JPH03119052A - Epoxy resin composition - Google Patents
Epoxy resin compositionInfo
- Publication number
- JPH03119052A JPH03119052A JP25840989A JP25840989A JPH03119052A JP H03119052 A JPH03119052 A JP H03119052A JP 25840989 A JP25840989 A JP 25840989A JP 25840989 A JP25840989 A JP 25840989A JP H03119052 A JPH03119052 A JP H03119052A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- present
- group
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 67
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 67
- 239000000203 mixture Substances 0.000 title claims abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 10
- -1 bismaleimide compound Chemical class 0.000 claims abstract description 9
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 9
- 239000005350 fused silica glass Substances 0.000 claims abstract description 9
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 8
- 229920003192 poly(bis maleimide) Polymers 0.000 claims abstract description 7
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims abstract 4
- 235000010290 biphenyl Nutrition 0.000 claims abstract 2
- 239000004305 biphenyl Substances 0.000 claims abstract 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 8
- 229920005989 resin Polymers 0.000 abstract description 7
- 239000011347 resin Substances 0.000 abstract description 7
- OZRVXYJWUUMVOW-UHFFFAOYSA-N 2-[[4-[4-(oxiran-2-ylmethoxy)phenyl]phenoxy]methyl]oxirane Chemical group C1OC1COC(C=C1)=CC=C1C(C=C1)=CC=C1OCC1CO1 OZRVXYJWUUMVOW-UHFFFAOYSA-N 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 description 22
- 238000005476 soldering Methods 0.000 description 14
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 12
- 229920003986 novolac Polymers 0.000 description 12
- 238000002156 mixing Methods 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 5
- 229930003836 cresol Natural products 0.000 description 5
- 238000005538 encapsulation Methods 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 150000004668 long chain fatty acids Chemical class 0.000 description 4
- 238000011417 postcuring Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 2
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 239000004844 aliphatic epoxy resin Substances 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- ZJWDQBQYAMVXCD-UHFFFAOYSA-N 2-[[1-(oxiran-2-ylmethoxy)-4-phenylcyclohexa-2,4-dien-1-yl]oxymethyl]oxirane Chemical group C1OC1COC(C=C1)(OCC2OC2)CC=C1C1=CC=CC=C1 ZJWDQBQYAMVXCD-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- BVURNMLGDQYNAF-UHFFFAOYSA-N dimethyl(1-phenylethyl)amine Chemical compound CN(C)C(C)C1=CC=CC=C1 BVURNMLGDQYNAF-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 239000012772 electrical insulation material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- IKGXNCHYONXJSM-UHFFFAOYSA-N methanolate;zirconium(4+) Chemical compound [Zr+4].[O-]C.[O-]C.[O-]C.[O-]C IKGXNCHYONXJSM-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は半田耐熱性、信頼性および成形性に優れ、半導
体封止用として好適な性能を有するエポキシ系樹脂組成
物に関するものである。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to an epoxy resin composition that has excellent solder heat resistance, reliability, and moldability, and has properties suitable for semiconductor encapsulation.
〈従来の技術〉
エポキシ樹脂は耐熱性、耐湿性、電気特性および接着性
などに優れており、さら・に配合処方により種々の特性
が付与できるため、塗料、接着剤および電気絶縁材料な
どの工業材料として有効に利用されている。<Conventional technology> Epoxy resins have excellent heat resistance, moisture resistance, electrical properties, and adhesive properties, and can be imparted with various properties depending on the formulation, so they are used in industrial applications such as paints, adhesives, and electrical insulation materials. It is effectively used as a material.
たとえば、半導体装置などの電子回路部品の封止方法と
しては、従来より金属やセラミックスによるハーメチッ
クシールやフェノール樹脂、シリコーン樹脂およびエポ
キシ樹脂などによる樹脂封止が提案されているが、経済
性、生産性および物性などのバランスの点からエポキシ
樹脂による樹脂封止が中心になっている。For example, as methods for encapsulating electronic circuit components such as semiconductor devices, hermetic seals using metals and ceramics, and resin encapsulation using phenolic resins, silicone resins, and epoxy resins have been proposed. Resin sealing using epoxy resin has become the main method due to the balance of physical properties and other properties.
そして、最近ではプリント基板への部品実装においても
高密度化、自動化が進められており。Recently, higher density and automation have been promoted in the mounting of components onto printed circuit boards.
従来のリードピンを基板の穴に挿入する“挿入実装方式
゛に代り、基板表面に部品を半田付けする゛°表面実装
方弐°゛がさかんになってきているが、それにともなっ
てパッケージも従来のDIP(デュアル・インライン・
パッケージ)型から高密度実装、表面実装に適した薄型
のFPP(フラット・プラスチック・パッケージ)型に
移行しつつある。In place of the conventional "insertion mounting method," in which lead pins are inserted into holes in the board, surface mounting methods, in which components are soldered to the surface of the board, are becoming popular. DIP (Dual Inline)
There is a shift from the FPP (Flat Plastic Package) type to the thin FPP (Flat Plastic Package) type, which is suitable for high-density packaging and surface mounting.
しかるに、表面実装方式への移行にともない、従来あま
り問題とならなかった半田付は工程が大きな問題となっ
てきている。However, with the shift to surface mount methods, the soldering process, which used to be less of a problem, has become a major problem.
すなわち、従来のビン挿入実装方式では半田付は工程は
リード部が部分的に加熱されるだけであったが、表面実
装方式ではパッケージ全体が熱媒に浸され加熱されるた
め、半田浴浸漬、不活性ガスの飽和蒸気による加熱(ベ
ーパフェイズ法)および赤外線リフロー法などによる半
田付は方法においては、いずれの方法でもパッケージ全
体が210〜270℃の高温に加熱されることになり、
従来の封止用樹脂で封止したパッケージでは半田付は時
に樹脂部分にクラックが発生し、信頼性が低下して製品
として使用できないという問題がおきるのである。In other words, in the conventional bottle insertion mounting method, the soldering process only partially heats the leads, but in the surface mounting method, the entire package is immersed in a heating medium and heated, so it requires immersion in a solder bath, In soldering methods such as heating with saturated steam of inert gas (vapor phase method) and infrared reflow method, the entire package is heated to a high temperature of 210 to 270 ° C.
In packages sealed with conventional sealing resin, cracks sometimes occur in the resin part during soldering, resulting in lower reliability and the problem that the package cannot be used as a product.
半田付は工程におけるクラックの発生は、後硬化してか
ら実装工程の間までに吸湿された水分が半田付は加熱時
に爆発的に水蒸気化、膨張することに起因するといわれ
ており、その対策として後硬化したパッケージを完全に
乾燥し密封した容器に収納して出荷する方法が用いられ
ている。It is said that the occurrence of cracks in the soldering process is due to moisture absorbed between the post-curing process and the mounting process explosively turning into water vapor and expanding when soldering is heated. A method is used in which the post-cured package is completely dried, stored in a sealed container, and shipped.
一方、封止用樹脂の改良も種々検討されており、たとえ
ば、封止用樹脂にゴム成分を配合し内部応力を低下させ
る方法(特開昭58−219218号公報、特開昭59
−96122号公報)、シリコーンオイルの配合により
低応力化させる方法、(特開昭62−254454号公
報。On the other hand, various improvements have been made to the sealing resin. For example, a method of blending a rubber component into the sealing resin to reduce internal stress (JP-A-58-219218, JP-A-59
96122), a method of reducing stress by blending silicone oil (Japanese Patent Laid-Open No. 62-254454).
特開昭62−296449号公報、特公昭63−328
07号公報)および高Tgが得られるポリイミド系封止
材などが提案されている。Japanese Patent Publication No. 62-296449, Japanese Patent Publication No. 63-328
No. 07) and polyimide-based sealing materials that provide a high Tg have been proposed.
〈発明が解決しようとする課題〉
しかるに、半田耐熱性を改良するなめに乾燥パッケージ
を容器に封入する方法は製造工程および製品の取扱作業
が煩雑になるうえ、製品価格がきわめて高価になるとい
う欠点がある。<Problems to be Solved by the Invention> However, the method of enclosing a dry package in a container in order to improve soldering heat resistance has the drawbacks of complicating the manufacturing process and handling of the product, and making the product extremely expensive. There is.
また、従来提案されているポリイミド封止剤は、成形性
、流動性、後硬化性等に問題があり、半田耐熱性におい
ても不十分であるため、いまだに実用化されていない。Further, the polyimide sealants that have been proposed so far have problems with moldability, fluidity, post-curing properties, etc., and are also insufficient in soldering heat resistance, so they have not yet been put into practical use.
そこで本発明は、半田付は工程で生じるクラックの問題
を解消し、成形性、流動性および後硬化性等を改善した
半導体封止用樹脂組成物の収得を課題とする。Therefore, the object of the present invention is to obtain a resin composition for semiconductor encapsulation that solves the problem of cracks that occur during the soldering process and has improved moldability, fluidity, post-curing properties, and the like.
したがって本発明の目的は、半田耐熱性、信頼性および
成形性が均衡して優れたエポキシ樹脂含有組成物を提供
することにあり、表面実装できる樹脂封止半導体装置の
実現を可能にすることにある。Therefore, an object of the present invention is to provide an epoxy resin-containing composition that is excellent in solder heat resistance, reliability, and moldability in a well-balanced manner, and to make it possible to realize a resin-sealed semiconductor device that can be surface mounted. be.
く課題を解決するための手段〉
本発明者らは、上記の目的を達成するために鋭意検討し
た結果、低応力化剤として変性シリコーン化合物を使用
するとともに、さらにビスマレイミド化合物を混合する
ことにより、上記目的に合致したエポキシ系樹脂組成物
が得られることを見出し、本発明に到達した。Means for Solving the Problems> As a result of intensive studies to achieve the above object, the present inventors have found that by using a modified silicone compound as a stress reducing agent and further mixing a bismaleimide compound. The inventors have discovered that an epoxy resin composition meeting the above objectives can be obtained, and have arrived at the present invention.
すなわち本発明は、エポキシ樹脂(A)、硬化剤(B)
、変性シリコーン化合物(C)、溶融シリカ(D>およ
びビスマレイミドを必須成分とすることを特徴とするエ
ポキシ系樹脂組成物に関するものであり、さらに上記エ
ポキシ樹脂(A)が下記式(I)
(ただし、R1−R8は水素原子、01〜C4の低級ア
ルキル基またはハロゲン原子を示す。〉で表わされる骨
格を有するエポキシ樹脂(A゛)を必須成分として含有
するエポキシ系樹脂組成物を提供するものである。That is, the present invention comprises an epoxy resin (A), a curing agent (B)
, a modified silicone compound (C), fused silica (D>, and bismaleimide) as essential components, and the epoxy resin (A) has the following formula (I) ( Provided that R1 to R8 represent a hydrogen atom, a lower alkyl group of 01 to C4, or a halogen atom. It is.
以下、本発明の構成を詳述する。Hereinafter, the configuration of the present invention will be explained in detail.
本発明におけるエポキシ樹脂(A>は、1分子中にエポ
キシ基を2個以上有するものであれば特に限定されない
。The epoxy resin (A>) in the present invention is not particularly limited as long as it has two or more epoxy groups in one molecule.
たとえば、クレゾールノボラック型エポキシ樹脂、フェ
ノールノボラック型エポキシ樹脂、ビスヒドロキシビフ
ェニル型エポキシ樹脂、ビスフェノールA型エポキシ樹
脂、線状脂肪族エポキシ樹脂、脂環式エポキシ樹脂、複
素環式エポキシ樹脂、ハロゲン化エポキシ樹脂およびス
ピロ環含有エポキシ樹脂などが挙げられる。For example, cresol novolac type epoxy resin, phenol novolac type epoxy resin, bishydroxybiphenyl type epoxy resin, bisphenol A type epoxy resin, linear aliphatic epoxy resin, alicyclic epoxy resin, heterocyclic epoxy resin, halogenated epoxy resin and spiro ring-containing epoxy resins.
用途によっては二種以上のエポキシ樹脂を併用してもよ
いが、半導体装置封止用としては耐熱性、耐湿性の点か
らクレゾールノボラック型エポキシ樹脂、ビスヒドロキ
シビフェニル型エポキシ樹脂などのエポキシ当量が50
0以下、特に300以下のエポキシ樹脂を全エポキシ樹
脂中に50重量%以上含むことが好ましい。Depending on the application, two or more types of epoxy resins may be used in combination, but for semiconductor device encapsulation, cresol novolac type epoxy resins, bishydroxybiphenyl type epoxy resins, etc. with an epoxy equivalent of 50 are preferred in terms of heat resistance and moisture resistance.
It is preferable that the total epoxy resin contains 50% by weight or more of an epoxy resin having a molecular weight of 0 or less, particularly 300 or less.
本発明において、エポキシ樹脂(A)が下記式(I>
(ただし、R1−R8は水素原子、C工〜C4の低級ア
ルキル基またはハロゲン原子を示す。)で表わされる骨
格を有するエポキシ樹脂(A゛)を必須成分として含有
することは好ましい。エポキシ樹脂(ANを含有させる
ことにより、流動性を一層向上することができる。In the present invention, the epoxy resin (A) has a skeleton represented by the following formula (I> (where R1-R8 represent a hydrogen atom, a C-C4 lower alkyl group, or a halogen atom). It is preferable to contain the epoxy resin (AN) as an essential component.By containing the epoxy resin (AN), the fluidity can be further improved.
上記式(1)で表わされるエポキシ樹脂(A゛)におい
てR1−R8の好ましい具体例としては、水素原子、メ
チル基、エチル基、プロピル基、i−プロピル基、ブチ
ル基、5ec−ブチル基、tert−ブチル基、塩素原
子および臭素原子などが挙げられる。Preferred specific examples of R1-R8 in the epoxy resin (A') represented by the above formula (1) include a hydrogen atom, a methyl group, an ethyl group, a propyl group, an i-propyl group, a butyl group, a 5ec-butyl group, Examples include tert-butyl group, chlorine atom and bromine atom.
本発明におけるエポキシ樹脂(ANの好ましい具体例と
しては、4.4−一ビス(2,3−エポキシプロポキシ
)ビフェニル、4,4゛−ビス(2,3−エポキシプロ
ポキシ)−3゜3−.5.5−−テトラメチルビフェニ
ル、4゜4゛−ビス(2,3−エポキシプロポキシ)3
.3−.5.5−−テトラメチル−2−クロロビフェニ
ル、4.4−一ビス(2,3−エポキシプロポキシ)−
3,1,5,5”−テトラメチル−2−ブロモビフェニ
ル、4.4ビス(2,3−エポキシプロポキシ)−3,
35,5′−テトラエチルビフェニルおよび4.4゛−
ビス(2,3−エポキシ10ボキシ)−3,1,5,5
−−テトラブチルビフェニルなどが挙げられる。Preferred specific examples of the epoxy resin (AN in the present invention) include 4,4-bis(2,3-epoxypropoxy)biphenyl, 4,4'-bis(2,3-epoxypropoxy)-3'3-. 5.5-Tetramethylbiphenyl, 4゜4゛-bis(2,3-epoxypropoxy)3
.. 3-. 5.5-Tetramethyl-2-chlorobiphenyl, 4.4-bis(2,3-epoxypropoxy)-
3,1,5,5”-tetramethyl-2-bromobiphenyl, 4.4bis(2,3-epoxypropoxy)-3,
35,5'-tetraethylbiphenyl and 4,4'-
Bis(2,3-epoxy 10boxy)-3,1,5,5
--tetrabutylbiphenyl and the like.
本発明において、エポキシ樹脂(A)にエポキシ樹脂(
AIを必須成分として含有せしめる場合、エポキシ樹脂
(A>は、エポキシ樹脂(A“)とともにエポキシ樹脂
(Ai以外の他のエポキシ樹脂をも併用して含有するこ
とができる。併用できる他のエポキシ樹脂としては、た
とえばクレゾールノボラック型エポキシ樹脂、フェノー
ルノボラック型エポキシ樹脂、下記式(I[)で表わさ
れるノボラック型エポキシ樹脂(ただし、nは0以上の
整数を示す。)ビスフェノールAやレゾルシンなどから
合成される各種ノボラック型エポキシ樹脂、ビスフェノ
ールA型エポキシ樹脂、線状脂肪族エポキシ樹脂、脂環
式エポキシ樹脂および複素環式エポキシ樹脂などが挙げ
られる。In the present invention, the epoxy resin (A) is added to the epoxy resin (A).
When containing AI as an essential component, the epoxy resin (A>) may contain an epoxy resin other than the epoxy resin (Ai) together with the epoxy resin (A"). Other epoxy resins that can be used in combination For example, cresol novolac type epoxy resin, phenol novolac type epoxy resin, novolac type epoxy resin represented by the following formula (I[) (where n is an integer of 0 or more) synthesized from bisphenol A, resorcin, etc. Examples include various novolac type epoxy resins, bisphenol A type epoxy resins, linear aliphatic epoxy resins, alicyclic epoxy resins, and heterocyclic epoxy resins.
エポキシ樹脂(A−)を使用する場合、エポキシ樹脂(
A)中に含有されるエポキシ樹脂(A′)の割合に関し
ては特に制限がなく、必須成分としてエポキシ樹脂(A
Nが含有されれば本発明の効果は発揮されるが、より十
分な効果を発揮させるためには、エポキシ樹脂(A′)
をエポキシ樹脂(A>中に通常50重量%以上、好まし
くは70重量%以上、特に好ましくは90重量%以上含
有せしめる必要がある。When using epoxy resin (A-), epoxy resin (
There is no particular restriction on the proportion of the epoxy resin (A') contained in A), and the epoxy resin (A') is included as an essential component.
The effect of the present invention is exhibited if N is contained, but in order to exhibit a more sufficient effect, the epoxy resin (A')
must be contained in the epoxy resin (A) in an amount of usually 50% by weight or more, preferably 70% by weight or more, particularly preferably 90% by weight or more.
本発明における硬化剤(B>としてはエポキシ樹脂(A
>と反応して硬化させるものであれば特に限定されない
。In the present invention, the curing agent (B>) is an epoxy resin (A
It is not particularly limited as long as it can be cured by reacting with >.
たとえば、フェノールノボラック、クレゾールノボラッ
クなどのノボラック樹脂、テトラブロムビスフェノール
Aなどのビスフェノール化合物、無水マレイン酸、無水
フタル酸、無水ピロメリット酸などの酸無水物およびメ
タフェニレンジアミン、ジアミノジフェニルメタン、ジ
アミノジフェニルスルホンなどの芳香族アミンなどが挙
げられる。なかでも半導体装置封止用としでは耐熱性、
保存性の点からフェノールノボラック、クレゾールノボ
ラックが好ましく用いられる。用途によっては二種以上
の硬化剤を併用してもよい。For example, novolac resins such as phenol novolac and cresol novolac, bisphenol compounds such as tetrabromobisphenol A, acid anhydrides such as maleic anhydride, phthalic anhydride, and pyromellitic anhydride, and metaphenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, etc. aromatic amines, etc. Among them, for semiconductor device encapsulation, heat resistance,
Phenol novolak and cresol novolak are preferably used from the viewpoint of preservability. Depending on the application, two or more types of curing agents may be used together.
本発明において硬化剤(B)の配合量は通常、2〜15
重量%である。In the present invention, the blending amount of the curing agent (B) is usually 2 to 15
Weight%.
さらには、エポキシ樹脂(A)と硬化剤(B)の配合比
は、機械的性質、耐湿性の点から(A)に対する(B)
の化学当量比が0.5〜1.6、特に0.7〜1.3の
範囲にあることが好ましい。また、本発明においてエポ
キシ樹脂(A)と硬化剤(B)の硬化反応を促進するた
め硬化触媒を用いてもよい。硬化触媒は硬化反応を促進
させるものならば特に限定されない。たとえば、2−メ
チルイミダゾール、2.4−ジメチルイミダゾール、2
−エチル−4−メチルイミダゾール、2−フェニルイミ
ダゾール、2−フェニル−4−メチルイミダゾール、2
−ヘプタデシルイミダゾールなどのイミダゾール類、ト
リエチルアミン、ベンジルジメチルアミン、α−メチル
ベンジルジメチルアミン、2−(ジメチルアミノメチル
)フェノール、2,4.6−トリス(ジメチルアミノメ
チル)フェノール、1.8−ジアザビシクロ(5,4,
O)ウンデセン−7などの3級アミン類、ジルコニウム
テトラメトキシド、ジルコニウムテトラプロポキシド、
テトラキス(アセチルアセトナト)ジルコニウム、トリ
(アセチルアセトナト)アルミニウムなどの有機金属類
およびトリフェニルホスフィン、トリエチルポスフィン
、トリブチルホスフィン、トリメチルホスフィン、トリ
(p−メチルフェニル)ホスフィン、l・す(ノニルフ
ェニル)ホスフィンなどの有機ホスフィン類などが挙げ
られる。これらの硬化触媒は、用途によっては二種以上
を併用してもよく、その添加量はエポキシ樹脂(A)1
00重量部に対して0.1〜10重足部の範囲が好まし
い。Furthermore, the mixing ratio of the epoxy resin (A) and the curing agent (B) should be adjusted to (B) to (A) from the viewpoint of mechanical properties and moisture resistance.
The chemical equivalent ratio of is preferably in the range of 0.5 to 1.6, particularly 0.7 to 1.3. Further, in the present invention, a curing catalyst may be used to promote the curing reaction between the epoxy resin (A) and the curing agent (B). The curing catalyst is not particularly limited as long as it promotes the curing reaction. For example, 2-methylimidazole, 2,4-dimethylimidazole, 2
-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2
- Imidazoles such as heptadecylimidazole, triethylamine, benzyldimethylamine, α-methylbenzyldimethylamine, 2-(dimethylaminomethyl)phenol, 2,4.6-tris(dimethylaminomethyl)phenol, 1,8-diazabicyclo (5, 4,
O) Tertiary amines such as undecene-7, zirconium tetramethoxide, zirconium tetrapropoxide,
Organic metals such as tetrakis(acetylacetonato)zirconium and tri(acetylacetonato)aluminum, and triphenylphosphine, triethylphosphine, tributylphosphine, trimethylphosphine, tri(p-methylphenyl)phosphine, l.su(nonylphenyl) ) Examples include organic phosphines such as phosphine. These curing catalysts may be used in combination of two or more types depending on the application, and the amount added is 1 epoxy resin (A).
The range of 0.1 to 10 parts by weight per 00 parts by weight is preferable.
本発明における変性シリコーン化合物(C)とは、オル
ガノポリシロキサン構造の化合物であり、具体例として
は下記式の構造を有するものが挙げられる。The modified silicone compound (C) in the present invention is a compound having an organopolysiloxane structure, and specific examples thereof include those having the structure of the following formula.
(R工〜R5は水素、炭素数1〜20のアルキル基、フ
ェニル基およびビニル基から選ばれた一種以上の官能基
、X、Yは炭素数1〜20のアルキル基、フェニル基、
ビニル基、水酸基、アミノ基、エポキシ基、カルボキシ
ル基、メルカプト基、ポリオキシアルキレン基、アルコ
キシ基およびフッ素原子から選ばれた一種以上の基およ
び/または原子を有する官能基であり、Yは水素でもよ
い。また、mは1以上の整数、nは0以上の整数を示す
。)
この変性シリコーン化合物(C)の添加量は、通常0.
01〜5重量%、好ましくは0.1〜3重量%、特に0
.3〜2重量%の範囲が半田耐熱性および作業性の点で
好ましい。(R~R5 is hydrogen, one or more functional groups selected from a C1-C20 alkyl group, a phenyl group, and a vinyl group, X and Y are a C1-C20 alkyl group, a phenyl group,
A functional group having one or more groups and/or atoms selected from a vinyl group, a hydroxyl group, an amino group, an epoxy group, a carboxyl group, a mercapto group, a polyoxyalkylene group, an alkoxy group, and a fluorine atom, and Y may also be hydrogen. good. Further, m represents an integer of 1 or more, and n represents an integer of 0 or more. ) The amount of this modified silicone compound (C) added is usually 0.
01-5% by weight, preferably 0.1-3% by weight, especially 0
.. A range of 3 to 2% by weight is preferable in terms of soldering heat resistance and workability.
本発明における溶融シリカ(D)は、その平均粒径が2
0μm以下であることが望ましく、破砕溶融シリカおよ
び球状溶融シリカのいずれかを単独、あるいは組合わせ
て用いることができる。The fused silica (D) in the present invention has an average particle size of 2
The diameter is preferably 0 μm or less, and either crushed fused silica or spherical fused silica can be used alone or in combination.
本発明において、溶融シリカの配合量は60〜80重量
%、特に65〜80重量%の範囲が好適であり、60重
景%未満では、半田耐熱性が不十分であり、80重星%
を越えると流動性が低下し、成形が困難になるため好ま
しくない。In the present invention, the blending amount of fused silica is preferably in the range of 60 to 80% by weight, particularly 65 to 80% by weight; if it is less than 60%, the soldering heat resistance will be insufficient, and 80% by weight.
Exceeding this is not preferable because fluidity decreases and molding becomes difficult.
本発明においては、溶融シリカ(D)をシランカップリ
ング剤やチタネートカップリング剤などのカップリング
剤であらかじめ表面処理することが、耐湿性および機械
的性質の点で好ましい。In the present invention, it is preferable to surface-treat the fused silica (D) with a coupling agent such as a silane coupling agent or a titanate coupling agent in advance in terms of moisture resistance and mechanical properties.
本発明で使用するビスマレイミド化合物(E)としては
、無水マレイン酸と芳香族ジアミンとの反応によって得
られる化合物あるいはこれをアミンやトリアジンなどで
変性した化合物などが挙げられ、ビスマレイミド基を有
するものであれば特に限定されない。The bismaleimide compound (E) used in the present invention includes a compound obtained by the reaction of maleic anhydride and an aromatic diamine, or a compound obtained by modifying this with an amine or triazine, etc., and a compound having a bismaleimide group. If so, there are no particular limitations.
本発明におけるビスマレイミド化合物(E)の配合量は
、エポキシ樹脂(A)に対して30〜70重量%、特に
40〜60重量%の範囲が好ましく、30重量%以下で
は半田耐熱性が不十分となり、70重量%以上では流動
性が低下し、成形が困難となるため好ましくない。The blending amount of the bismaleimide compound (E) in the present invention is preferably in the range of 30 to 70% by weight, particularly 40 to 60% by weight based on the epoxy resin (A), and if it is less than 30% by weight, the soldering heat resistance is insufficient. Therefore, if it exceeds 70% by weight, fluidity decreases and molding becomes difficult, which is not preferable.
本発明のエポキシ系樹脂組成物には、結晶性シリカ、炭
酸カルシウム、炭酸マグネシウム、アルミナ、マグネシ
ア、クレー、タルク、ケイ酸カルシウム、酸化チタン、
アスベスト、ガラス繊維などの充填剤、ハロゲン化エポ
キシ樹脂などのハロゲン化合物、リン化合物などの難燃
剤、三酸化アンチモンなどの難燃助剤、カーボンブラッ
ク、酸化鉄などの着色剤、シリコーンオイル、変成ニト
リルゴム、変成ポリブタジェンゴムなどのエラストマー
、シランカップリング剤、チタネートカップリング剤な
どのカップリング剤、長鎖脂肪酸、長鎖脂肪酸の金属塩
、長鎖脂肪酸のエステル、長鎖脂肪酸のアミド、パラフ
ィンワックスなどの離型剤および有機過酸化物などの架
橋剤を任意に添加することができる。The epoxy resin composition of the present invention includes crystalline silica, calcium carbonate, magnesium carbonate, alumina, magnesia, clay, talc, calcium silicate, titanium oxide,
Fillers such as asbestos and glass fibers, halogen compounds such as halogenated epoxy resins, flame retardants such as phosphorus compounds, flame retardant aids such as antimony trioxide, colorants such as carbon black and iron oxide, silicone oil, modified nitrile Rubber, elastomers such as modified polybutadiene rubber, coupling agents such as silane coupling agents and titanate coupling agents, long chain fatty acids, metal salts of long chain fatty acids, esters of long chain fatty acids, amides of long chain fatty acids, paraffins Mold release agents such as waxes and crosslinking agents such as organic peroxides can optionally be added.
本発明のエポキシ系樹脂組成物は溶融混練することが好
ましく、溶融混練は公知の方法を用いることができる。The epoxy resin composition of the present invention is preferably melt-kneaded, and a known method can be used for the melt-kneading.
たとえば、バンバリーミキサ−、ニーダ−、ロール、−
軸もしくは二軸の押出機、コニーダーなどを用い、通常
50〜150℃の温度で樹脂組成物とすることができる
。For example, Banbury mixer, kneader, roll,
A resin composition can be prepared using a screw or twin screw extruder, a co-kneader, etc., usually at a temperature of 50 to 150°C.
〈実施例〉 以下、実施例により本発明を具体的に説明する。<Example> Hereinafter, the present invention will be specifically explained with reference to Examples.
実施例中の部数は重量部を意味する。The numbers in the examples mean parts by weight.
実施例1〜4、比較例1〜2
表1および表2に示す配合処方の組成比で試薬をミキサ
ーによりトライブレンドした。これを、ロール表面温度
90℃のミキシングロールを用いて5分間加熱混練後、
冷却、粉砕してエポキシ樹脂系組成物を製造した。Examples 1 to 4, Comparative Examples 1 to 2 Reagents were triblended using a mixer at the composition ratios shown in Tables 1 and 2. After heating and kneading this for 5 minutes using a mixing roll with a roll surface temperature of 90°C,
The mixture was cooled and pulverized to produce an epoxy resin composition.
この組成物を用い、低圧トランスファー成形法により1
80℃×2分の条件で成形して、模擬素子を封止した4
4pinQFPを得た後、180℃で5時間ポストキュ
アした。ポストキュア後、次の物性測定法により、各組
成物の物性を測定した。Using this composition, 1
4. The simulated element was sealed by molding at 80°C for 2 minutes.
After obtaining the 4-pin QFP, it was post-cured at 180°C for 5 hours. After post-curing, the physical properties of each composition were measured using the following physical property measuring method.
半田耐熱性: 44pin QFP 16個を85℃、
85%RHで72時間加湿処理後、
215℃のvps浴に90秒間浸漬
し、クラックの発生しないQFPの
個数の割合を求めた。Soldering heat resistance: 16 44-pin QFPs at 85℃,
After humidification treatment at 85% RH for 72 hours, the QFPs were immersed in a VPS bath at 215° C. for 90 seconds, and the percentage of QFPs without cracks was determined.
信 顆 性:前記の半田耐熱性試験を行った44pin
QFPを用い、121℃、1
00%RHで加湿処理し、ピン不良
発生率50%になる時間を求めた。Reliability: 44 pins subjected to the solder heat resistance test described above.
Using QFP, humidification treatment was performed at 121° C. and 100% RH, and the time required for the pin failure rate to reach 50% was determined.
これらの結果を併せて表2に示す。These results are shown in Table 2.
表2の結果から明らかなように、本発明のエポキシ系樹
脂組成物は、成形性、半田耐熱性および信頼性が均衡し
てすぐれている。As is clear from the results in Table 2, the epoxy resin composition of the present invention has excellent moldability, soldering heat resistance, and reliability in a well-balanced manner.
〈発明の効果〉
以上説明したように、本発明のエポキシ系樹脂組成物は
、半田耐熱性、信頼性および成形性が均衡してすぐれて
おり、表面実装できる樹脂封止半導体装置の実現を可能
とするものである。<Effects of the Invention> As explained above, the epoxy resin composition of the present invention has an excellent balance of solder heat resistance, reliability, and moldability, making it possible to realize a resin-encapsulated semiconductor device that can be surface mounted. That is.
特許出願大東し株式会社Patent application Daitoshi Co., Ltd.
Claims (2)
ーン化合物(C)、溶融シリカ(D)およびビスマレイ
ミド化合物(E)を必須成分とすることを特徴とするエ
ポキシ系樹脂組成物。(1) An epoxy resin composition comprising an epoxy resin (A), a curing agent (B), a modified silicone compound (C), fused silica (D), and a bismaleimide compound (E) as essential components.
の低級アルキル基またはハロゲン原子を示す。) で表わされる骨格を有するビフェニル系エポキシ樹脂(
A′)を必須成分として含有することを特徴とする請求
項(1)に記載のエポキシ系樹脂組成物。(2) Epoxy resin (A) has the following formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(I) (However, R^1 to R^8 are hydrogen atoms, C_1 to C_4
represents a lower alkyl group or a halogen atom. ) Biphenyl epoxy resin having a skeleton represented by (
The epoxy resin composition according to claim 1, which contains A') as an essential component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25840989A JPH03119052A (en) | 1989-10-02 | 1989-10-02 | Epoxy resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25840989A JPH03119052A (en) | 1989-10-02 | 1989-10-02 | Epoxy resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03119052A true JPH03119052A (en) | 1991-05-21 |
Family
ID=17319826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25840989A Pending JPH03119052A (en) | 1989-10-02 | 1989-10-02 | Epoxy resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03119052A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0797433A (en) * | 1993-08-24 | 1995-04-11 | Siemens Ag | Siloxane-containing casting resin system, its production and coating for opto-electric structural element |
KR100607372B1 (en) * | 2000-04-20 | 2006-08-02 | 도레이새한 주식회사 | Adhesive tape for the electronic parts |
-
1989
- 1989-10-02 JP JP25840989A patent/JPH03119052A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0797433A (en) * | 1993-08-24 | 1995-04-11 | Siemens Ag | Siloxane-containing casting resin system, its production and coating for opto-electric structural element |
KR100607372B1 (en) * | 2000-04-20 | 2006-08-02 | 도레이새한 주식회사 | Adhesive tape for the electronic parts |
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