JPH0314333B2 - - Google Patents
Info
- Publication number
- JPH0314333B2 JPH0314333B2 JP58205767A JP20576783A JPH0314333B2 JP H0314333 B2 JPH0314333 B2 JP H0314333B2 JP 58205767 A JP58205767 A JP 58205767A JP 20576783 A JP20576783 A JP 20576783A JP H0314333 B2 JPH0314333 B2 JP H0314333B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- electron beam
- pattern
- film
- positive integer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Silicon Polymers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58205767A JPS6098431A (ja) | 1983-11-04 | 1983-11-04 | パタン形成材料及びパタン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58205767A JPS6098431A (ja) | 1983-11-04 | 1983-11-04 | パタン形成材料及びパタン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6098431A JPS6098431A (ja) | 1985-06-01 |
| JPH0314333B2 true JPH0314333B2 (cg-RX-API-DMAC7.html) | 1991-02-26 |
Family
ID=16512328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58205767A Granted JPS6098431A (ja) | 1983-11-04 | 1983-11-04 | パタン形成材料及びパタン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6098431A (cg-RX-API-DMAC7.html) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2507481B2 (ja) * | 1987-05-21 | 1996-06-12 | 株式会社東芝 | ポリシラン及び感光性組成物 |
| JPH0196222A (ja) * | 1987-10-08 | 1989-04-14 | Uki Gosei Kogyo Co Ltd | 1,2,2−トリメチル−1−(置換フェニル)ポリジシランおよびその製造法 |
| DE68921884T2 (de) * | 1988-12-29 | 1995-08-10 | Canon Kk | Polysilanverbindung und daraus hergestellter elektrophotographischer photorezeptor. |
| US5220181A (en) * | 1989-12-11 | 1993-06-15 | Canon Kabushiki Kaisha | Photovoltaic element of junction type with an organic semiconductor layer formed of a polysilane compound |
| JP4542758B2 (ja) * | 2003-07-17 | 2010-09-15 | 大阪瓦斯株式会社 | コポリシランとその製造方法 |
| JP4702464B2 (ja) * | 2009-03-05 | 2011-06-15 | 富士ゼロックス株式会社 | 電気泳動表示用白色粒子、電気泳動表示媒体、及び電気泳動表示装置 |
-
1983
- 1983-11-04 JP JP58205767A patent/JPS6098431A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6098431A (ja) | 1985-06-01 |
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