JPH0311462B2 - - Google Patents
Info
- Publication number
- JPH0311462B2 JPH0311462B2 JP58135961A JP13596183A JPH0311462B2 JP H0311462 B2 JPH0311462 B2 JP H0311462B2 JP 58135961 A JP58135961 A JP 58135961A JP 13596183 A JP13596183 A JP 13596183A JP H0311462 B2 JPH0311462 B2 JP H0311462B2
- Authority
- JP
- Japan
- Prior art keywords
- developer
- printing plate
- weight
- acid
- dampening water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 38
- 238000007639 printing Methods 0.000 claims description 35
- 229920002379 silicone rubber Polymers 0.000 claims description 15
- 239000004945 silicone rubber Substances 0.000 claims description 15
- 150000007524 organic acids Chemical class 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- -1 orthoquinone diazide compound Chemical class 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229910001507 metal halide Inorganic materials 0.000 description 5
- 150000005309 metal halides Chemical class 0.000 description 5
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 229940093915 gynecological organic acid Drugs 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 235000005985 organic acids Nutrition 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 229960000583 acetic acid Drugs 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- FGKJLKRYENPLQH-UHFFFAOYSA-N isocaproic acid Chemical compound CC(C)CCC(O)=O FGKJLKRYENPLQH-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- WXWYJCSIHQKADM-ZNAKCYKMSA-N (e)-n-[bis[[(e)-butan-2-ylideneamino]oxy]-ethenylsilyl]oxybutan-2-imine Chemical compound CC\C(C)=N\O[Si](O\N=C(/C)CC)(O\N=C(/C)CC)C=C WXWYJCSIHQKADM-ZNAKCYKMSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- OXQGTIUCKGYOAA-UHFFFAOYSA-N 2-Ethylbutanoic acid Chemical compound CCC(CC)C(O)=O OXQGTIUCKGYOAA-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- CNPVJWYWYZMPDS-UHFFFAOYSA-N 2-methyldecane Chemical compound CCCCCCCCC(C)C CNPVJWYWYZMPDS-UHFFFAOYSA-N 0.000 description 1
- OVBFMEVBMNZIBR-UHFFFAOYSA-N 2-methylvaleric acid Chemical compound CCCC(C)C(O)=O OVBFMEVBMNZIBR-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M 3-Methylbutanoic acid Natural products CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- DKMROQRQHGEIOW-UHFFFAOYSA-N Diethyl succinate Chemical compound CCOC(=O)CCC(=O)OCC DKMROQRQHGEIOW-UHFFFAOYSA-N 0.000 description 1
- UDSFAEKRVUSQDD-UHFFFAOYSA-N Dimethyl adipate Chemical compound COC(=O)CCCCC(=O)OC UDSFAEKRVUSQDD-UHFFFAOYSA-N 0.000 description 1
- MUXOBHXGJLMRAB-UHFFFAOYSA-N Dimethyl succinate Chemical compound COC(=O)CCC(=O)OC MUXOBHXGJLMRAB-UHFFFAOYSA-N 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000005643 Pelargonic acid Substances 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- BEPAFCGSDWSTEL-UHFFFAOYSA-N dimethyl malonate Chemical compound COC(=O)CC(=O)OC BEPAFCGSDWSTEL-UHFFFAOYSA-N 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- TUEYHEWXYWCDHA-UHFFFAOYSA-N ethyl 5-methylthiadiazole-4-carboxylate Chemical compound CCOC(=O)C=1N=NSC=1C TUEYHEWXYWCDHA-UHFFFAOYSA-N 0.000 description 1
- DBLVXHJTZIDGHE-UHFFFAOYSA-N ethyl acetate;2-(2-hydroxyethoxy)ethanol Chemical compound CCOC(C)=O.OCCOCCO DBLVXHJTZIDGHE-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000000295 fuel oil Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropyl acetate Chemical compound CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Description
【発明の詳細な説明】
〔技術分野〕
本発明は改良された湿し水不要平版印刷版用現
像液に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an improved developer for lithographic printing plates that does not require dampening water.
シリコーンゴム層をインキ反撥層とする湿し水
不要平版印刷版であつて、ネガ型に作用する版材
としては、例えば支持体上に設けたオルトキノン
ジアジド化合物を含む感光層上にシリコーンゴム
層を設けて予備増感されたものが特開昭56−
80046で提案されている。これらの版材は通常PS
版と同様に露光−現像工程により製版されるが、
現像液としては、特願昭56−133278号で提案され
ているような有機溶剤を主成分とするものや、水
を主成分とするものが提案されている。このよう
な現像液は、有機溶剤系においては引火の危険性
があり、更には現像時に非画線部のシリコーンを
傷つけやすという欠点がある。これに対し、水系
においては作業環境の面から好ましいだけでな
く、現像時における非画線への傷の恐れも小さく
好ましいのであるが、現像操作上安定性に欠け、
特に現像液としての水のみを使用した場合にはそ
の傾向が顕著で現像不良を起こしやすいなどの欠
点があつた。
A lithographic printing plate that does not require dampening water and has a silicone rubber layer as an ink repellent layer, and is a negative-working plate material, for example, has a silicone rubber layer on a photosensitive layer containing an orthoquinone diazide compound provided on a support. The one that was prepared and pre-sensitized was published in 1982.
Proposed in 80046. These plates are usually PS
It is made by an exposure-development process like a plate, but
As the developer, there have been proposed those containing an organic solvent as a main component, as proposed in Japanese Patent Application No. 133278/1982, and those containing water as a main component. Such a developer has the disadvantage that there is a risk of ignition if it is based on an organic solvent, and furthermore, it tends to damage the silicone in the non-image area during development. On the other hand, aqueous systems are preferable not only from the viewpoint of the working environment but also because there is less risk of scratches on non-image lines during development, but they lack stability in terms of development operations.
This tendency is particularly noticeable when only water is used as a developer, and there are drawbacks such as poor development.
本発明の目的は、これらの欠点を改良し、現像
速度が大きく、現像操作上安定な現像液を提供す
ることにある。
An object of the present invention is to improve these drawbacks and to provide a developer that has a high development speed and is stable during development operations.
本発明は、支持体上にオルトキノンジアジド化
合物を含む感光層およびシリコーンゴム層をこの
順に塗設してなる湿し水不要平版印刷版を露光
後、画像を現像するための現像液において、現像
液に有機酸が含まれていることを特徴とする湿し
水不要平版印刷版用現像液である。
In the present invention, after exposing a lithographic printing plate that does not require dampening water, which is formed by coating a photosensitive layer containing an orthoquinonediazide compound and a silicone rubber layer on a support in this order, a developer is used to develop the image. This is a developer for lithographic printing plates that does not require dampening water and is characterized by containing an organic acid.
本発明における露光により画像潜像を形成した
湿し水不要平版印刷版の現像操作方法については
何ら制限されるものではないが、主として次の様
なものが挙げられる。 The method of developing a lithographic printing plate that does not require dampening water and has a latent image formed by exposure in the present invention is not limited in any way, but the following methods can mainly be mentioned.
(1) 有機溶剤または有機溶剤に水が混合したもの
を現像液として使用する方法。(1) A method in which an organic solvent or a mixture of organic solvent and water is used as a developer.
(2) 有機溶剤に浸漬することにより版を前処理し
た後、水または有機溶剤を含む水を現像液とし
て使用する方法。(2) A method in which the plate is pretreated by immersion in an organic solvent and then water or water containing an organic solvent is used as a developer.
(3) 塩基処理を施した後、水または有機溶剤を含
む水を現像液として使用する方法。(3) A method in which water or water containing an organic solvent is used as a developer after basic treatment.
これらの方法のいずれの場合においても、現像
液に有機酸を含むことによりその効果を発揮でき
るのであるが、(2)および(3)の方法において現像液
として水のみを用いた場合に最もその効果が大き
く、しかも作業員にとつて最も有機溶剤に晒され
やすい現像作業において有機溶剤を除去できるこ
とは作業環境の面からも好ましいことである。 In any of these methods, the effect can be achieved by containing an organic acid in the developer, but the effect is most effective when only water is used as the developer in methods (2) and (3). It is highly effective, and it is also desirable from the viewpoint of the working environment that organic solvents can be removed during development work, where workers are most likely to be exposed to organic solvents.
本発明の現像液は有機酸を含むことが必須であ
るが、現像液としては水または／および次に示す
有機溶剤を使用することができる。 Although it is essential that the developer of the present invention contains an organic acid, water and/or the following organic solvents can be used as the developer.
本発明において現像液として使用される有機溶
剤としては、炭化水素、極性溶剤、をそれぞれ単
独あるいは混合して使用することができる。 As the organic solvent used as the developer in the present invention, hydrocarbons and polar solvents can be used alone or in combination.
炭化水素としては下記に示すものが一般的に有
用である。 As hydrocarbons, those shown below are generally useful.
脂肪族炭化水素類（ペンタン、ヘキサン、ヘプ
タン、オクタン、アイソパーE.H.M、ガソリン、
灯油、軽油、重油など）。 Aliphatic hydrocarbons (pentane, hexane, heptane, octane, Isopar EHM, gasoline,
kerosene, light oil, heavy oil, etc.).
芳香族炭化水素類（トルエン、キシレンなど）。 Aromatic hydrocarbons (toluene, xylene, etc.).
ハロゲン化炭化水素類（トリクレン、四塩化炭
素など）。 Halogenated hydrocarbons (triclene, carbon tetrachloride, etc.).
極性溶剤としては下記に示すが一般的に有用で
ある。 The polar solvents shown below are generally useful.
アルコール類（メタノール、エタノール、ｎ−
プロパノール、イソプロパノール、３−メトキシ
ブタノール、３−メチル−３−メトキシブタノー
ル、ジアセトンアルコールなど）。 Alcohols (methanol, ethanol, n-
propanol, isopropanol, 3-methoxybutanol, 3-methyl-3-methoxybutanol, diacetone alcohol, etc.).
エーテル類（ジオキサン、テトラヒドロフラ
ン、メチルセロソルブ、エチルセロソルブ、ブチ
ルセロソルブ、エチレングリコールジエチルエー
テル、ジエチレングリコールモノメチルエーテ
ル、ジエチレングリコールモノエチルエーテル、
ジエチレングリコールジエチルエーテル、ジエチ
レングリコールモノブチルエーテル、トリエチレ
ングリコールモノメチルエーテル、トリエチレン
グリコールジメチルエーテル、テトラエチレング
リコールモノメチルエーテル、テトラエチレング
リコールジメチルエーテル、プロピレングリコー
ルモノメチルエーテル、ジプロピレングリコール
モノメチルエーテル、トリプロビレングリコール
モノメチルエーテル、テトラヒドロフルフリルア
ルコールなど）。 Ethers (dioxane, tetrahydrofuran, methyl cellosolve, ethyl cellosolve, butyl cellosolve, ethylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether,
Diethylene glycol diethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, tetraethylene glycol monomethyl ether, tetraethylene glycol dimethyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, triprobylene glycol monomethyl ether, tetrahydrofurfuryl alcohol, etc.).
エステル類（アセト酢酸メチル、アセト酢酸エ
チル、メチルセロソルブアセテート、エチルセロ
ソルブアセテート、酢酸ジエチレングリコールモ
ノメチルエーテル、酢酸ジエチレングリコールモ
ノエチルエーテル、酢酸ジエチレングリコールモ
ノブチルエーテル、ジ酢酸グリコール、乳酸エチ
ル、プロピオン酸メチル、プロピオン酸エチル、
マロン酸ジメチル、マロン酸ジエチル、コハク酸
ジメチル、コハク酸ジエチル、アジピン酸ジメチ
ルなど）。 Esters (methyl acetoacetate, ethyl acetoacetate, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl acetate, diethylene glycol monobutyl ether acetate, glycol diacetate, ethyl lactate, methyl propionate, ethyl propionate,
dimethyl malonate, diethyl malonate, dimethyl succinate, diethyl succinate, dimethyl adipate, etc.).
これらの現像液に添加する有機酸は１重量％以
上で効果があるが好ましくは５重量％以上であ
る。また炭素数の小さな有機酸においてはそれ単
独でも良好な現像が可能である。 The organic acid added to these developing solutions is effective when added in an amount of 1% by weight or more, but preferably 5% by weight or more. Furthermore, organic acids having a small number of carbon atoms can also be used alone for good development.
本発明において、露光により画像潜像を形成し
た湿し水不要平版印刷版を浸漬することにより前
記処理を施して有機酸を含有させた水を現像液と
して使用する場合に、前処理液として上に挙げた
炭化水素、極性溶剤をそれぞれ単独あるいは混合
して使用することができる。 In the present invention, when using water containing an organic acid as a developer by performing the above treatment by immersing a lithographic printing plate that does not require dampening water and on which a latent image has been formed by exposure, the pre-treatment liquid can be used as a pre-treatment liquid. The hydrocarbons and polar solvents listed above can be used alone or in combination.
本発明において使用される有機酸としては、特
に限定されるものではなく、例えばカルボン酸、
スルホン酸、ホスホン酸などのいずれでもよい
が、特に好ましい有機酸はギ酸、酢酸、プロピオ
ン酸、ｎ−酪酸、イソ酪酸、ｎ−吉草酸、イソ吉
草酸、メチルエチル酢酸、トリメチル酢酸、カプ
ロン酸、イソカプロン酸、α−メチル吉草酸、２
−エチル−ｎ−酪酸、エナント酸、カプリル酸、
２−エチルヘキサン酸、ペラルゴン酸などのアル
カン酸である。他の官能基を有する有機酸は版材
のシリコーンゴム層を通して露光された画像部の
感光層への作用が小さく、ほとんど現像性に効果
がない。 The organic acids used in the present invention are not particularly limited, and include, for example, carboxylic acids,
Any of sulfonic acid and phosphonic acid may be used, but particularly preferred organic acids are formic acid, acetic acid, propionic acid, n-butyric acid, isobutyric acid, n-valeric acid, isovaleric acid, methylethyl acetate, trimethylacetic acid, caproic acid, Isocaproic acid, α-methylvaleric acid, 2
-ethyl-n-butyric acid, enanthic acid, caprylic acid,
These are alkanoic acids such as 2-ethylhexanoic acid and pelargonic acid. Organic acids having other functional groups have a small effect on the photosensitive layer in the image area exposed through the silicone rubber layer of the plate material, and have almost no effect on developability.
また、塩基処理後水単独からなる、または水を
主成分とする現像液を用いる場合にも上に述べた
ような有機酸を現像液に添加することによつて、
その現像性を大幅に改良することができる。 Furthermore, when using a developer solution consisting solely of water or having water as its main component after base treatment, by adding the above-mentioned organic acid to the developer solution,
Its developability can be significantly improved.
本発明においては、有機酸を含む現像液を用い
ることによつて、現像性が大幅に向上し且つ現像
速度が速くなり、その効果は現像液中の水が多い
ほど顕著である。その結果、作業者が長時間有機
溶剤の蒸気にさらされることがなくなるほか、水
単独ないしは水の多い現像液を用いることができ
るため引火の危険性も減じることができる。
In the present invention, by using a developer containing an organic acid, the developability is greatly improved and the development speed is increased, and the effect becomes more pronounced as the amount of water in the developer increases. As a result, workers are not exposed to organic solvent vapor for long periods of time, and the risk of ignition can be reduced because water alone or a developer containing a large amount of water can be used.
以下実施例を挙げてさらに具体的に説明する。 The present invention will be described in more detail below with reference to Examples.
なお、実施例中に記載した「部」は「重量部」
を示す。 In addition, "parts" described in the examples are "parts by weight"
shows.
実施例 １
厚み0.24mmのアルミ板（住友軽金属製）にフエ
ノールホルムアルデヒドゾール樹脂（スミライト
レジンPC−１、住友デユレス製）を2μの厚み
（キユア後の）に塗布し、190℃、３分間キユアし
たものを支持体として、この上に下記の感光性組
成物を塗布し、120℃、２分間加熱処理して厚さ
2μの感光層を設けた。Example 1 A 0.24 mm thick aluminum plate (manufactured by Sumitomo Light Metals) was coated with phenol formaldehyde sol resin (Sumilight Resin PC-1, manufactured by Sumitomo Duress) to a thickness of 2 μm (after curing), and cured at 190°C for 3 minutes. Using this as a support, the following photosensitive composition was coated on it and heated at 120°C for 2 minutes to determine the thickness.
A 2μ photosensitive layer was provided.
(1) ナフトキノン−１，２−ジアジド−５−スル
ホン酸とフエノールホルムアルデヒドノボラツ
ク樹脂の部分エステル（IR法によるエステル
化度47％） 100重量部
(2) ４，4′−ジフエニルメタンジイソシアネート
30重量部
(3) ジブチル錫ジラウレート 0.2重量部
(4) ジオキサン 740重量部
続いてこの上に下記の組成のシリコーンゴム組
成物を回転塗布後、120℃、露点30℃、２分間湿
熱硬化させて2μのシリコーンゴム層を設けて、
湿し水不要平版印刷版を作製した。(1) Partial ester of naphthoquinone-1,2-diazido-5-sulfonic acid and phenol formaldehyde novolac resin (degree of esterification 47% by IR method) 100 parts by weight (2) 4,4'-diphenylmethane diisocyanate
30 parts by weight (3) 0.2 parts by weight of dibutyltin dilaurate (4) 740 parts by weight of dioxane Next, a silicone rubber composition having the following composition was spin-coated on top of this, and cured with moist heat at 120°C, dew point 30°C for 2 minutes. With a 2μ silicone rubber layer,
A lithographic printing plate that does not require dampening water was prepared.
(1) ジメチルポリシロキサン（分子量約25000、
末端水酸基） 100重量部
(2) ビニルトリ（メチルエチルケトオキシム）シ
ラン ８重量部
(3) ジブチル錫ジアセテート 0.2重量部
(4) γ−アミノプロピルトリメトキシシラン
１重量部
(5) アイソパーＥ（エクソン化学製、脂肪族炭化
水素系溶剤） 1800重量部
かかる湿し水不要平版印刷版にメタルハライド
ランプ（岩崎電機(株)製アイドルフイン2000）を用
い、1mの距離でUVメーター（(株)オーク製作所
ライトメジヤータイプUV−402A）で11mw／cm2
の照度で全面露光を６秒施した。(1) Dimethylpolysiloxane (molecular weight approximately 25,000,
Terminal hydroxyl group) 100 parts by weight (2) Vinyltri(methylethylketoxime)silane 8 parts by weight (3) Dibutyltin diacetate 0.2 parts by weight (4) γ-Aminopropyltrimethoxysilane
1 part by weight (5) Isopar E (manufactured by Exxon Chemical Co., Ltd., aliphatic hydrocarbon solvent) 1800 parts by weight Using a metal halide lamp (Idol Fin 2000, manufactured by Iwasaki Electric Co., Ltd.) on the planographic printing plate that does not require dampening water, 11 mw/cm 2 at a distance using a UV meter (Oak Seisakusho Light Measure Type UV-402A)
The entire surface was exposed for 6 seconds at an illuminance of .
上記のように全面露光をして得られた湿し水不
要平版印刷版に、150線／インチ、２％から98％
の網点を有するグラデーシヨンネガフイルムを真
空密着し、それを通して上記のメタルハライドラ
ンプを用いて、1mの距離から60秒画像露光する
ことによつて画像形成能を有するネガ型湿し水不
要平版印刷版を得た。 150 lines/inch, 2% to 98%
Negative dampening water-less lithographic printing that has the ability to form an image by vacuum-adhering a gradation negative film with halftone dots and exposing it to an image for 60 seconds from a distance of 1 m using the metal halide lamp mentioned above. Got the edition.
次いで、塩基処理液（メチルカルビトール／モ
ノエタノールアミン＝100重量部／５重量部）を
満した平型バツトに、上記の露光済版を１分間浸
漬する。浸漬後ゴムスキージで版面および裏面に
付着した塩基処理液を除去し、次いで版面と現像
パツドにｎ−酪酸５重量部、水95重量部からなる
現像液を注ぎ、現像パツドで面圧10ｇ／m2をかけ
約１分間版面をこすると、画像状に露光された部
分のシリコーンゴム層が除去され、感光層が露出
して画線部を形成し、一方全面露光のみを受けた
部分にはシリコーンゴム層が強固に残存して非画
線部を形成し、ネガフイルムに忠実な画像を再現
した印刷版が得られた。次いでこの印刷版をオフ
セツト印刷機（ハマダスター）にとりつけ、東洋
インキ製“ウルトラ70紅”を用いて、湿し水を用
いないで２万枚印刷した。印刷物は何ら汚れるこ
となくきわめて良好なものであつた。また印刷版
の版面の損傷も認められなかつた。 Next, the exposed plate was immersed for 1 minute in a flat vat filled with a base treatment solution (methyl carbitol/monoethanolamine = 100 parts by weight/5 parts by weight). After dipping, use a rubber squeegee to remove the base treatment solution adhering to the plate surface and back surface, then pour a developer consisting of 5 parts by weight of n-butyric acid and 95 parts by weight of water onto the plate surface and developing pad, and apply a surface pressure of 10 g/m 2 with the developing pad. When the plate surface is rubbed for about 1 minute, the silicone rubber layer in the imagewise exposed areas is removed and the photosensitive layer is exposed to form image areas, while the silicone rubber layer is removed in areas that have only been fully exposed. A printing plate was obtained in which the layer remained firmly and formed a non-image area, and reproduced an image faithful to the negative film. Next, this printing plate was attached to an offset printing machine (Hamaduster), and 20,000 copies were printed using "Ultra 70 Beni" manufactured by Toyo Ink without using dampening water. The printed matter was in very good condition without any stains. Moreover, no damage to the surface of the printing plate was observed.
比較例 １
実施例１の記載の通り製造しかつ露光して得ら
れた画像形成能を有する湿し水不要平版印刷版を
同様に塩基処理（メチルカルビトール／モノエタ
ノールアミン＝100重量部／５重量部）する。次
いで、水を版面と現像パツドに注ぎ、面圧10ｇ／
m2で約３分間版面をこすつたが、ほとんど露光部
のシリコーンゴム層を除去することができず、印
刷が不可能な印刷版となつた。Comparative Example 1 A lithographic printing plate that does not require dampening water and has an image-forming ability produced and exposed as described in Example 1 was similarly treated with a base (methyl carbitol/monoethanolamine = 100 parts by weight/5 parts by weight). Next, pour water onto the printing plate and developing pad, and apply a surface pressure of 10g/
Although the plate surface was rubbed for about 3 minutes with m 2 , it was not possible to remove most of the silicone rubber layer in the exposed areas, resulting in a printing plate that could not be printed.
実施例 ２
実施例１で製造した湿し水不要平版印刷版に
150線／インチの２％から98％の網点を有するグ
ラデーシヨンフイルムを、常法に従つて真空密着
し、実施例１で用いたメタルハライドランプを用
いて1mの距離で60秒画像露光することによつて
画像形成能を有するネガ型の湿し水不要平版印刷
版を得た。次いで、前処理液（メチルカルビトー
ル）を満たした縦型バツトに、上記の露光済版を
１分間浸漬する。浸漬後ゴムスキージで版面およ
び裏面に付着した前処理液を除去し、次いで版面
と現像パツドにプロピオン酸５重量部、水95重量
部からなる現像液を注ぎ、現像パツドで面圧10
ｇ／m2をかけ約１分間版面をこすると、画像状に
露光された部分のシリコーンゴム層が除去され、
感光層が露出した画線部を形成し、ネガフイルム
に忠実な画像を再現した印刷版が得られた。次い
で、この印刷版を実施例１と同様の条件で印刷し
たところ、極めて良好な印刷物が得られた。Example 2 The dampening water-free lithographic printing plate produced in Example 1
A gradation film having halftone dots of 2% to 98% at 150 lines/inch was vacuum-adhered according to a conventional method, and imagewise exposed for 60 seconds at a distance of 1 m using the metal halide lamp used in Example 1. A negative type lithographic printing plate which did not require dampening water and had image forming ability was obtained. Next, the exposed plate is immersed for 1 minute in a vertical vat filled with a pretreatment liquid (methyl carbitol). After dipping, use a rubber squeegee to remove the pretreatment liquid adhering to the plate surface and back surface, then pour a developer consisting of 5 parts by weight of propionic acid and 95 parts by weight of water onto the plate surface and developing pad, and apply a surface pressure of 10% with the developing pad.
g/m 2 and rubbing the plate surface for about 1 minute, the silicone rubber layer in the imagewise exposed area is removed.
A printing plate was obtained in which an image area was formed in which the photosensitive layer was exposed, and an image faithful to the negative film was reproduced. Next, when this printing plate was printed under the same conditions as in Example 1, extremely good printed matter was obtained.
比較例 ２
実施例１で製造した湿し水不要平版印刷版を実
施例２と同様に露光して得られた湿し水不要平版
印刷版を、前処理液（メチルカルビトール）を満
たした縦型バツトに１分間浸漬する。浸漬後ゴム
スキージで版面および裏面に付着した前処理液を
除去し、次いで版面と現像パツドに水を注ぎ、面
圧10ｇ／m2で約３分間版面をこすつたが、ほとん
ど露光部のシリコーンゴム層を除去することがで
きず印刷が不可能な印刷版となつた。Comparative Example 2 The dampening water-free lithographic printing plate produced in Example 1 was exposed in the same manner as in Example 2. Immerse in mold vat for 1 minute. After soaking, the pre-treatment liquid adhering to the plate surface and back surface was removed using a rubber squeegee, and then water was poured onto the plate surface and the developing pad, and the plate surface was rubbed for about 3 minutes with a surface pressure of 10 g/ m2 , but most of the silicone rubber layer in the exposed areas was removed. could not be removed, resulting in a printing plate that could not be printed.
実施例 ３
実施例１で製造した湿し水不要平版印刷版に、
150線／インチの２％から98％の網点を有するグ
ラデーシヨンフイルムを、常法にしたがつて真空
密着し、実施例１で用いたメタルハライドランプ
を用いて1mの距離で照度60秒画像露光を施すこ
とによつて画像形成能を有するネガ型湿し水不要
平版印刷版を得た。Example 3 The dampening water-free lithographic printing plate produced in Example 1 was
A gradation film having halftone dots of 2% to 98% at 150 lines/inch was vacuum-adhered in a conventional manner and image exposed for 60 seconds at a distance of 1 m using the metal halide lamp used in Example 1. By applying this, a negative type planographic printing plate that does not require dampening water and has image forming ability was obtained.
次いでこれを、現像パツドに氷酢酸を注ぎ、面
圧10ｇ／m2で１分間こすると露光部のシリコーン
ゴム層が除去されて感光層表面が露出し画像部を
形成した。この印刷版を実施例１と同様の条件で
印刷したところ、網点再現域５〜95％で、微少欠
点や現像パツドによるスリ傷状の欠点のない印刷
物が得られた。 Then, by pouring glacial acetic acid into the developing pad and rubbing it for 1 minute at a surface pressure of 10 g/m 2 , the silicone rubber layer in the exposed area was removed and the surface of the photosensitive layer was exposed to form an image area. When this printing plate was printed under the same conditions as in Example 1, a printed matter with a halftone dot reproduction range of 5 to 95% and no minute defects or defects such as scratches caused by the developing pad was obtained.
実施例 ４
実施例１で製造した湿し水不要平版印刷版に
150線／インチの２％から98％の網点を有するグ
ラデーシヨンフイルムを、常法に従つて真空密着
し、実施例１で用いたメタルハライドランプを用
いて1mの距離で60秒露光を施すことによつて画
像形成能を有するネガ型湿し水不要平版印刷版を
得た。Example 4 The dampening water-free lithographic printing plate produced in Example 1
A gradation film having halftone dots of 2% to 98% at 150 lines/inch was vacuum-adhered according to a conventional method, and exposed for 60 seconds at a distance of 1 m using the metal halide lamp used in Example 1. A negative type planographic printing plate which did not require dampening water and had image forming ability was obtained.
次いでこの原版を、現像パツドにアイソパー
H10重量部、ブチルカルビトール40重量部、エチ
ルカルビトール40重量部、２−エチルヘキサン酸
10重量部からなる現像液を注ぎ、面圧10ｇ／m2で
１分間こすると露光部のシリコーンゴム層が除去
されて感光層表面が露出し画像部を形成した。こ
の印刷版を実施例１と同様の条件で印刷したとこ
ろ、網点再現域２〜98％で、微小欠点や現像パツ
ドによるスリ傷状の欠点のない印刷物が得られ
た。 Next, apply this original plate to the developing pad.
10 parts by weight of H, 40 parts by weight of butyl carbitol, 40 parts by weight of ethyl carbitol, 2-ethylhexanoic acid
A developing solution containing 10 parts by weight was poured and rubbed for 1 minute at a surface pressure of 10 g/m 2 to remove the silicone rubber layer in the exposed area and expose the surface of the photosensitive layer to form an image area. When this printing plate was printed under the same conditions as in Example 1, a printed matter with a halftone dot reproduction range of 2 to 98% and no minute defects or defects such as scratches caused by the developing pad was obtained.
比較例 ３
実施例１で製造した湿し水不要平版印刷版を実
施例３と同様にして画像形成能を有するネガ型湿
し水不要平版印刷版を得た。次いでこの印刷版
を、現像パツドにアイソパーH20重量部、ブチル
カルビトール40重量部、エチルカルビトール40重
量部からなる現像液を注ぎ、面圧10ｇ／m2で３分
間こすることによつて露光部のシリコーンゴム層
が完全に除去されて感光層が露出し画像部を形成
した。この印刷版を実施例１と同様の条件で印刷
したところ、網点再現域５〜95％の印刷物が得ら
れたが、非画像部に現像パツドによるものと思わ
れる傷が認められた。Comparative Example 3 The lithographic printing plate that does not require dampening water and produced in Example 1 was treated in the same manner as in Example 3 to obtain a negative type lithographic printing plate that does not require dampening water and has an image forming ability. Next, this printing plate was exposed to light by pouring a developer consisting of 20 parts by weight of Isopar H, 40 parts by weight of butyl carbitol, and 40 parts by weight of ethyl carbitol into the developing pad, and rubbing the plate at a surface pressure of 10 g/m 2 for 3 minutes. The silicone rubber layer was completely removed to expose the photosensitive layer and form an image area. When this printing plate was printed under the same conditions as in Example 1, a printed matter with a halftone dot reproduction area of 5 to 95% was obtained, but scratches thought to be caused by the developing pad were observed in the non-image area.
Claims (1)
む感光層およびシリコーンゴム層をこの順に塗設
してなる湿し水不要平版印刷版を露光後、画像を
現像するための現像液において、現像液に有機酸
が含まれていることを特徴とする湿し水不要平版
印刷版用現像液。 ２ 有機酸の含有率が１〜100重量％であること
を特徴とする特許請求の範囲第１項記載の湿し水
不要平版印刷版用現像液。 ３ 有機酸がアルカン酸であることを特徴とする
特許請求の範囲第１項記載の湿し水不要平版印刷
版用現像液。[Scope of Claims] 1. After exposing a lithographic printing plate that does not require dampening water, which is formed by coating a photosensitive layer containing an orthoquinone diazide compound and a silicone rubber layer on a support in this order, in a developer for developing an image. , a developer for lithographic printing plates that does not require dampening water, characterized in that the developer contains an organic acid. 2. A developer for a lithographic printing plate that does not require dampening water according to claim 1, characterized in that the content of organic acid is 1 to 100% by weight. 3. A developer for a lithographic printing plate that does not require dampening water, as set forth in claim 1, wherein the organic acid is an alkanoic acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13596183A JPS6028655A (en) | 1983-07-27 | 1983-07-27 | Developing liquid for lithographic plate using no dampening water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13596183A JPS6028655A (en) | 1983-07-27 | 1983-07-27 | Developing liquid for lithographic plate using no dampening water |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6028655A JPS6028655A (en) | 1985-02-13 |
| JPH0311462B2 true JPH0311462B2 (en) | 1991-02-18 |
Family
ID=15163889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13596183A Granted JPS6028655A (en) | 1983-07-27 | 1983-07-27 | Developing liquid for lithographic plate using no dampening water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6028655A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2507341B2 (en) * | 1986-08-22 | 1996-06-12 | 東レ株式会社 | Waterless lithographic printing plate developer |
| JPS63214757A (en) * | 1987-03-04 | 1988-09-07 | Toray Ind Inc | Method for making waterless planographic lithographic printing plate |
| DE3715792A1 (en) * | 1987-05-12 | 1988-11-24 | Hoechst Ag | DEVELOPER FOR WATERLESS PRINTING OFFSET PLATES |
| JP2844752B2 (en) * | 1989-11-27 | 1999-01-06 | 東レ株式会社 | Pretreatment liquid for lithographic printing plates without water |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
| JPS5835539A (en) * | 1981-08-27 | 1983-03-02 | Toray Ind Inc | Method for making negative lithographic plate requiring no dampening water |
-
1983
- 1983-07-27 JP JP13596183A patent/JPS6028655A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
| JPS5835539A (en) * | 1981-08-27 | 1983-03-02 | Toray Ind Inc | Method for making negative lithographic plate requiring no dampening water |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6028655A (en) | 1985-02-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0432377B2 (en) | ||
| US4861698A (en) | Photosensitive lithographic plate using no dampening water | |
| US4743527A (en) | Dry presensitized plate including an overlying silicone rubber layer | |
| JPS6154222B2 (en) | ||
| JPH0311462B2 (en) | ||
| US5958652A (en) | Treating liquid for making a waterless planographic printing plate | |
| JPH0213295B2 (en) | ||
| JPH043865B2 (en) | ||
| JPH043866B2 (en) | ||
| JPS6154223B2 (en) | ||
| JPS6323546B2 (en) | ||
| JPH0429053B2 (en) | ||
| JP2507390B2 (en) | Waterless planographic processing solution | |
| JP2507376B2 (en) | Waterless planographic processing solution | |
| JPS63317379A (en) | Process liquid for making waterless plate | |
| JPH0356623B2 (en) | ||
| JPH042942B2 (en) | ||
| JP2530693B2 (en) | Plate making method of waterless lithographic printing plate | |
| JP2507342B2 (en) | Waterless planographic printing plate | |
| JPS6322304B2 (en) | ||
| JP2921092B2 (en) | Waterless lithographic plate processing solution | |
| JPS61248055A (en) | Waterless lithographic printing plate | |
| JPH0782233B2 (en) | Plate-making method of image forming laminate | |
| JPH0449702B2 (en) | ||
| JPH0534931A (en) | Production of water-free lithographic printing plate |