JPS63214757A - Method for making waterless planographic lithographic printing plate - Google Patents
Method for making waterless planographic lithographic printing plateInfo
- Publication number
- JPS63214757A JPS63214757A JP4762487A JP4762487A JPS63214757A JP S63214757 A JPS63214757 A JP S63214757A JP 4762487 A JP4762487 A JP 4762487A JP 4762487 A JP4762487 A JP 4762487A JP S63214757 A JPS63214757 A JP S63214757A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- plate
- printing plate
- lithographic printing
- silicone rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007639 printing Methods 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims description 20
- 229920002379 silicone rubber Polymers 0.000 claims abstract description 24
- 239000004945 silicone rubber Substances 0.000 claims abstract description 23
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical group [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 15
- 239000011248 coating agent Substances 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims abstract description 4
- 150000007524 organic acids Chemical class 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 11
- 238000009835 boiling Methods 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 150000001735 carboxylic acids Chemical class 0.000 claims description 3
- -1 polysiloxane Polymers 0.000 abstract description 12
- 238000012545 processing Methods 0.000 abstract description 11
- 229920001296 polysiloxane Polymers 0.000 abstract description 9
- 150000002148 esters Chemical class 0.000 abstract description 7
- 239000002253 acid Substances 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 abstract description 4
- 125000003342 alkenyl group Chemical group 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 2
- 230000000593 degrading effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 50
- 239000000243 solution Substances 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000007689 inspection Methods 0.000 description 6
- 229910001507 metal halide Inorganic materials 0.000 description 6
- 150000005309 metal halides Chemical class 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 4
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 4
- ZDPHROOEEOARMN-UHFFFAOYSA-N undecanoic acid Chemical compound CCCCCCCCCCC(O)=O ZDPHROOEEOARMN-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 3
- 230000032050 esterification Effects 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 150000002513 isocyanates Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- OVBFMEVBMNZIBR-UHFFFAOYSA-N 2-methylvaleric acid Chemical compound CCCC(C)C(O)=O OVBFMEVBMNZIBR-UHFFFAOYSA-N 0.000 description 2
- LAIUFBWHERIJIH-UHFFFAOYSA-N 3-Methylheptane Chemical compound CCCCC(C)CC LAIUFBWHERIJIH-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- BHHGXPLMPWCGHP-UHFFFAOYSA-N Phenethylamine Chemical compound NCCC1=CC=CC=C1 BHHGXPLMPWCGHP-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- DQYBDCGIPTYXML-UHFFFAOYSA-N ethoxyethane;hydrate Chemical compound O.CCOCC DQYBDCGIPTYXML-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- QEWYKACRFQMRMB-UHFFFAOYSA-N fluoroacetic acid Chemical compound OC(=O)CF QEWYKACRFQMRMB-UHFFFAOYSA-N 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- FGKJLKRYENPLQH-UHFFFAOYSA-N isocaproic acid Chemical compound CC(C)CCC(O)=O FGKJLKRYENPLQH-UHFFFAOYSA-N 0.000 description 2
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- 229960002446 octanoic acid Drugs 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 150000003739 xylenols Chemical class 0.000 description 2
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- WXWYJCSIHQKADM-ZNAKCYKMSA-N (e)-n-[bis[[(e)-butan-2-ylideneamino]oxy]-ethenylsilyl]oxybutan-2-imine Chemical compound CC\C(C)=N\O[Si](O\N=C(/C)CC)(O\N=C(/C)CC)C=C WXWYJCSIHQKADM-ZNAKCYKMSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- IDPURXSQCKYKIJ-UHFFFAOYSA-N 1-(4-methoxyphenyl)methanamine Chemical group COC1=CC=C(CN)C=C1 IDPURXSQCKYKIJ-UHFFFAOYSA-N 0.000 description 1
- VZAWCLCJGSBATP-UHFFFAOYSA-N 1-cycloundecyl-1,2-diazacycloundecane Chemical compound C1CCCCCCCCCC1N1NCCCCCCCCC1 VZAWCLCJGSBATP-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- KIAMPLQEZAMORJ-UHFFFAOYSA-N 1-ethoxy-2-[2-(2-ethoxyethoxy)ethoxy]ethane Chemical compound CCOCCOCCOCCOCC KIAMPLQEZAMORJ-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- XUNGLLQAIXMNJD-UHFFFAOYSA-N 1-methoxy-n-[methoxy(phenyl)methyl]-1-phenylmethanamine Chemical compound C=1C=CC=CC=1C(OC)NC(OC)C1=CC=CC=C1 XUNGLLQAIXMNJD-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 1
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- LJDSTRZHPWMDPG-UHFFFAOYSA-N 2-(butylamino)ethanol Chemical compound CCCCNCCO LJDSTRZHPWMDPG-UHFFFAOYSA-N 0.000 description 1
- MIJDSYMOBYNHOT-UHFFFAOYSA-N 2-(ethylamino)ethanol Chemical compound CCNCCO MIJDSYMOBYNHOT-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- OXQGTIUCKGYOAA-UHFFFAOYSA-N 2-Ethylbutanoic acid Chemical compound CCC(CC)C(O)=O OXQGTIUCKGYOAA-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- UXFQFBNBSPQBJW-UHFFFAOYSA-N 2-amino-2-methylpropane-1,3-diol Chemical compound OCC(N)(C)CO UXFQFBNBSPQBJW-UHFFFAOYSA-N 0.000 description 1
- XXSPGBOGLXKMDU-UHFFFAOYSA-N 2-bromo-2-methylpropanoic acid Chemical compound CC(C)(Br)C(O)=O XXSPGBOGLXKMDU-UHFFFAOYSA-N 0.000 description 1
- UEBARDWJXBGYEJ-UHFFFAOYSA-N 2-bromo-3-methylbutanoic acid Chemical compound CC(C)C(Br)C(O)=O UEBARDWJXBGYEJ-UHFFFAOYSA-N 0.000 description 1
- YAQLSKVCTLCIIE-UHFFFAOYSA-N 2-bromobutyric acid Chemical compound CCC(Br)C(O)=O YAQLSKVCTLCIIE-UHFFFAOYSA-N 0.000 description 1
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- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
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- 239000003960 organic solvent Substances 0.000 description 1
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 1
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- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
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- 229920005749 polyurethane resin Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
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- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- DUIOPKIIICUYRZ-UHFFFAOYSA-N semicarbazide Chemical compound NNC(N)=O DUIOPKIIICUYRZ-UHFFFAOYSA-N 0.000 description 1
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- 229960004274 stearic acid Drugs 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
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- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
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- 238000001029 thermal curing Methods 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 229960004319 trichloroacetic acid Drugs 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は水なし平版印刷版の製版方法に関するものであ
り、特に検版性に優れた水なし平版印刷版の製版方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for making a waterless planographic printing plate, and particularly to a method for making a waterless planographic printing plate with excellent plate inspection properties.
[従来技術]
感光層、シリコーンゴム層からなる水なし平版印刷版と
しては、種々のものが知られている。中でも、支持体上
にキノンジアジド構造を含む物質を構成成分とする感光
層およびシリコーンゴム層をこの順に設けてなる画像形
成用積層体を塩基処理することによって、ネガ、ポジ両
性タイプの水なし平版印刷版を得る方法は、特開昭59
−17552に開示されているように、水なし平版印刷
版の画像再現性、耐溶剤性、現像性などを含めた現像ラ
チチュードを広げ、かつネガ型とポジ型の版が同一の版
材からできること等の優れた特徴を有している。[Prior Art] Various types of waterless lithographic printing plates comprising a photosensitive layer and a silicone rubber layer are known. Among these, negative and positive amphoteric type waterless lithographic printing can be achieved by base-treating an image forming laminate comprising a support, in which a photosensitive layer containing a substance containing a quinonediazide structure and a silicone rubber layer are provided in this order. The method to obtain the plate is published in Japanese Patent Application Laid-open No. 1983.
- As disclosed in No. 17552, the development latitude of waterless lithographic printing plates including image reproducibility, solvent resistance, developability, etc. can be expanded, and negative and positive plates can be made from the same plate material. It has excellent characteristics such as
また、特開昭60−28654には画像露光し、かつ塩
基処理した後、または塩基処理と同時に水または水を主
成分とする現像液を用いて画像形成する方法が提案され
ている。さらに特開昭57−205740、特開昭60
−169852、特開昭60−192948には画像露
光し、現像の前または侵に塩基処理を行ない非画線部を
定着する方法が開示されている。Furthermore, Japanese Patent Laid-Open No. 60-28654 proposes a method of forming an image using water or a developer containing water as a main component after image exposure and base treatment, or simultaneously with base treatment. In addition, JP-A-57-205740, JP-A-60
169852 and JP-A-60-192948 disclose a method of imagewise exposure and base treatment before or after development to fix non-image areas.
これらの従来技術による水なし平版印刷版の製版方法に
おいて、塩基処理を行なうと、非画線部感光層が褐色に
変色するため画線部と非画線部が区別しにくくなり、検
版性が著しく悪くなったり、版の脱色むら等で版のイメ
ージが悪くなるなどの欠点を有している。In these conventional plate-making methods for waterless lithographic printing plates, when the base treatment is performed, the photosensitive layer in the non-image area changes color to brown, making it difficult to distinguish between the image area and the non-image area, resulting in poor plate inspection properties. It has disadvantages such as the image quality of the plate becomes poor due to the uneven decolorization of the plate and the like.
[発明が解決しようとする問題点]
本発明者らは、かかる問題点を解決すべく鋭意検討した
結果、塩基処理後に有機酸を含む処理液で処理すること
が好適であることを見出し、本発明に到達した。[Problems to be Solved by the Invention] As a result of intensive studies to solve these problems, the present inventors found that it is suitable to perform treatment with a treatment liquid containing an organic acid after base treatment. The invention has been achieved.
本発明の目的は、簡単な処理により耐刷性、耐溶剤性、
耐スクラッチ性等を低下することなく、褐色に変色され
た非画線部を脱色し、検版性の優れた水なし平版印刷版
を得ることができる製版方法を提供することにある。The purpose of the present invention is to improve printing durability, solvent resistance, and
An object of the present invention is to provide a plate-making method capable of decolorizing non-image areas that have been discolored to brown without reducing scratch resistance etc., and obtaining a waterless lithographic printing plate having excellent plate inspection properties.
[問題点を解決するための手段]
すなわち、本発明は支持体上にキノンジアジド構造を含
む物質を構成成分とする感光層およびシリコーンゴム層
をこの順に塗設してなる水なし平版印刷版を、画像露光
した俊、現像と同時または現像の前および/または後に
塩基処理を施し、続いて有機酸を含む処理液で処理する
ことを特徴とする水なし平版印刷版の製版方法に関する
ものである。[Means for Solving the Problems] That is, the present invention provides a waterless lithographic printing plate in which a photosensitive layer containing a substance containing a quinone diazide structure and a silicone rubber layer are coated in this order on a support. The present invention relates to a method for making a waterless lithographic printing plate, which is characterized in that imagewise exposure is performed, base treatment is performed at the same time as development, or before and/or after development, and then treatment is performed with a treatment solution containing an organic acid.
本発明で用いられる支持体は特に限定されないが、通常
の水なし平版印刷版で用いられるもの、あるいは提案さ
れているものならば、いずれでもよい。The support used in the present invention is not particularly limited, but any support that is used in ordinary waterless lithographic printing plates or that has been proposed may be used.
例えば、アルミ、鉄、亜鉛のような金属板およびポリエ
ステル、ポリオレフィン、ポリスチレンのような透明ま
たは不透明なプラスチックフィルム、あるいは両者の複
合体などが挙げられる。これらのシート上にハレーショ
ン防止その他の目的でさらに樹脂層などをコーティング
して支持体とすることも可能である。 ゛
本発明にいう感光層とは、公知のキノンジアジド構造を
含む物質から構成されているものであり、キノンジアジ
ド構造を含む物質とは、通常ポジ型PS版、ワイボン版
、フォトレジストなどに用いられているキノンジアジド
類である。Examples include metal plates such as aluminum, iron, and zinc; transparent or opaque plastic films such as polyester, polyolefin, and polystyrene; and composites of both. It is also possible to further coat these sheets with a resin layer or the like for antihalation purposes or other purposes to form a support.゛The photosensitive layer referred to in the present invention is composed of a substance containing a known quinonediazide structure, and the substance containing a quinonediazide structure is a material normally used in positive-working PS plates, Wibon plates, photoresists, etc. These are quinonediazides.
かかるキノンジアジド類としては、例えばベンゾキノン
−1,2−ジアジド−4−または−5−スルホン酸とポ
リヒドロキシフェニルとのエステル、ナフトキノン−1
,2−ジアジド−4−または−5−スルホン酸とピロガ
ロールアセトン樹脂とのエステル、ナフトキノン−1,
2−ジアジド−4−または−5−スルホン酸とフェノー
ルホルムアルデヒドノボラック樹脂またはカシュ変性ノ
ボラック樹脂とのエステルが挙げられる。また低分量の
キノンジアジド化合物(例えば、ナフトキノン−1,2
−ジアジド−5−スルホン酸と、フェノール、タレゾー
ル、キシレノール、カテコール、ピロガロールおよびビ
スフェノールAなどとのエステル化物など)または上記
のキノンジアジド基を含む樹脂に感光性基を含まないノ
ボラック樹脂(例えば、フェノール、クレゾール、キシ
レノール、カテコールおよびピロガロールなどのフェノ
ール類とホルムアルデヒド類とを酸性触媒存在下に縮合
させてjqられる可溶可融性樹脂など)を単に混合して
もよい。さらに特開昭56−80046号公報で提案さ
れているようなキノンジアジド類を多官能化合物で架橋
せしめた光剥離性感光層が挙げられる。Examples of such quinonediazides include esters of benzoquinone-1,2-diazide-4- or -5-sulfonic acid and polyhydroxyphenyl, naphthoquinone-1
, ester of 2-diazide-4- or -5-sulfonic acid and pyrogallolacetone resin, naphthoquinone-1,
Esters of 2-diazide-4- or -5-sulfonic acid and phenol formaldehyde novolac resins or cashew-modified novolak resins may be mentioned. Also, low amounts of quinonediazide compounds (e.g. naphthoquinone-1,2
esters of -diazide-5-sulfonic acid with phenol, talezol, xylenol, catechol, pyrogallol, bisphenol A, etc.) or novolak resins that do not contain photosensitive groups in the resins containing the quinone diazide group (e.g., phenol, A soluble resin (such as a soluble resin produced by condensing phenols such as cresol, xylenol, catechol, and pyrogallol with formaldehyde in the presence of an acidic catalyst) may be simply mixed. Furthermore, there may be mentioned a photoreleasable photosensitive layer in which quinone diazides are crosslinked with a polyfunctional compound as proposed in JP-A-56-80046.
架橋剤としては、多官能性イソシアナート類、例えば、
パラフェニレンジイソシアナート、2゜4−または2.
6−トリレンジイソシアナート、4.4′−ジフェニル
メタンジイソシアナート、ヘキサメチレンジイソシアナ
ート、インホロンジイソシアナートもしくはこれらのア
ダクト体など、あるいは多官能エポキシ化合物、例えば
、ポリエチレングリコールジグリシジルエーテル類、ポ
リプロピレングリコールジグリシジルエーテル類、ビス
フェノールAジグリシジルエーテル、トリメチロールプ
ロパントリグリシジルエーテルなどがある。これらの熱
硬化は感光性物質の感光性を失わせない範囲、通常13
0℃以下で行なうことが好ましく、このため通常触媒等
が併用される。As a crosslinking agent, polyfunctional isocyanates such as
paraphenylene diisocyanate, 2°4- or 2.
6-tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, hexamethylene diisocyanate, inphorone diisocyanate or their adducts, or polyfunctional epoxy compounds such as polyethylene glycol diglycidyl ethers, Examples include polypropylene glycol diglycidyl ethers, bisphenol A diglycidyl ether, and trimethylolpropane triglycidyl ether. These thermal curing ranges within a range that does not cause loss of photosensitivity of the photosensitive material, usually 13
It is preferable to carry out the reaction at a temperature of 0° C. or lower, and therefore a catalyst or the like is usually used in combination.
またキノンジアジド類に単官能化合物を反応ざゼて変性
し、現像液に難溶もしくは不溶にする方法としては、同
様に該キノンジアジド類の活性な基を例えばエステル化
、アミド化、ウレタン化することなどが挙げられる。キ
ノンジアジド類の活性な基と反応させる化合物としては
、低分子であっても比較的高分子であってもよいし、キ
ノンジアジド類にモノマをグラフト重合させてもよい。In addition, methods for modifying quinonediazides by reacting with a monofunctional compound to make them poorly soluble or insoluble in developing solutions include esterifying, amidating, or urethanizing the active groups of the quinonediazides. can be mentioned. The compound to be reacted with the active group of the quinonediazide may be a low-molecular compound or a relatively high-molecular compound, or a monomer may be graft-polymerized to the quinonediazide.
本発明で用いられる感光層として特に好ましいものは、
ナフトキノン−1,2−ジアジド−5−スルホン酸とフ
ェノールホルムアルデヒドノボラック樹脂の部分エステ
ル化物を多官能もしくは単官能イソシアネートで架橋も
しくは変性して得られたものである。Particularly preferable photosensitive layers for use in the present invention are:
It is obtained by crosslinking or modifying a partially esterified product of naphthoquinone-1,2-diazide-5-sulfonic acid and phenol formaldehyde novolak resin with a polyfunctional or monofunctional isocyanate.
感光層の厚さは約0.1〜100μ、好ましくは約0.
5〜10μが適当である。博すぎると塗工時にピンホー
ル等の欠陥が生じ易くなり、一方厚すぎると経済的見地
から不利である。The thickness of the photosensitive layer is about 0.1-100μ, preferably about 0.1μ.
5 to 10μ is appropriate. If it is too thick, defects such as pinholes are likely to occur during coating, while if it is too thick, it is disadvantageous from an economic standpoint.
また感光層中には本発明の効果を損わない範囲で塗膜形
成性の向上や支持体との接着性向上などの目的で他の成
分を加えたりすることは可能である。Further, it is possible to add other components to the photosensitive layer for the purpose of improving coating film forming properties and adhesion to the support within a range that does not impair the effects of the present invention.
本発明に用いられるシリコーンゴム層は、次のような繰
り返し単位を有する分子聞数千〜数十万の線状り機ポリ
シロキサンを主成分とするものが好ましく使用される。The silicone rubber layer used in the present invention is preferably one whose main component is a linear polysiloxane having several thousand to several hundreds of thousands of molecules having the following repeating units.
ここでnは2以上の整数、R,R’ は炭素数1〜10
のアルキル基、アルケニル基あるいはフェニル基であり
、R,R’ の60%以上がメチル基であるものが好ま
しい。Here, n is an integer of 2 or more, and R and R' have 1 to 10 carbon atoms.
is an alkyl group, alkenyl group, or phenyl group, and those in which 60% or more of R and R' are methyl groups are preferred.
この線状有機ポリシロキサンは通常架橋剤が添加される
。架橋剤としては、いわゆる室温(低温)硬化型のシリ
コーンゴムに使われるものとして、アセトキシシラン、
ケトオキシムシラン、アルコキシシラン、アミノシラン
、アミドシランなどがあり、通常線状有機ポリシロキサ
ンとして末端が水酸基であるものと組合せて、各々脱酢
酸型、脱オキシム型、脱アルコール型、脱アミン型、脱
アミド型のシリコーンゴムとなる。これらのシリコーン
ゴムには、更に触媒として少量の有機スズ化合物等を添
加してもよい。A crosslinking agent is usually added to this linear organic polysiloxane. Examples of crosslinking agents used in so-called room temperature (low temperature) curing silicone rubber include acetoxysilane,
There are ketooxime silanes, alkoxysilanes, aminosilanes, amidosilanes, etc., which are usually used in combination with linear organic polysiloxanes with hydroxyl groups at the ends, to produce acetic acid-removed type, oxime-eliminated type, alcohol-eliminated type, deamined type, and deamidated type, respectively. It becomes the silicone rubber of the mold. A small amount of an organic tin compound or the like may be added as a catalyst to these silicone rubbers.
シリコーンゴム層の厚さは、約0.5〜100μ、好ま
しく約0.5〜10μが適当であり、薄すぎる場合は耐
刷力の点で問題を生じることがあり、一方厚すぎる場合
は経済的に不利であるばかりでなく現像時シリコーンゴ
ム層を除去するのが困難となり、画像再現性の低下をも
たらす。The appropriate thickness of the silicone rubber layer is about 0.5 to 100μ, preferably about 0.5 to 10μ; if it is too thin, problems may occur in terms of printing durability, while if it is too thick, it is not economical. Not only is this disadvantageous, but it also becomes difficult to remove the silicone rubber layer during development, resulting in a decrease in image reproducibility.
本発明に用いられる印刷版において、支持体と感光層、
感光層とシリコーンゴム1との接着は、画像再現性、耐
刷力などの基本的な版性能にとり非常に重要であるので
、必要に応じて各層間に接着剤層を設けたり、各層に接
着改良性成分を添加したりすることが可能である。特に
感光層とシリコーンゴム層間の接着力のために、眉間に
公知のシリコーンプライマやシランカップリング剤層を
設けたり、シリコーンゴム層あるいは感光層にシリコー
ンプライマやシランカップリング剤を添加すると効果的
である。In the printing plate used in the present invention, a support, a photosensitive layer,
The adhesion between the photosensitive layer and the silicone rubber 1 is very important for basic plate performance such as image reproducibility and printing durability, so if necessary, an adhesive layer may be provided between each layer, or an adhesive layer may be provided between each layer. It is also possible to add improving components. In particular, it is effective to provide a known silicone primer or silane coupling agent layer between the eyebrows or add a silicone primer or silane coupling agent to the silicone rubber layer or photosensitive layer to improve the adhesive strength between the photosensitive layer and the silicone rubber layer. be.
以上説明したようにして構成された水なし平版印刷原版
の表面に薄い保護フィルムをラミネートすることもでき
る。A thin protective film can also be laminated on the surface of the waterless lithographic printing original plate constructed as described above.
本発明で用いられる水なし平版印刷版原版は、例えば次
のようにして製造される。まず支持体上に、リバースロ
ールコータ、エアナイフコータ、メーヤバーコータなど
の通常のコータ、あるいはホエラのような回転塗布装置
を用い、感光層を構成すべき組成物溶液を塗膜「、乾燥
および必要に応じて熱キユア後、必要ならば該感光層の
上に同様な方法で接着層を塗布、乾燥してからシリコー
ンガム溶液を感光層または接着層上に同様の方法で塗布
し、通常50〜130℃の温度で数分間熱処理して、十
分に硬化せしめてシリコーンゴム層を形成する。必要な
らば、保護フィルムを該シリコーンゴム層上にラミネー
ター等を用いカバーする。The waterless lithographic printing plate precursor used in the present invention is produced, for example, as follows. First, a composition solution to form a photosensitive layer is applied onto a support using a normal coater such as a reverse roll coater, air knife coater, Meyer bar coater, or a spin coating device such as a whaler, and then dried and coated as necessary. After heat curing, if necessary, apply an adhesive layer on the photosensitive layer in the same manner, and after drying, apply a silicone gum solution on the photosensitive layer or the adhesive layer in the same manner, usually 50~ Heat treatment is performed at a temperature of 130° C. for several minutes to fully cure and form a silicone rubber layer. If necessary, cover the silicone rubber layer with a protective film using a laminator or the like.
このようにして得られた水なし平版印刷原版にポジフィ
ルムまたはポジ原画、あるいはネガフィルムまたはネガ
原画を用いて画像露光を与えて現像を行うと水なし平版
印刷版が得られる。When the waterless lithographic printing original plate thus obtained is subjected to image exposure using a positive film, a positive original image, or a negative film or a negative original image, and then developed, a waterless lithographic printing plate is obtained.
かかる水なし平版印刷原版の製版方法としては次のよう
なものが挙げられる。例えば、ポジ型の水なし平版印刷
原版として用いる場合、真空密着されたポジフィルムま
たはポジ原画を通して、活性光線で感光層中のキノンジ
アジド構造を含む物質のキノンジアジド単位の5〜60
モル%が光分解するように画像露光を与えて、塩基処理
と現像を行なうと、水なし平版印刷版が得られる。Examples of the plate-making method for such a waterless lithographic printing original plate include the following. For example, when used as a positive waterless lithographic printing original plate, 5 to 60 of the quinonediazide units of the substance containing the quinonediazide structure in the photosensitive layer are exposed to actinic light through a vacuum-adhered positive film or positive original.
By applying imagewise exposure such that a mole percent is photodegraded, and performing base treatment and development, a waterless lithographic printing plate is obtained.
一方、ネガ型の水なし平版印刷原版として用いる場合、
真空密着されたネガフィルムまたはネガ原画を通して、
活性光線で通常の画像露光(感光層中のキノンジアジド
構造を含む物質のキノンジアジド単位の60モル%を越
える量が光分解する露光口)を与えてから、塩基処理後
に現像、塩基処理と同時に現像、または現像後に塩基処
理を行なうと水なし平版印刷版が得られる。より好まし
くは、通常の画像露光の前か俊、または現像後に非画線
部の感光層中のキノンジアジド構造を含む物質のキノン
ジアジド単位の5〜60モル%が光分解するように画像
部を含めて全面露光を与えてから、塩基処理後に現像、
塩基処理と同時に現像、または現像後に塩基処理を行な
うとよい。On the other hand, when used as a negative waterless lithographic printing plate,
Through vacuum sealed negative film or negative original image,
After applying normal image exposure to actinic light (an exposure port in which more than 60 mol% of the quinonediazide units of the substance containing the quinonediazide structure in the photosensitive layer is photodecomposed), development after base treatment, development at the same time as base treatment, Alternatively, a waterless lithographic printing plate can be obtained by performing a base treatment after development. More preferably, the photosensitive layer in the non-image area, including the image area, is photodecomposed in such a way that 5 to 60 mol% of the quinonediazide units of the substance containing the quinonediazide structure in the photosensitive layer in the non-image area are photodecomposed before or after normal image exposure. After full exposure, development after base treatment,
It is preferable to perform the base treatment at the same time as the base treatment or after the development.
この露光工程で用いられる光源は、紫外線を豊富に発生
するものであり、水銀灯、カーボンアーク灯、キセノン
ランプ、メタルハライドランプ、螢光灯などを使うこと
ができる。ざらに紫外線以外にもレーザー光等が用いら
れる。The light source used in this exposure process is one that generates abundant ultraviolet light, and can be a mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, or the like. In addition to ultraviolet light, laser light is also used.
本発明において使用される塩基処理方法としては、次の
ような方法が挙げられる。Examples of the base treatment method used in the present invention include the following methods.
A、ネガ型
(1)全面露光→画像露光→塩基処理→現像(2)画像
露光→全面露光→塩基処理→現像(3)全面露光→画像
露光→現像と同時に塩基処理(4)画像露光→全面露光
→現像と同時に塩基処理(5)全面露光→画像露光→現
像→塩基処理(6〉画像露光→全面露光→現像→塩基処
理(7)画像露光→現像→全面露光→塩基処理(8)画
像露光→現像耐塩基処理
り9〉画像露光→塩基処理→現像
(財)画像露光→現像と同時に塩基処理B、ポジ型
(1)画像露光→塩基処理→現像
処理方法としては、本発明の塩基処理液に浸漬するか、
あるいはハケやパッドを用いて処理液で均一に版面をぬ
らすか、また自動現像機のようにシャワ一方法で版面を
ぬらせばよい。A, Negative type (1) Full surface exposure → Image exposure → Base treatment → Development (2) Image exposure → Full surface exposure → Base treatment → Development (3) Full surface exposure → Image exposure → Base treatment at the same time as development (4) Image exposure → Whole surface exposure → development and base treatment (5) whole surface exposure → image exposure → development → base treatment (6> image exposure → whole surface exposure → development → base treatment (7) image exposure → development → whole surface exposure → base treatment (8) Image exposure → development Base treatment 9> image exposure → base treatment → development Immerse it in a base treatment solution, or
Alternatively, the plate surface can be uniformly wetted with the processing liquid using a brush or pad, or it can be wetted using a shower method such as an automatic developing machine.
処理時間は特に限定されず、使用する塩基の強さと#!
度によって適宜選択できるが、通常処理液にふれると即
時に効果があられれ、かつ長時間接触させても何ら効果
に変化はない。通常的10秒〜5分程度でよい。The treatment time is not particularly limited and depends on the strength of the base used and #!
Although it can be selected as appropriate depending on the degree of treatment, the effect usually appears immediately upon contact with the treatment liquid, and there is no change in the effect even if the treatment liquid is kept in contact for a long time. Usually it takes about 10 seconds to 5 minutes.
本発明の塩基処理に用いられる塩基としては、アミン化
合物(脂肪族鎖式アミン、脂肪族環式アミン、芳香族ア
ミン、ヘテロ環式アミンの一級、二級、三級アミンおよ
びモノアミン、ジアミン、トリアミン、テトラアミン、
ポリアミンなど)などを挙げることができる。例えばア
ンモニア、メチルアミン、エチルアミン、ジメチルアミ
ン、ジエチルアミン、トリエチルアミン、トリメチルア
ミン、プロピルアミン、ブチルアミン、アミルアミン、
ジプロピルアミン、ジブチルアミン、シアミルアミン、
トリプロピルアミン、トリエチルアミン、メチルベンジ
ルアミン、エチレンジアミン、トリメチレンジアミン、
テトラメヂレンジアミン、ポリエヂレンイミン、ベンジ
ルアミン、N、N−ジメチルベンジルアミン、N、N−
ジエヂルベンジルアミン、N、N−ジプロピルベンジル
アミン、0−またはm−またはp−メトキシまたはメチ
ルベンジルアミン、N、N−ジ(メトキシベンジル)ア
ミン1、β−フェニルエチルアミン、ε、δ−フェニル
アミルアミン、γ−フェニルプロピルアミン、シクロヘ
キシルアミン、アニリン、モノメチルアニリン、ジメチ
ルアミン、トルイジン、 ゛ベンジジン、αまたはβ
−ナフチルアミン、0またはm−またはp−フエニレジ
アミン、ピロリジン、ピペリジン、ピペラジン、モルホ
リン、ウロトロビン、ジアザビシクロウンデカン、ピロ
ール、ピリジン、キノリン、ヒドラジン、フェニルヒド
ラジン、N、N=−ジフェニルヒドラジン、ヒドロキシ
ルアミン、尿素、セミカルバジド、ヂオ尿素、水酸化テ
トラアルキルアンモニウム、モノエタノールアミン、N
−メチルエタノールアミン、N−エチルエタノールアミ
ン、N−n−ブチルエタノールアミン、ジェタノールア
ミン、トリエタノルアミン、2− (2−アミンエチル
)エタノール、2−アミノ−2−メチル−1,3−プロ
パンジオール、2−アミノ−1,3−プロパジオール、
2−アミノ−2−ヒドロキシメチル−1,3−プロパン
ジオール、3−ヒドロキシプロピルメチルアミン、4−
ヒドロキシブチルメチルアミン、3−メトキシプロピル
アミン、3−エトキシプロピルアミン、3−プロポキシ
プロピルアミン、3−イソプロポキシプロビルアミン、
3−ブトキシプロピルアミン、3−イソブトキシプロビ
ルアミン、2−エチルへキシロキシプロピルアミン、2
−エトキシエチルアミン、2−プロポキシエチルアミン
、2−ブトキシエチルアミン、2−(アミノエトキシ)
エタノールなどが用いられる。The bases used in the base treatment of the present invention include amine compounds (aliphatic chain amines, aliphatic cyclic amines, aromatic amines, heterocyclic amines, primary, secondary, tertiary amines, monoamines, diamines, triamines). , tetraamine,
polyamines, etc.). For example, ammonia, methylamine, ethylamine, dimethylamine, diethylamine, triethylamine, trimethylamine, propylamine, butylamine, amylamine,
dipropylamine, dibutylamine, cyamylamine,
tripropylamine, triethylamine, methylbenzylamine, ethylenediamine, trimethylenediamine,
Tetramethylenediamine, polyethyleneimine, benzylamine, N,N-dimethylbenzylamine, N,N-
Diethylbenzylamine, N,N-dipropylbenzylamine, 0- or m- or p-methoxy or methylbenzylamine, N,N-di(methoxybenzyl)amine 1, β-phenylethylamine, ε, δ-phenyl Amylamine, γ-phenylpropylamine, cyclohexylamine, aniline, monomethylaniline, dimethylamine, toluidine, benzidine, α or β
- Naphthylamine, 0 or m- or p-phenylenediamine, pyrrolidine, piperidine, piperazine, morpholine, urothrobin, diazabicycloundecane, pyrrole, pyridine, quinoline, hydrazine, phenylhydrazine, N,N=-diphenylhydrazine, hydroxylamine, urea , semicarbazide, diourea, tetraalkylammonium hydroxide, monoethanolamine, N
-Methylethanolamine, N-ethylethanolamine, N-n-butylethanolamine, jetanolamine, triethanolamine, 2-(2-amineethyl)ethanol, 2-amino-2-methyl-1,3-propanediol , 2-amino-1,3-propadiol,
2-Amino-2-hydroxymethyl-1,3-propanediol, 3-hydroxypropylmethylamine, 4-
Hydroxybutylmethylamine, 3-methoxypropylamine, 3-ethoxypropylamine, 3-propoxypropylamine, 3-isopropoxypropylamine,
3-butoxypropylamine, 3-isobutoxypropylamine, 2-ethylhexyloxypropylamine, 2
-ethoxyethylamine, 2-propoxyethylamine, 2-butoxyethylamine, 2-(aminoethoxy)
Ethanol etc. are used.
これらの塩基は単独あるいは混合して、液状あるいは気
相状で用いられる。液状の場合は例えば塩基そのもの、
あるいは溶液の形で用いられる。These bases may be used alone or in a mixture, in liquid or gas phase. In liquid form, for example, the base itself,
Alternatively, it is used in the form of a solution.
溶液として用いる場合、溶媒は水または有機溶剤または
両者の混合溶液のいずれでもよい。When used as a solution, the solvent may be water, an organic solvent, or a mixed solution of both.
現像液としては、水なし平版印刷版において通常提案さ
れているものが使用できる。例えば、水、水に下記の極
性溶剤を添加したものが好適である。As the developer, those commonly proposed for waterless lithographic printing plates can be used. For example, water and water with the following polar solvent added are suitable.
アルコール類(メタノール、エタノールなど)エーテル
類(エチルセロソルブ、エチルカルピトール、ブチルカ
ルピトール
エステル類(セロソルブアセテート、カルピトールアセ
テートなど)
また塩基処理液でそのまま現像することも可能である。Alcohols (methanol, ethanol, etc.), ethers (ethyl cellosolve, ethyl carpitol, butyl carpitol esters (cellosolve acetate, carpitol acetate, etc.)) It is also possible to directly develop with a base processing solution.
塩基処理した後、有機酸を含む処理液で処理する。その
方法としては例えば次の方法が挙げられる。After the base treatment, treatment is performed with a treatment solution containing an organic acid. Examples of this method include the following method.
(1)塩基処理→現像→有機酸で処理
(2)現像と同時に塩基処理→有機酸で処理(3)現像
→塩基処理→有F!a酸で処理(4)塩基処理→有機酸
で処理→現像
この塩基処理後に使用される有機酸としては特に限定さ
れるものではないが、例えばカルボン酸、スルホン酸、
ホスホン酸などのいずれでもよいが、好ましい有機酸は
炭素数2〜18で、かつ沸点が140℃以上のカルボン
酸である。より好ましくは炭素数2〜18で、かつ沸点
160℃以上のカルボン酸である。炭素数が2より小さ
く、沸点が140℃より低い場合は、処理後の脱色性は
十分であるが、版を放置しておくと発色してくるため好
ましくない。一方、炭素数が18を越えると、シリコー
ンゴム層を通して感光層への作用が小さく脱色性に欠け
るので好ましくない。(1) Base treatment → development → treatment with organic acid (2) At the same time as development, base treatment → treatment with organic acid (3) Development → base treatment → Yes F! Treatment with a acid (4) Base treatment → Treatment with organic acid → Development The organic acid used after this base treatment is not particularly limited, but for example, carboxylic acid, sulfonic acid,
Any organic acid such as phosphonic acid may be used, but a preferred organic acid is a carboxylic acid having 2 to 18 carbon atoms and a boiling point of 140°C or higher. More preferably, it is a carboxylic acid having 2 to 18 carbon atoms and a boiling point of 160°C or higher. If the number of carbon atoms is less than 2 and the boiling point is lower than 140° C., the decolorizing property after treatment is sufficient, but if the plate is left to stand, color will develop, which is not preferable. On the other hand, if the number of carbon atoms exceeds 18, the effect on the photosensitive layer through the silicone rubber layer will be small and the decolorizing property will be lacking, which is not preferable.
上記の炭素数2〜18で、かつ沸点が140℃以上のカ
ルボン酸としては、プロピオン酸、醋酸等が挙げられ、
また炭素数2〜18で、かつ沸点が160℃以上のカル
ボン酸としては、イソ酪酸、n−吉草酸、イソ吉草酸、
n−カプロン酸、イソカプロン酸、2−メチルペンタン
酸、2−エチル酪酸、エナント酸、カプリル酸、2−エ
チルヘキサン酸、ペラルゴン酸、ウンデシル酸、ウンデ
シル酸、ラウリン酸、ミリスチン酸、パルミチン酸、オ
レイン酸、ステアリン酸、クロル酢酸、ジクロル酢酸、
トリクロル酢酸、ヨード酢酸、フルオル酢酸、トリフル
オル酢酸、α−クロルプロピオン酸、β−クロルプロピ
オン酸、α−ブロムプロピオン酸、α−ブロム酪酸、α
−ブロムイソ酪酸、α−ブロム吉草酸、α−ブロムイソ
吉草酸、α−ブロム−n−カプロイン酸、β−エトキシ
プロピオン酸、マレイン酸モノエチルエステル、マレイ
ン酸モノ−n−ブチルエステル等が挙げられる。Examples of the above-mentioned carboxylic acids having 2 to 18 carbon atoms and a boiling point of 140°C or higher include propionic acid, acetic acid, etc.
Carboxylic acids having 2 to 18 carbon atoms and a boiling point of 160°C or higher include isobutyric acid, n-valeric acid, isovaleric acid,
n-caproic acid, isocaproic acid, 2-methylpentanoic acid, 2-ethylbutyric acid, enanthic acid, caprylic acid, 2-ethylhexanoic acid, pelargonic acid, undecylic acid, undecylic acid, lauric acid, myristic acid, palmitic acid, oleic acid acid, stearic acid, chloroacetic acid, dichloroacetic acid,
Trichloroacetic acid, iodoacetic acid, fluoroacetic acid, trifluoroacetic acid, α-chloropropionic acid, β-chloropropionic acid, α-bromopropionic acid, α-bromobutyric acid, α
-bromoisobutyric acid, α-bromovaleric acid, α-bromoisovaleric acid, α-bromo-n-caproic acid, β-ethoxypropionic acid, maleic acid monoethyl ester, maleic acid mono-n-butyl ester, and the like.
本発明の処理液において使用される溶媒としては、水、
極性溶剤、炭化水素をそれぞれ単独あるいは混合して使
用することができる。The solvent used in the treatment liquid of the present invention includes water,
A polar solvent and a hydrocarbon can be used alone or in combination.
アルコール類(メタノール、エタノール、n−プロパツ
ール、イソプロパツール、3−メトキシブタノール、3
−メチル−3−メトキシブタノール、ジアセトンアルコ
ールなど)。Alcohols (methanol, ethanol, n-propanol, isopropanol, 3-methoxybutanol, 3
-methyl-3-methoxybutanol, diacetone alcohol, etc.).
エーテル類(ジオキサン、テトラヒドロフラン、メチル
セロソルブ、エチルセロソルブ、プチルセロソルブ、エ
チレングリコールジエチルエーテル、ジエチレングリコ
ール七ツメチルエーテル、ジエチレングリコール七ノエ
チルエーテル、ジエチレングリコールジエチルエーテル
、ジエチレングリコールモノブチルエーテル、トリエチ
レングリコールモノメチルエーテル、
トリエチレングリコールジメチルエーテル、トリエチレ
ングリコールジエチルエーテル、テトラエチレングリコ
ール七ツメチルエーテル、テトラエチレングリコールジ
メチルエーテル、プロピレングリコールモノメチルエー
テル、プロピレングリコールモノエチルエーテル、ジプ
ロピレングリコールモノメチルエーテル、トリプロピレ
ングリコールモノメチルエーテル、テトラヒドロフルフ
リルアルコールなど)。Ethers (dioxane, tetrahydrofuran, methyl cellosolve, ethyl cellosolve, butyl cellosolve, ethylene glycol diethyl ether, diethylene glycol 7-methyl ether, diethylene glycol 7-methyl ether, diethylene glycol diethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether) , triethylene glycol diethyl ether, tetraethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, tetrahydrofurfuryl alcohol, etc.).
ニスデル類(アセト酢酸メチル、アセト酢酸エチル、メ
チルセロソルブアセテート、エチルセロソルブアセテー
ト、酢酸ジエチレングリコールモノメチルエーテル、酢
酸ジエチレングリコールモノエチルエーテル、酢酸ジエ
チレングリコールモノブチルエーテル、ジ酢酸グリコー
ル、乳駿エチル、プロピオン酸メチル、プロピオン酸エ
チル、マロン酸ジメチル、コハン酸ジメチル、コハン酸
ジエチル、アジピン酸ジメチルなど)。Nisdels (methyl acetoacetate, ethyl acetoacetate, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl acetate, diethylene glycol monobutyl ether acetate, glycol diacetate, ethyl lactate, methyl propionate, ethyl propionate) , dimethyl malonate, dimethyl succinate, diethyl succinate, dimethyl adipate, etc.).
炭化水素としては下記に示すものが一般的に有用である
。As hydrocarbons, those shown below are generally useful.
脂肪族炭化水素類(ペンタン、ヘキサン、ヘプタン、オ
クタン、ガソリン、灯油、軽油、重油、“アイソパー”
E、H,M(エクソン化学製)など
芳香族炭化水素類(トルエン、キシレンなど)。Aliphatic hydrocarbons (pentane, hexane, heptane, octane, gasoline, kerosene, light oil, heavy oil, “isopar”)
Aromatic hydrocarbons (toluene, xylene, etc.) such as E, H, M (manufactured by Exxon Chemical).
ハロゲン化炭化水素類(トリクレン、四塩化炭素など)
。Halogenated hydrocarbons (triclene, carbon tetrachloride, etc.)
.
処理液中に配合される有機酸の量は、処理溶剤に対して
0.01〜50重邑%添加するのが版材の脱色効果の点
で好ましく、より好ましくは0゜1〜20重量%添加す
るのがよい。The amount of organic acid added to the processing solution is preferably 0.01 to 50% by weight based on the processing solvent, from the viewpoint of decolorizing the plate material, and more preferably 0.1 to 20% by weight. It is good to add it.
処理液中に、ぬれ性向上および有機酸の溶解性向上のた
め界面活性剤を添加することもできる。A surfactant can also be added to the treatment liquid to improve wettability and solubility of organic acids.
また検版性向上のため、例えばクリスタルバイオレ、ア
イゼンベーシックシアニン6GH(保土谷化学(株)製
)などの染料を添加することもできる。In addition, dyes such as Crystal Violet and Eisen Basic Cyanine 6GH (manufactured by Hodogaya Chemical Co., Ltd.) may be added to improve plate inspection properties.
処理方法としては、本発明の処理液に浸漬するか、ある
いは自動現像機の場合のようにシャワ一方法で版面をぬ
らせばよい。As a processing method, the plate surface may be wetted by immersion in the processing solution of the present invention or by showering as in the case of an automatic processor.
以下に実施例によって本発明をざらに詳しく説明する。The present invention will be explained in more detail below by way of examples.
処理時間は特に限定されず、有りl酸の強さと濃度、お
よび処理液の温度によって適宜選択できるが、通常処理
液にふれると即座に脱色され、かつ長時間接触さ、せて
も何ら効果に変化はない。通常5秒〜3分程度でよい。The treatment time is not particularly limited and can be selected depending on the strength and concentration of the acid and the temperature of the treatment solution, but normally the treatment solution will decolorize immediately upon contact with it, and there will be no effect if left in contact for a long time. There is no change. Usually it takes about 5 seconds to 3 minutes.
以下実施例によって本発明をさらに詳しく説明する。The present invention will be explained in more detail with reference to Examples below.
[実施例]
実施例1、比較例1
厚ざQ、3mmのアルミ板(住友軽金属(株)製)に下
記のプライマ組成物を塗布し、200℃、2分間熱処理
して5μのプライマ層を設けた。[Example] Example 1, Comparative Example 1 The following primer composition was applied to an aluminum plate (manufactured by Sumitomo Light Metal Co., Ltd.) with a thickness Q of 3 mm, and heat treated at 200°C for 2 minutes to form a 5μ thick primer layer. Established.
■ポリウレタン樹脂(サンブレンLQ−T1331、三
洋化成工業(株)製) 100重量部■ブロックイソシ
アネート(タケネートB830、成田薬品(株)製)
20重量部■エポキシ・フェノール・尿素樹脂
(SJ9372、関西ペイント(株)製) 8重量
部■ジメチルホルムアミド 725重量部続いてこ
の上に下記の感光層組成物をバーコータを用いて塗布し
、110℃の熱風中で1分間乾燥して厚さ2μの感光層
を設けた。■Polyurethane resin (Sunbren LQ-T1331, manufactured by Sanyo Chemical Industries, Ltd.) 100 parts by weight ■Blocked isocyanate (Takenate B830, manufactured by Narita Pharmaceutical Co., Ltd.)
20 parts by weight ■ Epoxy phenol urea resin (SJ9372, manufactured by Kansai Paint Co., Ltd.) 8 parts by weight ■ Dimethylformamide 725 parts by weight Subsequently, the following photosensitive layer composition was applied thereon using a bar coater, and heated at 110°C. The photosensitive layer was dried in hot air for 1 minute to form a 2 μm thick photosensitive layer.
■ナフトキノンー1,2−ジアジド−5−スルホン酸と
フェノールホルムアルデヒドノボラック樹脂(住友デュ
レズ製ニスミライトレジンPR50622)の部分エス
テル(元素分析法によるエステル化度25%)
100重量部■4,4°−ジフェニルメタンジ
イソシアネート40重量部
■ジブチル錫ジアセテート 0.2重」部■4,4°
−ジエチルアミノベンゾフェノン5重量部
■P−トルエンスルホンM O,8重量部■テト
ラヒドロフラン 800重量部ついでこの感光層
の上に次の組成を有するシリコーンゴム組成物を回転塗
布後、115℃、露点30’C13,5分間湿熱硬化さ
せて2.3μのシリコーンゴム層を設けた。■Partial ester of naphthoquinone-1,2-diazide-5-sulfonic acid and phenol formaldehyde novolac resin (Nisumilite Resin PR50622 manufactured by Sumitomo Durez) (degree of esterification 25% by elemental analysis)
100 parts by weight ■ 4,4°-diphenylmethane diisocyanate 40 parts by weight ■ 0.2 parts by weight of dibutyltin diacetate ■ 4,4°
- Diethylaminobenzophenone 5 parts by weight ■ P-Toluenesulfone M O, 8 parts by weight ■ Tetrahydrofuran 800 parts by weight Next, a silicone rubber composition having the following composition was spin-coated on the photosensitive layer, and the temperature was 115°C, dew point 30'C13. A silicone rubber layer of 2.3 μm was formed by curing with moist heat for 5 minutes.
■ポリジメチルシロキサン(分子量約25,0OO1末
端OH基) 100重量部■ビニルトリ(
メチルエチルケトオキシム)シラン
8重量部■ジブデル錫ジアセテート 0
.1重量部■γ−アミノプロピルトリメトキシシラン0
.5重量部
■“アイソパー″E(エクソン化学(株)製)1400
重向部
上記のようにして得られた積層板に、厚さ10μのポリ
プロピレンフィルム“トレファン” (東しく株)製)
をカレンダーローラーを用いてラミネートし、水なし平
版印刷原版を得た。■Polydimethylsiloxane (molecular weight approx. 25,0OO1 terminal OH group) 100 parts by weight ■Vinyl tri(
methyl ethyl ketoxime) silane
8 parts by weight ■Jibdeltin diacetate 0
.. 1 part by weight ■γ-aminopropyltrimethoxysilane 0
.. 5 parts by weight ■ “Isopar” E (manufactured by Exxon Chemical Co., Ltd.) 1400
The overlapping part is attached to the laminate obtained as above, with a polypropylene film "Torefane" (manufactured by Toshiku Co., Ltd.) having a thickness of 10 μm.
were laminated using a calendar roller to obtain a waterless lithographic printing original plate.
かかる印刷原版にメタルハライドランプ(宮崎電気(株
)製アイドルフィン2000>を用い、Uvメーター(
オーク製作新製、ライトメジャータイプUV−402A
>で11 mw/ cr&の照度で6秒間全面露光を施
した。A metal halide lamp (Idol Fin 2000 manufactured by Miyazaki Electric Co., Ltd.) was used on the original printing plate, and a UV meter (
Newly made from oak, light major type UV-402A
The entire surface was exposed for 6 seconds at an illuminance of 11 mw/cr&.
上記のようにして得られた印刷原版に150線/インチ
の網点画像を持つネガフィルムを真空密着し、上記のメ
タルハライドランプを用い、1mの距離から60秒間画
像露光した。A negative film having a halftone image of 150 lines/inch was vacuum-adhered to the printing original plate obtained as described above, and imagewise exposed for 60 seconds from a distance of 1 m using the metal halide lamp described above.
次に上記の露光済版の゛トレファン”を剥離する。Next, the "Trefan" from the exposed plate was peeled off.
次いで、東し水なし平版自動現像機(TWL−1160
D (東しく株)製)の前処理液にジエチレングリコー
ル/2− (2−アミンエトキシ)エタノール−87/
13(重量比)からなる処理液を入れ、現像槽には水を
入れた。さらに後処理槽には水/ジエチレングリコール
モノブチルエーテル/2−エチルヘキサンI!(沸点2
24℃)/クリスタルバイオレット=80/20/11
0.3(重量比)からなる処理液を入れ、前処理液45
℃、現像水温25℃、侵処理液温25℃、搬送スピード
40cm/分に設定し、製版を行なったところ、塩基処
理で褐色に変色した水なし平版印刷版が、後処理槽を通
過すると、通販前の黄色に脱色された。Next, a waterless lithographic automatic developing machine (TWL-1160) was used.
Diethylene glycol/2-(2-amine ethoxy)ethanol-87/
A processing solution consisting of 13 (weight ratio) was placed in the developing tank, and water was placed in the developing tank. Furthermore, in the after-treatment tank, water/diethylene glycol monobutyl ether/2-ethylhexane I! (boiling point 2
24℃)/Crystal Violet=80/20/11
Add a treatment liquid consisting of 0.3 (weight ratio) and add 45% of the pretreatment liquid.
℃, development water temperature 25℃, erosion treatment liquid temperature 25℃, and conveyance speed 40cm/min. It was bleached to yellow before being sold online.
この印刷版をオフセット印刷機に取り付け、東洋インキ
(株)製“東洋キングウルトラTKUアクワレスGアイ
P L ”を用いて印刷を行ない、網点再現性を評価し
たところ、網点2〜98%が再現された極めて良好な画
像を持つ印刷物が得られた。This printing plate was attached to an offset printing machine, and printing was performed using Toyo King Ultra TKU Aquares G Eye PL manufactured by Toyo Ink Co., Ltd. When the halftone dot reproducibility was evaluated, halftone dots ranged from 2 to 98%. Prints with very good reproduced images were obtained.
一方、上記のようにして製造された水なし平版印刷版原
版を、上記と同じように全面露光、画像露光を施し、後
処理液の入っていない東し水なし平版自動現像機で製版
したところ、塩基処理で褐色に変色した水なし平版印刷
版が得られ、しかも部分的に脱色され、検版性の悪い刷
版であった。On the other hand, the waterless lithographic printing plate precursor produced as described above was subjected to full-surface exposure and image exposure in the same manner as above, and plate-making was performed using an automatic waterless lithographic developing machine containing no post-processing liquid. A waterless lithographic printing plate was obtained which turned brown when treated with a base, and was partially decolored, resulting in a printing plate with poor plate inspection properties.
実施例2
化成処理アルミ板(住友軽金属(株)製)にエステル化
度44%のフェノールホルムアルデヒドノボラック樹脂
(住友ベークライト(株)製ニスミライトレジンPR5
0235)のナフトキノン−1,2−ジアジド−5−ス
ルホン酸エステル(エタノール可溶性成分9.7重量%
、エステル化度はIRスペクトルから定量)の3重量%
ジオキサン溶液を塗布後、60℃で3分間乾燥させて厚
さ1.2μの感光層を1qだ。この感光層の上に次の組
成を有するシリコーンガム組成物の7%アイソパーE溶
液に、シリコーン組成物に対し4重量%のγ−アミノプ
ロピルトリエトキシシラン(UCC製:A1100)を
添加し、均一に攪拌後ホエラーで塗布した。乾燥後12
0℃、露点25℃、4分間加熱硬化させて厚さ2,2μ
のシリコーンゴム層を得た。Example 2 Phenol formaldehyde novolac resin (Nisumilite resin PR5 manufactured by Sumitomo Bakelite Co., Ltd.) with a degree of esterification of 44% was applied to a chemically treated aluminum plate (manufactured by Sumitomo Light Metal Co., Ltd.).
0235) naphthoquinone-1,2-diazide-5-sulfonic acid ester (ethanol soluble component 9.7% by weight)
, the degree of esterification is 3% by weight (quantified from IR spectrum)
After applying the dioxane solution, it was dried at 60° C. for 3 minutes to form a 1q photosensitive layer with a thickness of 1.2 μm. 4% by weight of γ-aminopropyltriethoxysilane (manufactured by UCC: A1100) based on the silicone composition was added to a 7% Isopar E solution of a silicone gum composition having the following composition on top of this photosensitive layer. After stirring, it was applied with a Whaler. After drying 12
Heat cured at 0℃, dew point 25℃ for 4 minutes to a thickness of 2.2μ
A silicone rubber layer was obtained.
■ポリジメチルシロキサン
(分子量約so、ooo、両末端OH基)100重四部
■エチルトリアセトキシシラン 5重量部■ジブチル
錫ジアセテート 0.2重量部上記のようにして得ら
れた水なし平版印刷原版に150線/インチの網点画像
を持つネガフィルムを真空密着し、実施例1で用いたメ
タルハライドランプで、1mの距離から60秒間画像露
光した。露光された版の版面をエタノール/“アイソパ
ーE”=80/20(重量比)からなる現像液で軽くこ
すると、画像露光した部分はシリコーンゴム層と感光層
の両方が容易に除去されて化成処理アルミ表面が露出し
、ネガフィルムを忠実に再現した画像が得られた。■Polydimethylsiloxane (molecular weight approximately so, ooo, both terminal OH groups) 100 parts by weight ■Ethyltriacetoxysilane 5 parts by weight ■Dibutyltin diacetate 0.2 parts by weight Waterless lithographic printing original plate obtained as above A negative film having a halftone dot image of 150 lines/inch was vacuum-adhered to the film, and image exposure was carried out for 60 seconds from a distance of 1 m using the metal halide lamp used in Example 1. When the surface of the exposed plate is lightly rubbed with a developer consisting of ethanol/Isopar E = 80/20 (weight ratio), both the silicone rubber layer and the photosensitive layer are easily removed from the image-exposed area, resulting in chemical conversion. The treated aluminum surface was exposed, resulting in an image that faithfully reproduced the negative film.
上記の製版された版をメタルハライドランプを用い、1
mの距離で実施例1のUVメーターで11mw/ayt
の照度下、10秒秒間間露光(感光層中のキノンジアジ
ドの25モル%が光分解してカルボン酸成分を生成する
光量)シた後、エタノール/モノエタノールアミン−9
515(重量比)からなる処理液で1分間塩基処理する
と、感光層が褐色に変色した。次いで、水/ジエチレン
グリコールモノブチルエーテル/カプリル酸(沸点24
0℃)=85/15/1 (重量比)からなる処理液で
30秒浸漬処理すると製版する前の黄色に脱色された。Using a metal halide lamp, 1
11 mw/ayt with the UV meter of Example 1 at a distance of m
After exposure for 10 seconds under the illuminance of
When the photosensitive layer was treated with a base for 1 minute using a treatment solution consisting of 515 (weight ratio), the photosensitive layer turned brown. Then water/diethylene glycol monobutyl ether/caprylic acid (boiling point 24
When it was immersed for 30 seconds in a treatment solution consisting of (0°C) = 85/15/1 (weight ratio), it was decolored to the yellow color before plate making.
塩基処理により定着された版が、塩基処理俊の有機酸を
含む処理液によって耐溶剤性の変化があるかどうかを確
認するため、ざらに上記のメタルハライドランプで1m
の距離から60秒間全面露光した後、エタノール/“ア
イソパーE”=80/20(重量比)からなる現像液を
含ませた現像パッドで擦った。非画線部のシリコーンゴ
ム層は全く損傷を受けず、定着効果の低下は全くなかっ
た。In order to check whether the solvent resistance of the base-fixed plate changes due to the base-treated processing solution containing organic acid, it was roughly heated for 1 m using the metal halide lamp described above.
After exposing the entire surface to light for 60 seconds from a distance of , the film was rubbed with a developing pad impregnated with a developer consisting of ethanol/"Isopar E"=80/20 (weight ratio). The silicone rubber layer in the non-image area was not damaged at all, and the fixing effect did not deteriorate at all.
[発明の効果]
本発明により製版された印刷版は、塩基処理によって褐
色に変色した版を、耐溶剤性、耐刷性、耐スクラッチ性
なとの特性を劣化させずに確実に脱色させることができ
る。すなわち、本発明の水なし平版印刷版の製版方法に
より、検版性の優れた水なし平版印刷版が得られる。ざ
らに、版の脱色むら等が発生せず、版のイメージが向上
する。[Effects of the Invention] The printing plate made according to the present invention can reliably decolorize a plate that has turned brown due to base treatment without deteriorating its properties such as solvent resistance, printing durability, and scratch resistance. Can be done. That is, by the method for making a waterless lithographic printing plate of the present invention, a waterless lithographic printing plate with excellent plate inspection properties can be obtained. In addition, uneven decoloring of the plate does not occur, and the image of the plate improves.
Claims (2)
成分とする感光層およびシリコーンゴム層をこの順に塗
設してなる水なし平版印刷版を、画像露光した後、現像
と同時または現像の前および/または後に塩基処理を施
し、続いて有機酸を含む処理液で処理することを特徴と
する水なし平版印刷版の製版方法。(1) After imagewise exposure of a waterless lithographic printing plate formed by coating a support with a photosensitive layer containing a substance containing a quinonediazide structure and a silicone rubber layer in this order, at the same time as development or before development. and/or a method for making a waterless lithographic printing plate, characterized in that it is then subjected to a base treatment and then treated with a treatment liquid containing an organic acid.
上のカルボン酸であることを特徴とする特許請求の範囲
第(1)項記載の水なし平版印刷版の製版方法。(2) The method for making a waterless lithographic printing plate according to claim (1), wherein the organic acid is a carboxylic acid having 2 to 18 carbon atoms and a boiling point of 140° C. or higher.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4762487A JPS63214757A (en) | 1987-03-04 | 1987-03-04 | Method for making waterless planographic lithographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4762487A JPS63214757A (en) | 1987-03-04 | 1987-03-04 | Method for making waterless planographic lithographic printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63214757A true JPS63214757A (en) | 1988-09-07 |
JPH0429053B2 JPH0429053B2 (en) | 1992-05-15 |
Family
ID=12780368
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4762487A Granted JPS63214757A (en) | 1987-03-04 | 1987-03-04 | Method for making waterless planographic lithographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63214757A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997017634A1 (en) * | 1995-11-10 | 1997-05-15 | Toray Industries, Inc. | Treating fluid for making waterless lithographic plate |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
JPS5917552A (en) * | 1982-07-21 | 1984-01-28 | Toray Ind Inc | Method for processing image forming laminate |
JPS6028655A (en) * | 1983-07-27 | 1985-02-13 | Toray Ind Inc | Developing liquid for lithographic plate using no dampening water |
-
1987
- 1987-03-04 JP JP4762487A patent/JPS63214757A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
JPS5917552A (en) * | 1982-07-21 | 1984-01-28 | Toray Ind Inc | Method for processing image forming laminate |
JPS6028655A (en) * | 1983-07-27 | 1985-02-13 | Toray Ind Inc | Developing liquid for lithographic plate using no dampening water |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997017634A1 (en) * | 1995-11-10 | 1997-05-15 | Toray Industries, Inc. | Treating fluid for making waterless lithographic plate |
Also Published As
Publication number | Publication date |
---|---|
JPH0429053B2 (en) | 1992-05-15 |
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Legal Events
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EXPY | Cancellation because of completion of term |