JPH0178027U - - Google Patents
Info
- Publication number
- JPH0178027U JPH0178027U JP1987172532U JP17253287U JPH0178027U JP H0178027 U JPH0178027 U JP H0178027U JP 1987172532 U JP1987172532 U JP 1987172532U JP 17253287 U JP17253287 U JP 17253287U JP H0178027 U JPH0178027 U JP H0178027U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- plasma light
- flat plate
- electrodes
- end point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987172532U JPH0178027U (cs) | 1987-11-11 | 1987-11-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987172532U JPH0178027U (cs) | 1987-11-11 | 1987-11-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0178027U true JPH0178027U (cs) | 1989-05-25 |
Family
ID=31464501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987172532U Pending JPH0178027U (cs) | 1987-11-11 | 1987-11-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0178027U (cs) |
-
1987
- 1987-11-11 JP JP1987172532U patent/JPH0178027U/ja active Pending
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