JPH0213295B2 - - Google Patents
Info
- Publication number
- JPH0213295B2 JPH0213295B2 JP56090858A JP9085881A JPH0213295B2 JP H0213295 B2 JPH0213295 B2 JP H0213295B2 JP 56090858 A JP56090858 A JP 56090858A JP 9085881 A JP9085881 A JP 9085881A JP H0213295 B2 JPH0213295 B2 JP H0213295B2
- Authority
- JP
- Japan
- Prior art keywords
- silicone rubber
- layer
- photosensitive layer
- printing
- printing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007639 printing Methods 0.000 claims description 51
- 229920002379 silicone rubber Polymers 0.000 claims description 33
- 239000004945 silicone rubber Substances 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- 150000007530 organic bases Chemical class 0.000 claims description 13
- -1 orthoquinone diazide compound Chemical class 0.000 claims description 13
- 238000011161 development Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 71
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 22
- 229920001296 polysiloxane Polymers 0.000 description 15
- 239000000243 solution Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910001507 metal halide Inorganic materials 0.000 description 5
- 150000005309 metal halides Chemical class 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000005871 repellent Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- BHHGXPLMPWCGHP-UHFFFAOYSA-N Phenethylamine Chemical compound NCCC1=CC=CC=C1 BHHGXPLMPWCGHP-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- LOUPRKONTZGTKE-WZBLMQSHSA-N Quinine Chemical compound C([C@H]([C@H](C1)C=C)C2)C[N@@]1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OC)C=C21 LOUPRKONTZGTKE-WZBLMQSHSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- WXWYJCSIHQKADM-ZNAKCYKMSA-N (e)-n-[bis[[(e)-butan-2-ylideneamino]oxy]-ethenylsilyl]oxybutan-2-imine Chemical compound CC\C(C)=N\O[Si](O\N=C(/C)CC)(O\N=C(/C)CC)C=C WXWYJCSIHQKADM-ZNAKCYKMSA-N 0.000 description 1
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
- YBQZXXMEJHZYMB-UHFFFAOYSA-N 1,2-diphenylhydrazine Chemical compound C=1C=CC=CC=1NNC1=CC=CC=C1 YBQZXXMEJHZYMB-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- IDPURXSQCKYKIJ-UHFFFAOYSA-N 1-(4-methoxyphenyl)methanamine Chemical group COC1=CC=C(CN)C=C1 IDPURXSQCKYKIJ-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- JZQLRTAGAUZWRH-UHFFFAOYSA-N 2-aminoethanol;hydrate Chemical compound [OH-].[NH3+]CCO JZQLRTAGAUZWRH-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- LYUQWQRTDLVQGA-UHFFFAOYSA-N 3-phenylpropylamine Chemical compound NCCCC1=CC=CC=C1 LYUQWQRTDLVQGA-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 235000001258 Cinchona calisaya Nutrition 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920003261 Durez Polymers 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 description 1
- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 1
- COLNVLDHVKWLRT-QMMMGPOBSA-N L-phenylalanine Chemical compound OC(=O)[C@@H](N)CC1=CC=CC=C1 COLNVLDHVKWLRT-QMMMGPOBSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- KXJLGCBCRCSXQF-UHFFFAOYSA-N [diacetyloxy(ethyl)silyl] acetate Chemical compound CC(=O)O[Si](CC)(OC(C)=O)OC(C)=O KXJLGCBCRCSXQF-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- BTHCBXJLLCHNMS-UHFFFAOYSA-N acetyloxysilicon Chemical compound CC(=O)O[Si] BTHCBXJLLCHNMS-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- RRKTZKIUPZVBMF-IBTVXLQLSA-N brucine Chemical compound O([C@@H]1[C@H]([C@H]2C3)[C@@H]4N(C(C1)=O)C=1C=C(C(=CC=11)OC)OC)CC=C2CN2[C@@H]3[C@]41CC2 RRKTZKIUPZVBMF-IBTVXLQLSA-N 0.000 description 1
- RRKTZKIUPZVBMF-UHFFFAOYSA-N brucine Natural products C1=2C=C(OC)C(OC)=CC=2N(C(C2)=O)C3C(C4C5)C2OCC=C4CN2C5C31CC2 RRKTZKIUPZVBMF-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- LOUPRKONTZGTKE-UHFFFAOYSA-N cinchonine Natural products C1C(C(C2)C=C)CCN2C1C(O)C1=CC=NC2=CC=C(OC)C=C21 LOUPRKONTZGTKE-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- UZBQIPPOMKBLAS-UHFFFAOYSA-N diethylazanide Chemical compound CC[N-]CC UZBQIPPOMKBLAS-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 description 1
- 235000014304 histidine Nutrition 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- AFRJJFRNGGLMDW-UHFFFAOYSA-N lithium amide Chemical class [Li+].[NH2-] AFRJJFRNGGLMDW-UHFFFAOYSA-N 0.000 description 1
- 235000018977 lysine Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- IHFZUIBTENSHSH-UHFFFAOYSA-N n,n-dimethoxy-1-phenylmethanamine Chemical compound CON(OC)CC1=CC=CC=C1 IHFZUIBTENSHSH-UHFFFAOYSA-N 0.000 description 1
- ZWRDBWDXRLPESY-UHFFFAOYSA-N n-benzyl-n-ethylethanamine Chemical compound CCN(CC)CC1=CC=CC=C1 ZWRDBWDXRLPESY-UHFFFAOYSA-N 0.000 description 1
- YLFDIUNVGXCCPV-UHFFFAOYSA-N n-benzyl-n-propylpropan-1-amine Chemical compound CCCN(CCC)CC1=CC=CC=C1 YLFDIUNVGXCCPV-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
- GNWCSWUWMHQEMD-UHFFFAOYSA-N naphthalene-1,2-dione diazide Chemical group [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C(=O)C=CC2=C1 GNWCSWUWMHQEMD-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000010893 paper waste Substances 0.000 description 1
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- COLNVLDHVKWLRT-UHFFFAOYSA-N phenylalanine Natural products OC(=O)C(N)CC1=CC=CC=C1 COLNVLDHVKWLRT-UHFFFAOYSA-N 0.000 description 1
- 235000008729 phenylalanine Nutrition 0.000 description 1
- HKOOXMFOFWEVGF-UHFFFAOYSA-N phenylhydrazine Chemical compound NNC1=CC=CC=C1 HKOOXMFOFWEVGF-UHFFFAOYSA-N 0.000 description 1
- 229940067157 phenylhydrazine Drugs 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229960000948 quinine Drugs 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 229920002631 room-temperature vulcanizate silicone Polymers 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Description
【発明の詳細な説明】
本発明はシリコーンゴム層をインキ反発層とす
る湿し水不要なネガ型平版印刷版の実用特性の改
良、特に印刷時の耐刷性、耐溶剤性を改良するた
めの定着方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention aims to improve the practical characteristics of a negative planographic printing plate that does not require dampening water and uses a silicone rubber layer as an ink repellent layer, particularly to improve printing durability and solvent resistance during printing. This relates to a fixing method.
従来のオフセツト方式による平版印刷では、像
形状に構成された界面化学的に性質の異なる二種
の表面に、画線部(新油性)と非画線部(新水
性)の機能を付与し、非画線部に湿し水を供給し
水膜を形成させることによりインキ反撥層として
いる。この平版オフセツト印刷版は、製版が比較
的簡単で低コストであり、しかも高品質の印刷物
が得られるという利点を有しているため、現実に
最も広く実施されている。しかし、湿し水を用い
ることが不可避の要件であるため、それに基因す
る問題点がある。たとえば、
(イ) 水とインキのバランス調製がむずかしく熟練
を要する。省力化、自動化の障害となる。 In conventional planographic printing using the offset method, two types of surfaces with different surface chemical properties configured in the image shape are given the functions of an image area (new oil-based) and a non-image area (new water-based). By supplying dampening water to the non-image area and forming a water film, it becomes an ink repellent layer. This lithographic offset printing plate is the most widely used in practice because it has the advantage of being relatively easy to make, low cost, and capable of producing high-quality printed matter. However, since the use of dampening water is an unavoidable requirement, there are problems caused by this. For example, (a) Adjusting the balance between water and ink is difficult and requires skill. It becomes an obstacle to labor saving and automation.
(ロ) 印刷スタート時(一時停止後の再スタート時
も同様)に水とインキのバランスが安定化する
までの印刷枚数が多く、損紙率が高い。(b) When printing starts (the same applies when restarting after a pause), a large number of sheets are printed until the balance of water and ink stabilizes, resulting in a high paper waste rate.
(ハ) 水による紙の伸縮があり、見当ずれを発生し
やすい。(c) The paper expands and contracts due to water, which tends to cause misregistration.
(ニ) インキの乳化により網点の形状がくずれイン
キのつきが悪くなり、また、網点の再現性に問
題が出ると同時に刷り色が変動する。(d) The emulsification of the ink distorts the shape of the halftone dots, making it difficult for the ink to stick to them, causing problems in the reproducibility of the halftone dots, and at the same time causing fluctuations in printed color.
(ホ) 印刷機に湿し水装置が必要で機械が大型化す
る。(E) The printing press requires a dampening water device, which increases the size of the machine.
などである。etc.
このような問題点を根本的に解決するために、
十数年ほど前からシリコーンゴムをインキ反撥層
として湿し水を用いずに平版印刷を行なうための
版の研究が始められた。特公昭44−23042号はイ
ンキ反撥層としてシリコーンゴムを用いることを
示した最初の技術であり、その後も種々の構成に
よる湿し水不要平版印刷に関する特許出願がなさ
れている。かかる湿し水不要平版印刷版のなか
で、支持体上に感光層、シリコーン層をこの順に
設けて構成されるシリコーン上層型の湿し水不要
平版印刷版においてネガテイブワーキングとする
ためには、感光層としては光可溶化型の感光性物
質を選ぶ必要がある。このような構成を持つ湿し
水不要平版印刷版の例は特公昭46−16044号に示
されている。この版構成では、露光部の感光層は
光分解されて現像液に可溶となり上部のシリコー
ンゴム層とともに除去されるので、露光部が画像
部となるネガテイブワーキングの湿し水不要平版
印刷版となる。しかし未露光部で非画線部となつ
ているシリコーン層を保持している光可溶化型の
感光性物質は、現像以降もその感光性を保つてお
り、太陽光あるいは室内螢光灯により感光し変化
する。一方印刷版は印刷工程における版面洗浄あ
るいは印刷インキとの接触などにおいて現像溶媒
に類似の有機溶媒に触れる機会が考えられ、この
場合、現像工程までにいかに良好な画像再現が得
られていても、それ以降に再露光を受けて感光層
が可溶化しているため、有機溶媒に侵され非画線
部を形成しているシリコーン層ともども脱落し、
版面での現像再現性が保持できなくなるという致
命的欠陥を持つている。 In order to fundamentally solve these problems,
About ten years ago, research began on plates that use silicone rubber as an ink-repellent layer for lithographic printing without the use of dampening water. Japanese Patent Publication No. 44-23042 was the first technology to show the use of silicone rubber as an ink repellent layer, and patent applications for lithographic printing without dampening water have been filed since then with various configurations. Among such lithographic printing plates that do not require dampening water, in order to achieve negative working in silicone-top layer type lithographic printing plates that do not require dampening water and are constructed by providing a photosensitive layer and a silicone layer in this order on a support, it is necessary to For the layer, it is necessary to select a photo-solubilizable photosensitive substance. An example of a lithographic printing plate that does not require dampening water and has such a structure is shown in Japanese Patent Publication No. 16044/1983. In this plate configuration, the photosensitive layer in the exposed area is photodecomposed, becomes soluble in the developer, and is removed together with the upper silicone rubber layer, so the exposed area becomes the image area, making it a negative working lithographic printing plate that does not require dampening water. Become. However, the photo-solubilized photosensitive material that retains the silicone layer, which is the unexposed area and the non-image area, maintains its photosensitivity even after development, and remains sensitized by sunlight or indoor fluorescent light. and change. On the other hand, printing plates may come into contact with organic solvents similar to developing solvents during plate washing during the printing process or contact with printing ink, and in this case, no matter how good the image reproduction is obtained up to the developing process, After that, the photosensitive layer is re-exposed and becomes solubilized, so it is attacked by the organic solvent and falls off together with the silicone layer that forms the non-image area.
It has a fatal flaw in that the development reproducibility on the printing plate cannot be maintained.
かかる問題を解決するために、本発明者らは、
先に特開昭55−60947号において湿し水不要ネガ
型平版印刷版を露光、現像後、熱定着する方法を
開示したが、熱処理装置が必要なこと、大版用装
置の入手が容易でなく、熱処理操作もしくにくい
ことなど、実用的制約を受けることや経済的負担
になるなどの問題がある。 In order to solve this problem, the present inventors
Previously, JP-A No. 55-60947 disclosed a method of exposing, developing, and heat-fixing a negative planographic printing plate that does not require dampening water. However, there are problems such as practical limitations such as difficult heat treatment operations and economic burden.
本発明者らは、支持体上に感光層、シリコーン
層をこの順に塗設してなる構成を持つ湿し水不要
ネガ型平版印刷版において露光・現像後、定着す
る方法について鋭意検討した結果本発明に到達し
た。 The present inventors have conducted intensive studies on a method for fixing after exposure and development in a negative-working lithographic printing plate that does not require dampening water and has a structure in which a photosensitive layer and a silicone layer are coated on a support in this order. The invention has been achieved.
即ち、本発明は、支持体上にオルトキノンジア
ジド化合物を含む感光層およびシリコーンゴム層
この順に塗設してなる湿し水不要ネガ型平版印刷
版を、露光・現像後有機塩基処理することを特徴
とする前記印刷版の定着方法に関するものであ
る。 That is, the present invention is characterized in that a negative-working lithographic printing plate that does not require dampening water, which is formed by coating a photosensitive layer containing an orthoquinonediazide compound and a silicone rubber layer in this order on a support, is treated with an organic base after exposure and development. The present invention relates to a method for fixing the printing plate.
本発明の定着方法の特徴は現像後の印刷版を有
機基処理することにある。ここでいう塩基とは、
通常の化学分野で用いられている塩基を意味し、
陽子受容体あるいは電子供与体と定義されるもの
である。 A feature of the fixing method of the present invention is that the printing plate after development is treated with an organic group. The base mentioned here is
means a base used in the ordinary chemical field,
It is defined as a proton acceptor or an electron donor.
有機塩基としては、例えばアミン類、アルカリ
金属アルコラート、アルカリ金属アミドなどを挙
げることができる。例えばアミン類としては、脂
肪族鎖式アミン、脂肪族環式アミン、芳香族アミ
ン、ヘテロ環式アミンの一級、二級、三級アミン
およびモノアミン、ジアミン、トリアミン、テト
ラアミンなどのポリアミンを含むものであり、ア
ンモニア、メチルアミン、ジメチルアミン、トリ
メチルアミン、エチルアミン、ジエチルアミン、
トリエチルアミン、n―またはiso―プロピルア
ミン、ジプロピルアミン、トリプロピルアミン、
ブチルアミン、ジブチルアミン、トリブチルアミ
ン、アミルアミン、ジアミルアミン、メチルジエ
チルアミン、エチレンジアミン、トリメチレンジ
アミン、テトラメチレンジアミン、エタノールア
ミン、ジエタノールアミン、トリエタノールアミ
ン、ベンジルアミン、ジメチルベンジルアミン、
ジエチルベンジルアミン、ジプロピルベンジルア
ミン、o―またはm―またはp―メトキシまたは
メチルベンジルアミン、N,N―ジメトキシベン
ジルアミン、β―フエニルエチルアミン、ε,δ
―フエニルアミルアミン、γ―フエニルプロピル
アミン、シクロヘキシルアミン、アニリン、モノ
メチルアニリン、ジメチルアニリン、トルイジ
ン、ベンジジン、ナフチルアミン、フエニレンジ
アミン、ピロリジン、ピペリジン、ピペラジン、
モルホリン、ウロトロビン、ピロール、ピリジ
ン、キノリン、ヒドラジン、フエニルヒドラジ
ン、N,N′―ジフエニルヒドラジン、ヒドロキ
シルアミン、尿素、グリシン、アラニン、フエニ
ルアラニン、リジン、ヒスチジン、キニン、ブル
シン、水酸化テトラアルカルアンモニウムなどが
用いられる。 Examples of the organic base include amines, alkali metal alcoholates, and alkali metal amides. For example, amines include aliphatic chain amines, aliphatic cyclic amines, aromatic amines, heterocyclic amines, primary, secondary, and tertiary amines, and polyamines such as monoamines, diamines, triamines, and tetraamines. Yes, ammonia, methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine,
triethylamine, n- or iso-propylamine, dipropylamine, tripropylamine,
Butylamine, dibutylamine, tributylamine, amylamine, diamylamine, methyldiethylamine, ethylenediamine, trimethylenediamine, tetramethylenediamine, ethanolamine, diethanolamine, triethanolamine, benzylamine, dimethylbenzylamine,
Diethylbenzylamine, dipropylbenzylamine, o- or m- or p-methoxy or methylbenzylamine, N,N-dimethoxybenzylamine, β-phenylethylamine, ε, δ
-Phenylamylamine, γ-phenylpropylamine, cyclohexylamine, aniline, monomethylaniline, dimethylaniline, toluidine, benzidine, naphthylamine, phenylenediamine, pyrrolidine, piperidine, piperazine,
Morpholine, urothrobin, pyrrole, pyridine, quinoline, hydrazine, phenylhydrazine, N,N'-diphenylhydrazine, hydroxylamine, urea, glycine, alanine, phenylalanine, lysine, histidine, quinine, brucine, tetraalkal hydroxide Ammonium etc. are used.
アルカリ金属アルコラート、アミドとしては、
ナトリウム、カリウム、リチウムのメチラート、
エチラート、プロピラートなど、ナトリウム、カ
リウム、リチウムのアミド、ジエチルアミド、ジ
プロピルアミドなどが用いられる。 As alkali metal alcoholates and amides,
Methylates of sodium, potassium and lithium,
Ethylate, propylate, sodium, potassium, lithium amides, diethylamide, dipropylamide, etc. are used.
これらの有機塩基は単独あるいは混合して、液
状あるいは気相状で用いられる。液状の場合は例
えば、有機塩基そのものあるいは溶液の形で用い
る。溶液として用いる場合、溶媒は水または有機
溶剤または両者混合のいずれでもよい。液状で処
理する場合は有機塩基または有機塩基溶液で版面
をぬらす程度でよく、また、気相で処理する場合
は、該有機塩基を含む気相に版面を曝露すれば良
い。 These organic bases may be used alone or in a mixture, in liquid or gas phase. In the case of a liquid, it is used, for example, as an organic base itself or in the form of a solution. When used as a solution, the solvent may be water, an organic solvent, or a mixture of both. When processing in a liquid state, it is sufficient to wet the printing plate with an organic base or an organic base solution, and when processing in a gas phase, it is sufficient to expose the printing plate to a gaseous phase containing the organic base.
気相、液相いずれで処理する場合でも、効果の
発現は、その有機塩基の濃度依存性は小さく、濃
い場合は短時間、薄い場合は時間をかけて処理す
ればよい。しかし、操作のしやすさ、安全上およ
び実用的な処理時間から、気相では50%以下0.01
以上、好ましくは30〜40%以下0.1%以上、液相
では100%以下0.01%以上、好ましくは50%以下
0.1%以上の濃度範囲で行なわれる。 Regardless of whether the treatment is carried out in the gas or liquid phase, the effect is only slightly dependent on the concentration of the organic base; if the base is concentrated, the treatment may be carried out in a short time, and if the base is weak, the treatment may be carried out over a long period of time. However, from the viewpoint of ease of operation, safety and practical processing time, in the gas phase it is less than 50% 0.01
or more, preferably 30-40% or more, 0.1% or more, 100% or less in liquid phase, 0.01% or more, preferably 50% or less
It is carried out in a concentration range of 0.1% or more.
処理時間は上記のように有機塩基の濃度によつ
て適宜選択できるが、通常約1〜30分間程度であ
る。また処理に際しては、定着がある程度以上進
行すれば、それ以上時間をかけて処理しても効果
としては同じである。 The treatment time can be appropriately selected depending on the concentration of the organic base as described above, but is usually about 1 to 30 minutes. Further, during processing, if the fixing progresses beyond a certain level, the effect will be the same even if the processing takes longer than that.
印刷版の感光層中に用いられるオルトキノンジ
アジド化合物は、通常ポジ型PS版、ワイポン版、
フオトレジストなどに用いられているオルトキノ
ンジアジド類であつて、分子内に1,2―キノン
ジアジドあるいは1,2―ナフトキノンジアジド
構造を有するものであつて、通常スルホン酸誘導
体たとえばエステル、アミドといつた形で用いら
れる。 Orthoquinone diazide compounds used in the photosensitive layer of printing plates are usually used in positive-working PS plates, Wipon plates,
Orthoquinone diazides used in photoresists etc. have a 1,2-quinone diazide or 1,2-naphthoquinone diazide structure in the molecule, and are usually in the form of sulfonic acid derivatives such as esters and amides. used in
本発明の感光層は、たとえば特開昭55−59466
に示されるような光可溶化型感光層または特願昭
54−156871(特開昭56−80046号公報参照)で提案
されたような光ハクリ性感光層のいずれからなる
ものである。光可溶化型感光層として特に好まし
いものはノボラツク樹脂、ピロガロールアセトン
樹脂、ポリヒドロキシスチレンのナフトキノン―
1,2―ジアジド―5―スルホン酸部分エステル
化物である。ここで言うノボラツク樹脂とはフエ
ノールまたはm―クレゾールをホルムアルデヒド
と縮合して得られるノボラツク型のフエノール樹
脂である。 The photosensitive layer of the present invention is, for example, disclosed in Japanese Patent Application Laid-Open No. 55-59466.
A photo-solubilizable photosensitive layer or a photosensitive layer as shown in
No. 54-156871 (see Japanese Patent Application Laid-open No. 56-80046). Particularly preferred as the photo-solubilized photosensitive layer are novolak resin, pyrogallol acetone resin, and naphthoquinone of polyhydroxystyrene.
It is a partially esterified product of 1,2-diazido-5-sulfonic acid. The novolak resin referred to herein is a novolak type phenolic resin obtained by condensing phenol or m-cresol with formaldehyde.
光ハクリ性感光層として特に好ましいものは、
上記部分エステル化物を多官能もしくは単官能化
合物で架橋もしくは変性して得られるものであ
る。感光層の厚さは約0.1〜100μ、好ましくは約
0.5〜10μが適当で、薄すぎると塗工時にピンホー
ル等の欠陥が生じ易くなり、一方厚すぎると経済
的見地から不利である。 Particularly preferable photosensitive layers include:
It is obtained by crosslinking or modifying the above partially esterified product with a polyfunctional or monofunctional compound. The thickness of the photosensitive layer is about 0.1-100μ, preferably about
A suitable thickness is 0.5 to 10μ; if it is too thin, defects such as pinholes are likely to occur during coating, while if it is too thick, it is disadvantageous from an economic standpoint.
また感光層中には本発明の効果を損わない範囲
で塗膜形成性向上や支持体との接着性向上などの
目的で他成分を加えたり、また現像時あるいは露
光時に画像を可視化するために染料などを加えた
りすることは可能である。 In addition, other components may be added to the photosensitive layer for the purpose of improving coating film formation properties and adhesion to the support within a range that does not impair the effects of the present invention, or to make images visible during development or exposure. It is possible to add dyes etc.
本発明に用いられるシリコーンゴム層は、次の
ようなくり返し単位を有する分子量数千〜数十万
の線状有機ポリシロキサンを主成分とする。 The silicone rubber layer used in the present invention is mainly composed of a linear organic polysiloxane having a molecular weight of several thousand to several hundred thousand and having the following repeating units.
ここでnは1以上の整数、Rは炭素数1〜10の
アルキル基、アルケニル基あるいはフエニル基で
あり、Rの60%以上がメチル基であるものが好ま
しい。このような線状有機ポリシロキサンは有機
過酸化物を添加して熱処理等を施すことにより、
まばらに架橋しシリコーンゴムとすることも可能
である。 Here, n is an integer of 1 or more, R is an alkyl group, alkenyl group, or phenyl group having 1 to 10 carbon atoms, and preferably 60% or more of R is a methyl group. Such linear organic polysiloxanes can be made by adding organic peroxides and subjecting them to heat treatment, etc.
It is also possible to form a silicone rubber by sparsely crosslinking.
この線状有機ポリシロキサンにはまた架橋剤が
添加される。架橋剤としては、いわゆる室温(低
温)硬化型のシリコーンゴムに使われるものとし
て、アセトキシシラン、ケトオキシムシラン、ア
ルコキシシラン、アミノシラン、アミドシランな
どがあり、通常線状有機ポリシロキサンとして末
端が水酸基であるものとくみ合わせて、各々脱酢
酸型、脱オキシム型、脱アルコール型、脱アミン
型、脱アミド型のシリコーンゴムとなる。これら
のシリコーンゴムには、更に触媒として少量の有
機スズ化合物等が添加されるのが一般的である。 A crosslinking agent is also added to the linear organopolysiloxane. Crosslinking agents used in so-called room temperature (low temperature) curing silicone rubber include acetoxysilane, ketoxime silane, alkoxysilane, aminosilane, amidosilane, etc., and are usually linear organic polysiloxanes with hydroxyl groups at the ends. When combined, they become deaceticated, oxime-free, alcohol-dealt, deamined, and deamidated silicone rubbers. Generally, a small amount of an organic tin compound or the like is further added as a catalyst to these silicone rubbers.
シリコーンゴム層の厚さは、約0.5〜100μ、好
ましくは約0.5〜10μが適当であり、薄すぎる場合
は耐刷力の点で問題を生じることがあり、一方厚
すぎる場合は経済的に不利であるばかりでなく、
現像時シリコーンゴム層を除去するのが困難とな
り画像再現性の低下をもたらす。 The appropriate thickness of the silicone rubber layer is approximately 0.5 to 100μ, preferably approximately 0.5 to 10μ; if it is too thin, it may cause problems in terms of printing durability, while if it is too thick, it is economically disadvantageous. Not only is
It becomes difficult to remove the silicone rubber layer during development, resulting in a decrease in image reproducibility.
本発明の平版印刷版において、支持体と感光
層、感光層とシリコーンゴム層との接着は、画像
再現性、耐刷力などの基本的な版性能にとり、非
常に重要であるので、必要に応じて各層間に接着
剤層を設けたり、各層に接着改良性成分を添加し
たりすることが可能である。特に感光層とシリコ
ーンゴム層間の接着のために、層間に公知のシリ
コーンプライマやシランカツプリング剤層を設け
たり、シリコーンゴム層あるいは感光層にシリコ
ーンプライマやシランカツプリング剤を添加する
と効果的である。 In the lithographic printing plate of the present invention, adhesion between the support and the photosensitive layer, and between the photosensitive layer and the silicone rubber layer is very important for basic plate performance such as image reproducibility and printing durability, so it is necessary to Accordingly, it is possible to provide an adhesive layer between each layer or to add an adhesion-improving component to each layer. In particular, for adhesion between the photosensitive layer and the silicone rubber layer, it is effective to provide a known silicone primer or silane coupling agent layer between the layers, or to add a silicone primer or silane coupling agent to the silicone rubber layer or photosensitive layer. .
支持体としては、通常の平版印刷機にセツトで
きるたわみ性と印刷時に加わる荷重に耐えうるも
のでなければならない。代表的なものとしてはア
ルミ、銅、鋼等の金属板、ポリエチレンテレフタ
レートのようなプラスチツクフイルムあるいはコ
ート紙等があげられる。これらのシート上にハレ
ーシヨン防止その他の目的でさらにコーテイング
を施して支持体とすることも可能である。 The support must be flexible enough to be set in a normal lithographic printing machine and capable of withstanding the load applied during printing. Typical examples include metal plates such as aluminum, copper, and steel, plastic films such as polyethylene terephthalate, and coated paper. It is also possible to provide a support by further applying a coating to these sheets for antihalation and other purposes.
以上説明したようにして構成された湿し水不要
の平版印刷版の表面を形成するシリコーンゴム層
を保護するなどの目的で、シリコーンゴム層の表
面に薄い保護フイルムをラミネートすることもで
きる。 For the purpose of protecting the silicone rubber layer forming the surface of the planographic printing plate that does not require dampening water and constructed as described above, a thin protective film may be laminated on the surface of the silicone rubber layer.
以上説明したような湿し水不要の平版印刷版
は、例えば次のようにして製造される。まず支持
体のうえに、リバースロールコータ、エアーナイ
フコータ、メーヤバーコータなどの通常のコータ
あるいはホエラーのような回転塗布装置を用い感
光層を構成すべき組成物溶液を塗布、乾燥および
必要に応じて熱キユア後、必要ならば該感光層の
うえに同様な方法で接着層を塗布、乾燥後、シリ
コーンガム溶液を接着層上に同様の方法で塗布
し、通常100〜120℃の温度で数分間熱処理して、
十分に硬化せしめてシリコーンゴム層を形成す
る。必要ならば、保護フイルムを該シリコーンゴ
ム層上にラミネーター等を用いカバーする。 The lithographic printing plate that does not require dampening water as described above is manufactured, for example, as follows. First, a composition solution to form a photosensitive layer is applied onto a support using a normal coater such as a reverse roll coater, an air knife coater, a Meyer bar coater, or a rotary coater such as a Whaler, and then dried and coated as necessary. After heat curing, if necessary, apply an adhesive layer on the photosensitive layer in the same manner, and after drying, apply a silicone gum solution on the adhesive layer in the same manner, and cure several times at a temperature of usually 100 to 120°C. Heat treated for a minute,
Fully cure to form a silicone rubber layer. If necessary, cover the silicone rubber layer with a protective film using a laminator or the like.
このようにして製造された湿し水不要の平版印
刷版は、例えば真空密着されたネガフイルムを通
して活性光線に露光される。この露光工程で用い
られる光源は、紫外線を豊富に発生するものであ
り、水銀灯、カーボンアーク灯、キセノンラン
プ、メタルハライドランプ、螢光灯などを使うこ
とができる。 The thus produced lithographic printing plate, which does not require dampening water, is exposed to actinic light through, for example, a negative film sealed in vacuum. The light source used in this exposure process is one that generates abundant ultraviolet light, and can be a mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, or the like.
露光の終つた印刷版は必要に応じて保護フイル
ムを剥がし現像液に浸漬し、ソフパツドのような
柔らかい現像用パツドを用いて表面を軽くこす
る。 After exposure, remove the protective film from the exposed printing plate if necessary, immerse it in a developer, and lightly rub the surface with a soft developing pad such as Sofpad.
光可溶化型感光層の場合は、露光部の感光層が
溶解するとともに上部のシリコーンゴム層が容易
に剥ぎとられ支持体が露出する。 In the case of a photo-solubilizable photosensitive layer, the photosensitive layer in the exposed area is dissolved and the upper silicone rubber layer is easily peeled off to expose the support.
光ハクリ性感光層の場合は、露光部のシリコー
ンゴム層のみが除去され、感光層が露出する。 In the case of a light-peelable photosensitive layer, only the silicone rubber layer in the exposed areas is removed, exposing the photosensitive layer.
用いられる現像液としては、シリコーンゴムを
膨潤させ得る脂肪族炭化水素類(ヘキサン、ヘプ
タンあるいはガソリン、灯油など)、芳香族炭化
水素類(トルエン、キシレンなど)あるいはハロ
ゲン化炭化水素類(トリクレンなど)に下記の極
性溶媒を添加したものが好適である。 The developing solution used is aliphatic hydrocarbons (hexane, heptane, gasoline, kerosene, etc.), aromatic hydrocarbons (toluene, xylene, etc.), or halogenated hydrocarbons (triclene, etc.) that can swell silicone rubber. It is preferable to add the following polar solvent to the above.
アルコール類(メタノール、エタノールなど)
エーテル類(エチルセロソルブ、ジオキサンな
ど)
ケトン類(アセトン、メチルエチルケトンな
ど)
エステル類(酢酸エチル、セロソルブアセテー
トなど)
このようにして現像された印刷版は前述のよう
に有機塩基処理することで定着され、再露光され
ても感光層が現像剤等の有機溶媒に侵されること
はなくなる。 Alcohols (methanol, ethanol, etc.) Ethers (ethyl cellosolve, dioxane, etc.) Ketones (acetone, methyl ethyl ketone, etc.) Esters (ethyl acetate, cellosolve acetate, etc.) Printing plates developed in this way are organic as described above. The base treatment fixes the photosensitive layer, and even if it is re-exposed, the photosensitive layer will not be attacked by an organic solvent such as a developer.
上記有機塩基処理によつて定着作用が得られる
ことについて、必ずしもその作用機構は明らかで
ないが、有機塩基とオルトキノンジアジド化合物
が反応し感光層を架橋するためではないかと推定
される。 Although the mechanism by which the fixing effect is obtained by the organic base treatment is not necessarily clear, it is presumed that the organic base and the orthoquinone diazide compound react to crosslink the photosensitive layer.
本発明によつて得られる効果としては次のよう
なものがあげられる。 The effects obtained by the present invention include the following.
(1) 感光層の耐溶剤性の増大
(2) 感光層―シリコーンゴム層間の接着力の増大
以上のような効果によつて刷版の耐刷性、耐溶
剤性は飛躍的に増大する。(1) Increased solvent resistance of the photosensitive layer (2) Increased adhesive strength between the photosensitive layer and the silicone rubber layer The above effects dramatically increase the printing durability and solvent resistance of the printing plate.
以下に実施例をあげて本発明を詳細に説明す
る。 The present invention will be explained in detail by giving examples below.
実施例1,比較例1
化成処理アルミ板(住友軽金属製)にエステル
化度44%のフエノールノボラツク樹脂のナフトキ
ノン―1,2―ジアジド―5―スルホン酸エステ
ルの7重量%ジオキサン溶液をホエラーで回転塗
布後60℃3分間乾燥させた。この上にγ―アミノ
プロピルトリエトキシシラン(ユニオンカーバイ
ド製、“A1100)”の0.5重量%“アイソパーE”
(エツソ製)溶液をホエラーで回転塗布し、1日
放置後東芝シリコーン製RTVシリコーン
「YE3085」をアイソパーEで希釈しホエラーで10
分間回転塗布後、120℃、4分間加熱硬化し、厚
さ2μのシリコーンゴム層を設け印刷用原版とし
た。Example 1, Comparative Example 1 A 7% by weight dioxane solution of naphthoquinone-1,2-diazide-5-sulfonic acid ester of phenol novolak resin with a degree of esterification of 44% was applied to a chemical conversion treated aluminum plate (manufactured by Sumitomo Light Metal) using a Whaler. After spin coating, it was dried at 60°C for 3 minutes. On top of this, 0.5% by weight of γ-aminopropyltriethoxysilane (manufactured by Union Carbide, "A1100)""IsoperE"
Spin coat the solution (manufactured by Etsuso) with a Whaler, leave it for one day, dilute RTV silicone "YE3085" manufactured by Toshiba Silicone with Isopar E, and apply it with a Whaler for 10 minutes.
After spin coating for a minute, the coating was cured by heating at 120° C. for 4 minutes to form a silicone rubber layer with a thickness of 2 μm, which was used as a printing original plate.
得られた印刷原版にネガフイルムを通しメタル
ハライドランプを用い1mの距離から60秒照射し
た。版面をエタノール(9部)/アイソパーE
(1部)の混合溶媒に浸漬し現像パツドで軽くこ
すると、露光部は容易に除去されて、パターン状
にアルミ表面が露出した。 The obtained printing original plate was passed through a negative film and irradiated for 60 seconds from a distance of 1 m using a metal halide lamp. Coat the plate with ethanol (9 parts)/Isopar E
(1 part) of the mixed solvent and lightly rubbed with a developing pad, the exposed areas were easily removed and the aluminum surface was exposed in a pattern.
版をベンジルアミンを1%含むエタノール液で
5分間処理して定着を行なつた。メタルハライド
ランプで全面再露光し、版面をエタノール、酢酸
ブチルでこすつたが版面が損傷することは全くな
かつた。 Fixing was carried out by treating the plate with an ethanol solution containing 1% benzylamine for 5 minutes. The entire surface was reexposed with a metal halide lamp, and the plate surface was rubbed with ethanol and butyl acetate, but the plate surface was not damaged at all.
比較例として有機塩基処理しない印刷版は同様
の試験で非画線部シリコーンゴム層のハクリがみ
られた。 As a comparative example, a printing plate that was not treated with an organic base showed peeling of the silicone rubber layer in the non-image area in the same test.
実施例 2
化成処理アルミ板(住友軽金属製)にエステル
化度44%のフエノールノボラツク樹脂(住友ベー
クライト製:スミレジンPR50235)のナフトキノ
ン―1,2―ジアジド―5―スルホン酸エステル
(エタノール可溶性成分9.7重量%、エステル化度
はIRスペクトルから定量)の3重量%ジオキシ
サン溶液をホエラーで回転塗布、乾燥させて1.2μ
の感光層を形成した。この上に次の組成を持つシ
リコーンガム組成物の7%アイソパーE溶液に、
シリコーン組成物に対し4重量%のγ―アミノプ
ロピルトリエトキシシラン(UCC製:A1100)を
添加し、均一に撹拌後ホエラーで回転塗布した。
乾燥後120℃、4分間加熱硬化し2.2μのシリコー
ンゴム層を得た。Example 2 Naphthoquinone-1,2-diazide-5-sulfonic acid ester (ethanol soluble component: 9.7 A 3 wt % dioxysan solution (wt%, degree of esterification determined from IR spectrum) was spin-coated using a Whaler and dried to 1.2μ.
A photosensitive layer was formed. On top of this, add a 7% Isopar E solution of a silicone gum composition having the following composition:
4% by weight of γ-aminopropyltriethoxysilane (manufactured by UCC: A1100) was added to the silicone composition, stirred uniformly, and then spin-coated using a Whaler.
After drying, it was cured by heating at 120°C for 4 minutes to obtain a 2.2μ silicone rubber layer.
(a) ジメチルポリシロキサン
(分子量約80000、未端OH基) 100部
(b) エチルトリアセトキシシラン 5部
(c) ジブチル錫ジアセテート 0.2部
上記のようにして得られた印刷原版に、真空密
着した150線の網点画像を持つネガフイルムを通
してメタルハライドランプ(岩崎電気製アイドル
フイン2000)を用い、1mの距離から60秒照射し
た。露光された版は、エタノール8部アイソパー
E2部からなる現像液を用い、30cm/分の搬送速
度で自動現像機を通して現像したところ、露光部
分は容易に除去されて化成処理アルミ表面が露出
し、一方未露光部にはシリコーンゴム層が強固に
残存しており、ネガフイルムを忠実に再現した画
像が得られた。(a) Dimethylpolysiloxane (molecular weight approximately 80,000, unterminated OH groups) 100 parts (b) Ethyltriacetoxysilane 5 parts (c) Dibutyltin diacetate 0.2 parts The original printing plate obtained as above was vacuum-adhered. The film was irradiated for 60 seconds from a distance of 1 m using a metal halide lamp (Idolfin 2000 manufactured by Iwasaki Electric) through a negative film having a halftone image of 150 lines. The exposed plate was washed with 8 parts isopar of ethanol.
When development was carried out through an automatic developing machine at a transport speed of 30 cm/min using a developer consisting of E2 parts, the exposed areas were easily removed and the chemical conversion treated aluminum surface was exposed, while the unexposed areas had a silicone rubber layer. It remained strong and an image that faithfully reproduced the negative film was obtained.
この印刷版を5%エタノールアミンの水/アル
コール混合溶液に10分間浸漬処理してから水洗
し、乾燥させた。この印刷版をオフセツト印刷機
(小森スプリント2カラー)に取り付け、東洋イ
ンキ製“アクアレスST藍”を用いて、湿し水を
用いないで印刷したところ150線の網点5〜95%
が再現された極めて良好な画像を持つ印刷物が得
られた。5万部刷了後も地汚れおよび版面の損傷
は全く見られず、さらに印刷を継続できる状態で
あつた。印刷物画像再現性も印刷期間を通じ全く
変化がなかつた。 This printing plate was immersed in a 5% ethanolamine water/alcohol mixed solution for 10 minutes, washed with water, and dried. This printing plate was attached to an offset printing machine (Komori Sprint 2 Color) and printed using Toyo Ink's "Aquares ST Indigo" without using dampening water, resulting in a 150-line halftone dot of 5 to 95%.
A printed matter with an extremely good image in which the images were reproduced was obtained. Even after printing 50,000 copies, no scumming or damage to the plate surface was observed, and printing could continue. The image reproducibility of the printed matter did not change at all throughout the printing period.
実施例3,比較例2
厚み0.24mmのアルミ板(住友軽金属製)にレゾ
ール樹脂(スミライトレジンPC−1、住友デユ
レズ製)を2μの厚みに塗布し、180℃,3分間キ
ユアして支持体とした。この支持体上に下記の感
光層組成物を回転塗布、120℃、2分間加熱硬化
させ、厚み2.4μの感光層を設けた。Example 3, Comparative Example 2 A 0.24 mm thick aluminum plate (manufactured by Sumitomo Light Metals) was coated with resol resin (Sumilight Resin PC-1, manufactured by Sumitomo Durez) to a thickness of 2μ, cured at 180°C for 3 minutes, and supported. As a body. On this support, the following photosensitive layer composition was spin-coated and cured by heating at 120° C. for 2 minutes to form a photosensitive layer having a thickness of 2.4 μm.
(a) フエノールノボラツク樹脂のナフトキノン―
1,2―ジアジド―5―スルホン酸エステル
(実施例1のもの) 100部
(b) 2,6―トルエンジイソシアナート 20部
(c) ジブチル錫ジラウレート 0.2部
(d) ジオキサン 2000部
この上に下記の組成を持つシリコーンゴム組成
液を回転塗布し、120℃,2分間加熱硬化させて
2.1μのシリコーンゴム層を設けた。(a) Naphthoquinone in phenolic novolak resin
1,2-Diazide-5-sulfonic acid ester (from Example 1) 100 parts (b) 2,6-toluene diisocyanate 20 parts (c) Dibutyltin dilaurate 0.2 parts (d) Dioxane 2000 parts On top of this Spin coat a silicone rubber composition liquid with the following composition and heat cure it at 120℃ for 2 minutes.
A 2.1μ silicone rubber layer was provided.
(a) ジメチルポリシロキサン(分子量約80000末
端水酸基) 100部
(b) ビニルトリ(メチルエチルケトキシム)シラ
ン 8部
(c) ジブチル錫ジアセテート 0.2部
(d) γ―〔N―(β―アミノエチル)アミノ〕プ
ロピルトリメトキシシラン 1.0部
(e) アイソパーE 1800部
上記のようにして得られた印刷原版に真空密着
した150線の網点画像を持つネガフイルムを通し
てメタルハライドランプを用い1mの距離から60
秒露光した。版面を現像液(アイソパーE/エタ
ノール=9/1)に浸漬し、現像パツドで軽くこす
ると露光部シリコーンゴム層のみが除去され、ネ
ガフイルムの画像を忠実に再現した感光層の露出
した印刷版が得られた。(a) Dimethylpolysiloxane (molecular weight approximately 80,000, terminal hydroxyl group) 100 parts (b) Vinyltri(methylethylketoxime) silane 8 parts (c) Dibutyltin diacetate 0.2 parts (d) γ-[N-(β-aminoethyl)amino ] Propyltrimethoxysilane 1.0 part (e) Isopar E 1800 parts A negative film with a halftone image of 150 lines is passed through a negative film with a halftone image of 150 lines, which is vacuum-adhered to the printing original plate obtained as above, from a distance of 60 m from a distance of 1 m using a metal halide lamp.
Second exposure. When the plate surface is immersed in a developer (Isopar E/ethanol = 9/1) and rubbed lightly with a developer pad, only the exposed silicone rubber layer is removed, resulting in a printing plate with an exposed photosensitive layer that faithfully reproduces the negative film image. was gotten.
この版を5%ナトリウムエチラートの水/エチ
ルセロソルブ混合溶液で3分間ぬらして定着す
る。定着した印刷版に10g/cm2の荷重をかけ、
UVインキ“ダイキユア”用ローラ洗い油(大日
本インキ製)に浸漬させた“ソフパツド”(大日
本スクリーン発売)のヘツドを備えた摩さつ試験
機でコスリテストを行なつたところ、往復500回
の摩さつ試験ではシリコーンゴム層のはく離はみ
られなかつた。しかし、定着処理しない印刷版は
100〜300回の往復回数でシリコーンゴム層のはく
離がみられた。 This plate is fixed by wetting it for 3 minutes with a mixed solution of 5% sodium ethylate in water/ethyl cellosolve. Apply a load of 10 g/cm 2 to the fixed printing plate,
When we conducted a scratch test using a polishing tester equipped with a head of "Sofpad" (manufactured by Dainippon Screen) immersed in roller cleaning oil (manufactured by Dainippon Ink) for the UV ink "Daikyure", we found that In the rubbing test, no peeling of the silicone rubber layer was observed. However, printing plates without fixing treatment
Peeling of the silicone rubber layer was observed after 100 to 300 reciprocations.
実施例 4
実施例3で現像された版を、密閉容器中でエチ
ルアミンの蒸気に3分間曝気した後、同様のコス
リテストを行なつたが500回のこすりでもシリコ
ーン層の剥離は認められなかつた。Example 4 The plate developed in Example 3 was exposed to ethylamine vapor in a closed container for 3 minutes and then subjected to a similar scratch test, but no peeling of the silicone layer was observed even after 500 rubs.
Claims (1)
含む感光層およびシリコーンゴム層をこの順に塗
設してなる湿し水不要ネガ型平版印刷版を、露
光、現像後有機塩基処理することを特徴とする前
記印刷版の定着方法。1. A negative-working lithographic printing plate that does not require dampening water and is prepared by coating a photosensitive layer containing an orthoquinone diazide compound and a silicone rubber layer on a support in this order, is treated with an organic base after exposure and development. How to fix printing plates.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9085881A JPS57205740A (en) | 1981-06-15 | 1981-06-15 | Method for fixing negative type lithographic plate requiring no dampening water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9085881A JPS57205740A (en) | 1981-06-15 | 1981-06-15 | Method for fixing negative type lithographic plate requiring no dampening water |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57205740A JPS57205740A (en) | 1982-12-16 |
JPH0213295B2 true JPH0213295B2 (en) | 1990-04-03 |
Family
ID=14010252
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9085881A Granted JPS57205740A (en) | 1981-06-15 | 1981-06-15 | Method for fixing negative type lithographic plate requiring no dampening water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57205740A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5917552A (en) * | 1982-07-21 | 1984-01-28 | Toray Ind Inc | Method for processing image forming laminate |
JPS6028654A (en) * | 1983-07-27 | 1985-02-13 | Toray Ind Inc | Method for processing lithographic plate using no dampening water |
JPS60169852A (en) * | 1984-02-14 | 1985-09-03 | Fuji Photo Film Co Ltd | Manufacture of negative type photosensitive lithographic plate requiring no dampening water |
GB8920622D0 (en) * | 1989-09-12 | 1989-10-25 | Du Pont | Improvements in or relating to lithographic printing plates |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS526205A (en) * | 1975-06-30 | 1977-01-18 | Hoechst Ag | Method of producing lithographic plate |
-
1981
- 1981-06-15 JP JP9085881A patent/JPS57205740A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS526205A (en) * | 1975-06-30 | 1977-01-18 | Hoechst Ag | Method of producing lithographic plate |
Also Published As
Publication number | Publication date |
---|---|
JPS57205740A (en) | 1982-12-16 |
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