脱色する。これがため、染色媒
体層2上に脱色マスク3を最終的に得る緑の微細パター
ンに応じたパターンに被着する。この脱色マスクは例え
ば、フォトレジストを写真技術によつて即ち、レジスト
の全面塗布、露光及び現像処理を経て所定のパターンに
形成し得る。次いで、第1図Bに示す如く、このマスク
層3をマスクとして、染色媒体層2に対して脱色処理を
行う。
As shown in FIG. 1A, a dyeing medium layer dyed in a predetermined color, for example, green G, is entirely deposited on a substrate such as glass.
Next, the dyeing medium layer 2 is decolorized except for the part where a green fine pattern is to be finally obtained. Therefore, a decolorizing mask 3 is deposited on the dyeing medium layer 2 in a pattern corresponding to the green micropattern to be finally obtained. This decolorizing mask can be formed into a predetermined pattern by using a photoresist, for example, by applying a photoresist over the entire surface, exposing it to light, and developing it. Next, as shown in FIG. 1B, using this mask layer 3 as a mask, the dyeing medium layer 2 is subjected to a decoloring process.

このような脱色を行うと、染色によつて、膨潤していた
媒体層2がその脱色によつて収縮するために、陥没部4
が形成される。そして、この場合、脱色のための漂白剤
がマスク層3の窓3aを通じて横方向にも拡散するため
に窓3aの周辺下に入り込んだ陥没部4が生ずる。次い
で、第1図Cに示す如く、マスク層3の窓ワ 3aを通
じて媒体層2に対して他の色例えば赤Rの染色を行う。
When such decolorization is performed, the media layer 2 that has swelled due to dyeing contracts due to the decolorization, so that the depressed portion 4
is formed. In this case, since the bleaching agent for decolorization also diffuses laterally through the window 3a of the mask layer 3, a depressed portion 4 is created which penetrates under the periphery of the window 3a. Next, as shown in FIG. 1C, the medium layer 2 is dyed with another color, for example, red R, through the window 3a of the mask layer 3.

かくすれば、緑の微細パターンを有する緑の色フィルタ
部5Gと赤の微細パターンを有する赤の色フィルタ5R
とが形成された色フィルタ膜5が得られる。5 ところ
が、このような方法によつて得た色フィルタ膜5は第1
図Bに説明したように脱色に際して、その漂白剤がマス
ク層3の窓3a下に入り込んで拡散され、そのため、最
終的に得られたフィルタ膜5の赤の微細パターン5Rが
本来緑の微細0 パターン5Gを形成すべき部分に入り
込んだパターンとなつて高精度のパターンを有するフィ
ルタが得られ難いという欠点がある。
In this way, a green color filter section 5G having a green fine pattern and a red color filter 5R having a red fine pattern.
A color filter film 5 is obtained in which . 5 However, the color filter film 5 obtained by such a method is
As explained in FIG. There is a drawback that the pattern extends into the area where the pattern 5G is to be formed, making it difficult to obtain a filter having a highly accurate pattern.

本発明は、このような欠点のない微細パターンの色フィ
ルタ膜の形成方法を提供せんとするもの5 である。
It is an object of the present invention to provide a method for forming a finely patterned color filter film that is free from such drawbacks.

本発明の一例を第2図を参照して詳細に説明する。An example of the present invention will be explained in detail with reference to FIG.

先づ、第2図Aに示す如く、第1図Aについて説明した
と同様に第2図Aに示す如くガラス等の基板1上に所定
の色例えば緑に染色された染色り 媒体層2を被着する
。この染色媒体層2は前述したと同様に例えばゼラチン
に重クロム酸アンモニウムが混入されて感光性を呈した
ものを露光硬化させ、これを第1の色例えば緑の染料例
えばシアン及び黄の各染料、例えば、シアンの染料とし
ては”5 酸性染料のアシドブリリアントミリンググリ
ーン(商品名、住友化学社製)或いはバテントブルー(
商品名、第1化成社製)、黄の染料としては同様に酸性
染料のスプラノールイエロ一R(商品名、バイエル社製
)を用い得る。そしてこの染色媒体層2上に、第2の色
のパターンを形成すべき部分に窓3aを有する脱色マス
ク3を形成する。この脱色マスク3は、例えばフオトレ
ジストを写真技術即ちレジストの全面塗布、露光硬化、
現像によつて被着する。次いで、第2図Bに示す如く、
脱色マスク層3をマスクとして染色媒体層2に対して脱
色処理例えば過マンガン酸カリを脱色剤(漂白剤)とし
て用いて脱色処理を行うが、特に本発明に於ては、この
脱色をマスク3の窓3aを通じて窓3a下の媒体層2に
対する全厚昧に亘つて脱色するを回避し、その脱色作業
を一部に止める。
First, as shown in FIG. 2A, a dyeing medium layer 2 dyed in a predetermined color, for example, green, is deposited on a substrate 1 made of glass or the like, as shown in FIG. to adhere to. This dyeing medium layer 2 is made by exposing and curing gelatin mixed with ammonium dichromate to exhibit photosensitivity, as described above, and applying a first color such as a green dye such as cyan and yellow dyes. For example, as a cyan dye, ``5'' acid dye Acid Brilliant Milling Green (trade name, manufactured by Sumitomo Chemical Co., Ltd.) or Batent Blue (
(trade name, manufactured by Daiichi Kasei Co., Ltd.); similarly, as the yellow dye, the acidic dye Supranor Yellow 1 R (trade name, manufactured by Bayer AG) may be used. Then, on this dyeing medium layer 2, a decolorizing mask 3 having a window 3a in a portion where a pattern of the second color is to be formed is formed. This decolorization mask 3 can be made by, for example, applying a photoresist using a photographic technique, that is, coating the entire surface of the resist, curing it by exposure to light, etc.
It is deposited by development. Next, as shown in Figure 2B,
Using the decolorizing mask layer 3 as a mask, the dyeing medium layer 2 is decolorized using, for example, potassium permanganate as a decolorizing agent (bleaching agent). This avoids bleaching the entire thickness of the medium layer 2 under the window 3a through the window 3a, and limits the bleaching work to a portion.

即ち、その脱色が窓3aの周辺下に入り込むことがない
程度に云い換えれば脱色による陥没部4が窓3aの周辺
下に入り込むことがない程度に止める。その後、第2図
Cに示す如く、脱色マスク層3上に脱色マスク層13例
えば感光硬化型のフオトレジストを被着する。
That is, the decolorization is prevented from penetrating under the periphery of the window 3a, or in other words, the depressed portion 4 due to decolorization is prevented from penetrating under the periphery of the window 3a. Thereafter, as shown in FIG. 2C, a decolorizing mask layer 13, such as a photoresist of a photosensitive curing type, is deposited on the decolorizing mask layer 3.

この場合特に陥没部4の内周面4aを覆つて形成する。
この陥没部周面4aへの脱色マスク13の被着は特殊の
方法によらずとも、この脱色マスク13の形成に当つて
先に形成した脱色マスク3と同一の露光マスクによつて
露光処理を行えば、陥没部4を有する部分の周面は、か
ぶりによつて露光が行われるので、この部分が硬化され
て現像処理を行つた場合にこの部分にマスク層13が附
着して残る。次いで、第2図Dに示す如く、陥没部4の
底部の媒体2の脱色部2aを更にマスク13を脱色マス
クとして脱色処理を媒体2に対して行い、陥没部4下の
媒体2の全厚昧に亘つてその脱色を行う。
In this case, it is particularly formed to cover the inner circumferential surface 4a of the depressed portion 4.
The decolorizing mask 13 can be attached to the circumferential surface 4a of the depressed portion without using any special method.In forming the decolorizing mask 13, an exposure process is performed using the same exposure mask as the previously formed decolorizing mask 3. If this is done, the peripheral surface of the portion having the recessed portion 4 will be exposed to light by fogging, so that when this portion is hardened and a development process is performed, the mask layer 13 will remain attached to this portion. Next, as shown in FIG. 2D, the decolorizing portion 2a of the medium 2 at the bottom of the recessed portion 4 is further decolorized using the mask 13 as a decolorizing mask, and the entire thickness of the medium 2 below the recessed portion 4 is The color is removed over a long period of time.

このように脱色を行う時は陥没部4の周辺がマスク13
によつて覆われているので、横方向に進行する脱色を効
果的に抑止出来るので、脱色部分のパターンは媒体2の
厚味方向に沿つて、これが横方向の広がりが殆んどなく
行うことが出来るものである。次いで、この染色媒体2
の脱色部2aに第2の色、例えば青Bの染色を行う。
When bleaching is performed in this way, the area around the depression 4 is covered with a mask 13.
Since the decolorization progressing in the horizontal direction can be effectively suppressed, the pattern of the decolorized portion should be carried out along the thickness direction of the medium 2 with almost no spread in the horizontal direction. This is something that can be done. Then this staining medium 2
The decolorized portion 2a is dyed with a second color, for example, blue B.

この場合、脱色された部分に直接的に青の染料によつて
その染色を行うことも出来るが、一旦脱色を行つたもの
に於てはその染色が行いにくいので、この脱色された部
分に新しい染色媒体を被着して、これに例えば、青の染
色を行うことが望ましい。この場合の一例を説明するに
、第2図Eに示す如く、マスク層13上を含んで陥没部
4内に全面的に新しい媒体12例えば、ゼラチンに重ク
ロム酸アンモニウムを混入した材料層を塗布し、基板1
の裏面より露光処理を施す。かくすれば緑の染色パター
ンGを有する部分に於ては、光透過性が低いので、この
部分上に被着された層12は充分な露光が行われず、脱
色された部分上の即ち、陥没部4内の層12のみが充分
に露光される。従つて、次いで、この媒体12に対して
第2図Fに示す如く、青の染色を行うと、露光された部
分即ち陥没部4内の媒体12に対し充分な染色がなされ
る。この青の染料としては、酸性染料の例えばスプラノ
ールシアニンG(バイエル社製、商品名)を用い得る。
その後、第2図Gに示す如く媒体12のマスク13上の
露光硬化が殆んどされていない部分を除去し、マスク1
3及び3を除去する。かくすれば緑の染色Gによる緑の
色フイルタ部5Gと、青の染色Bによる青の色フイルタ
部5Bを有する目的の色フイルタ膜5が得られる。上述
の如く、本発明製法によれば、脱色作業を一度に行うこ
となく途中で停止してその陥没部4の内周壁にマスク1
3を形成して脱色を続行するようにしたので、このマス
ク13によつて側方への脱色の進行を阻止でき所望のパ
ターンの高精度の脱色を行うことが出来、高精度の微細
パターンの色フイルタ部を有する色フイルタ膜を得るこ
とが出来る。
In this case, it is possible to dye the bleached area directly with blue dye, but it is difficult to dye the item once it has been bleached, so a new dye can be applied to the bleached area. It may be desirable to apply a dyeing medium and dye this, for example, in blue. To explain an example of this case, as shown in FIG. 2E, a new medium 12, for example, a layer of material made of gelatin mixed with ammonium dichromate, is applied entirely within the recessed portion 4, including on the mask layer 13. and board 1
Exposure processing is performed from the back side. Thus, in the area with the green dyeing pattern G, the light transmission is low, so that the layer 12 deposited on this area is not sufficiently exposed to light, resulting in a depression or depression on the bleached area. Only layer 12 within section 4 is fully exposed. Therefore, when this medium 12 is then dyed blue as shown in FIG. 2F, the exposed portion of the medium 12, that is, within the depression 4, is sufficiently dyed. As this blue dye, an acidic dye such as Supranor Cyanine G (manufactured by Bayer AG, trade name) can be used.
Thereafter, as shown in FIG.
Remove 3 and 3. In this way, the desired color filter film 5 having a green color filter section 5G by the green staining G and a blue color filter section 5B by the blue staining B can be obtained. As described above, according to the manufacturing method of the present invention, the decoloring work is not performed all at once, but is stopped midway, and the mask 1 is placed on the inner circumferential wall of the recessed portion 4.
3 to continue bleaching, this mask 13 can prevent the progress of bleaching to the side, allowing high-precision bleaching of the desired pattern, and making it possible to form fine patterns with high precision. A color filter film having a color filter portion can be obtained.

又、前述した実施例のように、新しい媒体12を新めて
形成して、ここに第2の色の微細パターン即ち、青の微
細パターンを形成するようになす時は、その染色を良好
に行うことが出来、特性のよい色フイルタ膜を得ること
が出来るものである。
Further, as in the above-described embodiment, when a new medium 12 is newly formed and a fine pattern of the second color, that is, a fine pattern of blue is to be formed thereon, it is necessary to dye the medium well. It is possible to obtain a color filter film with good characteristics.

尚、上述した例に於ては、緑及び青の微細パターンを有
する色フイルタを形成する場合に本発明を適用した場合
であるが、他の色の組合せ、更に2色に限らず3色等の
色フイルタに本発明を適用して同様の効果を奏せしめ得
ること明らかであろつO
In the above example, the present invention is applied to form a color filter having a fine pattern of green and blue, but other color combinations, not only two colors but three colors, etc. It is obvious that the present invention can be applied to color filters to achieve similar effects.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図A乃至Cは従来の微細パターンの色フイルタ膜の
形成方法の工程図、第2図A乃至Gは本発明による微細
パターンの色フイルタ膜の形成方法の一例を示す各工程
の拡大断面図である。 1は基板、2及び12は染色媒体層、3及び13は脱色
マスク、4は脱色陥没部、4aはその内周面、5は色フ
イルタ膜である。
FIGS. 1A to C are process diagrams of a conventional method for forming a finely patterned color filter film, and FIGS. 2A to G are enlarged cross sections of each step showing an example of the method for forming a finely patterned color filter film according to the present invention. It is a diagram. 1 is a substrate, 2 and 12 are dyeing medium layers, 3 and 13 are decolorization masks, 4 is a decolorization depression, 4a is an inner peripheral surface thereof, and 5 is a color filter film.

Claims (1)

【特許請求の範囲】[Claims] 1 基板上に所定の色に染色された染色媒体層を被着形
成し、該染色媒体層の所定部分を脱色してなる微細パタ
ーンの色フィルタ膜の形成方法に於て、上記脱色工程の
途中に於て、脱色部分の陥没部の内周面に脱色マスクを
被着形成して爾後脱色を継続することを特徴とする微細
パターンの色フィルタ膜の形成方法。
1. In a method for forming a color filter film with a fine pattern by depositing a dyeing medium layer dyed in a predetermined color on a substrate and decolorizing a predetermined portion of the dyeing medium layer, during the decoloring step described above, A method for forming a finely patterned color filter film, comprising: forming a decoloring mask on the inner circumferential surface of the recessed portion of the decolorized portion, and then continuing decolorization.
JP50071213A 1975-06-12 1975-06-12 Molding method of fine pattern color filter film Expired JPS5942281B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50071213A JPS5942281B2 (en) 1975-06-12 1975-06-12 Molding method of fine pattern color filter film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50071213A JPS5942281B2 (en) 1975-06-12 1975-06-12 Molding method of fine pattern color filter film

Publications (2)

Publication Number Publication Date
JPS51147335A JPS51147335A (en) 1976-12-17
JPS5942281B2 true JPS5942281B2 (en) 1984-10-13

Family

ID=13454166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50071213A Expired JPS5942281B2 (en) 1975-06-12 1975-06-12 Molding method of fine pattern color filter film

Country Status (1)

Country Link
JP (1) JPS5942281B2 (en)

Also Published As

Publication number Publication date
JPS51147335A (en) 1976-12-17

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