JPH031532U - - Google Patents

Info

Publication number
JPH031532U
JPH031532U JP6052689U JP6052689U JPH031532U JP H031532 U JPH031532 U JP H031532U JP 6052689 U JP6052689 U JP 6052689U JP 6052689 U JP6052689 U JP 6052689U JP H031532 U JPH031532 U JP H031532U
Authority
JP
Japan
Prior art keywords
wafer
dry etching
electrode
light receiving
receiving element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6052689U
Other languages
English (en)
Japanese (ja)
Other versions
JP2522803Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989060526U priority Critical patent/JP2522803Y2/ja
Publication of JPH031532U publication Critical patent/JPH031532U/ja
Application granted granted Critical
Publication of JP2522803Y2 publication Critical patent/JP2522803Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Drying Of Semiconductors (AREA)
JP1989060526U 1989-05-25 1989-05-25 ドライエッチング用終点検出装置 Expired - Lifetime JP2522803Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989060526U JP2522803Y2 (ja) 1989-05-25 1989-05-25 ドライエッチング用終点検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989060526U JP2522803Y2 (ja) 1989-05-25 1989-05-25 ドライエッチング用終点検出装置

Publications (2)

Publication Number Publication Date
JPH031532U true JPH031532U (cs) 1991-01-09
JP2522803Y2 JP2522803Y2 (ja) 1997-01-16

Family

ID=31587965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989060526U Expired - Lifetime JP2522803Y2 (ja) 1989-05-25 1989-05-25 ドライエッチング用終点検出装置

Country Status (1)

Country Link
JP (1) JP2522803Y2 (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5274514U (cs) * 1975-12-01 1977-06-03
WO2009119650A1 (ja) * 2008-03-27 2009-10-01 日本電気株式会社 エッチング終点検出パターンおよびエッチング方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5834309A (ja) * 1981-08-25 1983-02-28 Nok Corp 非接触式面性状測定法
JPS61250520A (ja) * 1985-04-30 1986-11-07 Hoya Corp 液面レベル計
JPS62203335A (ja) * 1986-03-03 1987-09-08 Anelva Corp エツチングモニタ−装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5834309A (ja) * 1981-08-25 1983-02-28 Nok Corp 非接触式面性状測定法
JPS61250520A (ja) * 1985-04-30 1986-11-07 Hoya Corp 液面レベル計
JPS62203335A (ja) * 1986-03-03 1987-09-08 Anelva Corp エツチングモニタ−装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5274514U (cs) * 1975-12-01 1977-06-03
WO2009119650A1 (ja) * 2008-03-27 2009-10-01 日本電気株式会社 エッチング終点検出パターンおよびエッチング方法

Also Published As

Publication number Publication date
JP2522803Y2 (ja) 1997-01-16

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term