JPH031390B2 - - Google Patents
Info
- Publication number
- JPH031390B2 JPH031390B2 JP2124888A JP2124888A JPH031390B2 JP H031390 B2 JPH031390 B2 JP H031390B2 JP 2124888 A JP2124888 A JP 2124888A JP 2124888 A JP2124888 A JP 2124888A JP H031390 B2 JPH031390 B2 JP H031390B2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- electrolyte
- liquid
- space
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 73
- 239000003792 electrolyte Substances 0.000 claims description 46
- 239000008151 electrolyte solution Substances 0.000 claims description 33
- 239000011888 foil Substances 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 238000005868 electrolysis reaction Methods 0.000 claims description 9
- 239000000243 solution Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 18
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 15
- 229910001882 dioxygen Inorganic materials 0.000 description 15
- 239000007789 gas Substances 0.000 description 15
- 239000011889 copper foil Substances 0.000 description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 5
- 230000009172 bursting Effects 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 4
- 229910000457 iridium oxide Inorganic materials 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000003595 mist Substances 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011133 lead Substances 0.000 description 2
- 239000012811 non-conductive material Substances 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- BQJTUDIVKSVBDU-UHFFFAOYSA-L copper;sulfuric acid;sulfate Chemical compound [Cu+2].OS(O)(=O)=O.[O-]S([O-])(=O)=O BQJTUDIVKSVBDU-UHFFFAOYSA-L 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Electrolytic Production Of Metals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2124888A JPH01198495A (ja) | 1988-02-02 | 1988-02-02 | 電解金属箔の製造方法とそれに用いる装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2124888A JPH01198495A (ja) | 1988-02-02 | 1988-02-02 | 電解金属箔の製造方法とそれに用いる装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01198495A JPH01198495A (ja) | 1989-08-10 |
JPH031390B2 true JPH031390B2 (enrdf_load_stackoverflow) | 1991-01-10 |
Family
ID=12049760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2124888A Granted JPH01198495A (ja) | 1988-02-02 | 1988-02-02 | 電解金属箔の製造方法とそれに用いる装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01198495A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3281783B2 (ja) | 1995-12-06 | 2002-05-13 | 三井金属鉱業株式会社 | プリント配線板用銅箔、その製造法及び電解装置 |
US6183607B1 (en) * | 1999-06-22 | 2001-02-06 | Ga-Tek Inc. | Anode structure for manufacture of metallic foil |
-
1988
- 1988-02-02 JP JP2124888A patent/JPH01198495A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH01198495A (ja) | 1989-08-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |