JPH0313895B2 - - Google Patents
Info
- Publication number
- JPH0313895B2 JPH0313895B2 JP57060958A JP6095882A JPH0313895B2 JP H0313895 B2 JPH0313895 B2 JP H0313895B2 JP 57060958 A JP57060958 A JP 57060958A JP 6095882 A JP6095882 A JP 6095882A JP H0313895 B2 JPH0313895 B2 JP H0313895B2
- Authority
- JP
- Japan
- Prior art keywords
- grid
- radiation
- pattern
- collimator
- photosensitive member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005855 radiation Effects 0.000 claims description 41
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 239000011159 matrix material Substances 0.000 claims description 11
- 229920003051 synthetic elastomer Polymers 0.000 claims description 11
- 239000005061 synthetic rubber Substances 0.000 claims description 11
- 238000005260 corrosion Methods 0.000 claims description 9
- 230000007797 corrosion Effects 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 239000006089 photosensitive glass Substances 0.000 description 26
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 16
- 238000010586 diagram Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229920000181 Ethylene propylene rubber Polymers 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229910020816 Sn Pb Inorganic materials 0.000 description 1
- 229910020922 Sn-Pb Inorganic materials 0.000 description 1
- 229910008783 Sn—Pb Inorganic materials 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000011960 computer-aided design Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000002601 radiography Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Apparatus For Radiation Diagnosis (AREA)
- Measurement Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57060958A JPS58177637A (ja) | 1982-04-14 | 1982-04-14 | 放射線用グリツドの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57060958A JPS58177637A (ja) | 1982-04-14 | 1982-04-14 | 放射線用グリツドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58177637A JPS58177637A (ja) | 1983-10-18 |
| JPH0313895B2 true JPH0313895B2 (ko) | 1991-02-25 |
Family
ID=13157413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57060958A Granted JPS58177637A (ja) | 1982-04-14 | 1982-04-14 | 放射線用グリツドの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58177637A (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63231288A (ja) * | 1987-03-20 | 1988-09-27 | Hitachi Medical Corp | Ｘ線ｃｔ用ｘ線検出器 |
| US6408054B1 (en) * | 1999-11-24 | 2002-06-18 | Xerox Corporation | Micromachined x-ray image contrast grids |
| ATE492887T1 (de) * | 2005-09-19 | 2011-01-15 | Koninkl Philips Electronics Nv | Gitter für selektive absorption elektromagnetischer strahlung und herstellungsverfahren dafür |
| JP2009036259A (ja) * | 2007-07-31 | 2009-02-19 | Kayaba Ind Co Ltd | 緩衝器 |
| JP5059521B2 (ja) * | 2007-08-29 | 2012-10-24 | 株式会社放電精密加工研究所 | 散乱線除去グリッドの製造方法 |
| JP2011137665A (ja) * | 2009-12-26 | 2011-07-14 | Canon Inc | シンチレータパネル及び放射線撮像装置とその製造方法、ならびに放射線撮像システム |
| WO2012057371A1 (ko) * | 2010-10-26 | 2012-05-03 | 주식회사 아임 | 엑스레이 그리드 및 그 제조방법 |
-
1982
- 1982-04-14 JP JP57060958A patent/JPS58177637A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58177637A (ja) | 1983-10-18 |
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