JPS6028655A - Developing liquid for lithographic plate using no dampening water - Google Patents
Developing liquid for lithographic plate using no dampening waterInfo
- Publication number
- JPS6028655A JPS6028655A JP13596183A JP13596183A JPS6028655A JP S6028655 A JPS6028655 A JP S6028655A JP 13596183 A JP13596183 A JP 13596183A JP 13596183 A JP13596183 A JP 13596183A JP S6028655 A JPS6028655 A JP S6028655A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- printing plate
- dampening water
- lithographic printing
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野−1
本発明は改良された湿し水不要平版印刷版用現像液に関
する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field-1] The present invention relates to an improved developer for lithographic printing plates that does not require dampening water.
シリコーンゴム層をインキ反撥層々する?5ii L水
不要平版印刷版であって、ネガ型に作用する版(イとし
ては4例えば支持体上に設けたオノ+= l−ギノノン
アジド化合物を含む感光層上に/リコーンゴノ・層を設
けて予備増感されたものが特開昭56−80046で提
案されている。これらの版イ4は11ri 7:’+P
S版と同様に露光−現像工程に」:り製版されるが、現
像液としては、特願昭56−1ろろ278−弓で提案さ
れているような有機溶剤を主成分とするものや、水を主
成分とするものが提案さItでいる1、このような現像
液は、有機溶剤系においては引火の危1倹性があり、更
にi7J: ′yI!像時に非画線部のシリコーンを傷
つけやずいという欠点がある。こtr、 (rc対し、
水系においては作業環境の面から好寸(いたけでなく、
現像時における非画線への傷の恐れも小さく好ましいの
であるが、現像十〜°J作I−′ム:i−(’1に欠け
、特に現像液として水のみを使用し2だ場合にはその傾
向が顕著で現像不良を起こしゃずいなどの欠点があった
。Is the silicone rubber layer an ink-repellent layer? 5ii L water-free lithographic printing plate, which is a negative-working plate (4) For example, on a photosensitive layer provided on a support and containing a l-gynonone azide compound, a preliminary layer is provided. A sensitized version was proposed in JP-A-56-80046.These versions are 11ri 7:'+P.
The plate is made in the same way as the S plate through the exposure and development process, but the developer may be one containing an organic solvent as the main component, as proposed in Japanese Patent Application No. 56-1 Roro 278-Yumi. , it has been proposed that the main component is water.1 Such a developer has the risk of flammability in an organic solvent system, and furthermore, i7J: 'yI! There is a drawback that the silicone in the non-image area may be damaged or damaged during imaging. This tr, (for rc,
In water systems, it is suitable for the working environment (not bamboo shoots,
It is preferable that there is less risk of scratches on non-image lines during development, but the development time is less than 100%. This tendency was remarkable, and there were drawbacks such as poor development.
r発明の目的〕
本発明の目的は、これらの欠点を改良し、現像速度が大
きく、現像操作上安定な現像液を提供することにある。[Object of the Invention] An object of the present invention is to improve these drawbacks and provide a developing solution that has a high development speed and is stable during development operations.
本発明は、支持体上にオルトキノンジアジド化合物を含
む感光層および/リコーンゴム層をこの11111に塗
設してなる湿し水不要平版印刷版を露光後。In the present invention, a lithographic printing plate that does not require dampening water is prepared by coating a support with a photosensitive layer containing an orthoquinone diazide compound and/or a silicone rubber layer after exposure.
画像を現像するだめの現像液において、現像液に有機酸
が含まれていることを特徴とする湿し水不要平版印刷版
用現像液である。This is a developer for lithographic printing plates that does not require dampening water, and is characterized in that the developer used to develop images contains an organic acid.
本発明における露光により画像潜像を形成した湿し水不
要平版印刷版の現像操作方法については何ら制限される
ものでr」:ないが、主として次の様なものが挙げられ
る。In the present invention, there are no restrictions on the method of developing a lithographic printing plate that does not require dampening water and has a latent image formed by exposure to light, but the following methods can be mainly used.
(1) 有機溶剤捷だに有機溶剤に水が混合したものを
現像液として使用する方法。(1) Organic solvent: A method in which a mixture of an organic solvent and water is used as a developer.
(2) 41機溶剤に浸漬することにより版を前処理し
また後、水または有機溶剤を含む水を現像液として使用
する方法。(2) A method in which the plate is pretreated by immersion in a 41-organic solvent, and then water or water containing an organic solvent is used as a developer.
(3) 塩基処理を施した後、水または有イ;&溶剤を
含む水を現像液とし、て使用する方法。(3) A method in which water or water containing a solvent is used as a developer after basic treatment.
これらの方法のいずれの場合においても、現像液に有機
酸を含むことによりその効果を発揮できるのであるが、
(2)および(3)の方法において、!Jl!像液とし
て水のみを用いた場合に最もその効果が人きく、シかも
作業員にとって最も41機溶剤に晒さハやすい現像作業
において有機溶剤を除去できることは作業環境の面から
もタイましいととである。In any of these methods, the effect can be achieved by containing an organic acid in the developing solution.
In methods (2) and (3),! Jl! The effect is most noticeable when only water is used as the developing solution, and the ability to remove organic solvents during the developing process, where workers are most likely to be exposed to organic solvents, is advantageous from the perspective of the working environment. be.
本発明の現像液は有機酸を含むことが必須であるが、現
像液としては水まだは/およO・次に示す有機溶剤を使
用することができる。Although it is essential that the developer of the present invention contains an organic acid, the following organic solvents such as water/O and O can be used as the developer.
本発明において現像液として使用される有機溶剤として
は、炭化水素、棒性溶剤、をそれそJl、 71’1独
あるいは混合して使用することができる。As the organic solvent used as the developer in the present invention, hydrocarbons and rod solvents can be used individually or in combination.
炭化水素としては下記に示すものが一般的にイ〕用であ
る。As hydrocarbons, the following are generally used.
脂肪族炭化水素類(ぺ/夕/、ヘキザノ、ヘゲタン、オ
クタン、アイツバ−E 、 H、M 、ガソリ/。Aliphatic hydrocarbons (P/Y/, hexano, hegetane, octane, Aitzva-E, H, M, gasoline/.
灯油、軽油1重油など)。kerosene, diesel oil, 1 heavy oil, etc.).
芳香族炭化水素類(+−ルエン、キンレンナト)。Aromatic hydrocarbons (+-luene, quinlenato).
ハロゲン化炭化水素類(トリクレン、四塩化炭素など)
。Halogenated hydrocarbons (triclene, carbon tetrachloride, etc.)
.
極性溶剤としては下記に示すものが一般的に有用である
。As polar solvents, those shown below are generally useful.
アルコール類(メタノール、エタノール、n−プロパツ
ール、イングロパノール、3−7トギシブクノール、3
−メチル−6−メドキ/ブタノール、ジアセトンアルコ
ールナト)。Alcohols (methanol, ethanol, n-propanol, ingropanol, 3-7 togisibuknol, 3
-methyl-6-medki/butanol, diacetone alcohol nato).
エーテル類(ジオキザン、テトラヒドロフラン。Ethers (dioxane, tetrahydrofuran.
メチルセロソルブ、エチル士ロノルプ、ブテルセロソル
フ、エチレングリコールジエチルエーテル。Methyl cellosolve, ethyl cellosolve, buter cellosolve, ethylene glycol diethyl ether.
ジエチレンクリコールモノメチルエーテル、ジエチレン
グリコールモノエチルエーテル、シエチレングリコール
ジエテルエーテル、ジエテレンダリコールモノブテルエ
ーテル、トリエチレンクリコールモノメfルエーデル、
トl)エチレンクl) コールジメチルエーテル、テト
ラエチレングリコールモノメチルエーテル、テトラエチ
レングリコールジメチルエーテル、プロピレングリコー
ルモノメチルエーテル、ジプロピレングリコール千ツメ
チルエーテル、トリプロピレングリコールモノメチルエ
ーテル、テトラヒドロフルフリルアノなど)。Diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol diether ether, diethylene glycol monobuter ether, triethylene glycol monomethyl ether,
ethylene glycol dimethyl ether, tetraethylene glycol monomethyl ether, tetraethylene glycol dimethyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, tetrahydrofurfurylano, etc.).
エステル類(アセト酎・酸メチル、アセト自1−自タエ
チル、メチルセロソルブアセテート、エチ,I+/ーヒ
ロソルブアセテート.酢酸ジエチレングリコ−/1.モ
ノメチルエーテル
ノエチルエーテル,酢酸シエチレンク゛リコールモノブ
チルエーテル、ジ酢酸グリコール、乳酸エグール,プロ
ピ刈ン酸メチル、プロピオン酸エチル。Esters (acetochu/acid methyl, aceto 1-ethyl ethyl acetate, methyl cellosolve acetate, ethyl, I+/-hyrosolve acetate, diethylene glycol acetate/1. monomethyl ether noethyl ether, ethylene glycol monobutyl ether acetate, diacetic acid Glycol, egul lactate, methyl propionate, ethyl propionate.
マロン酸ジノチル、マロン酸ンエテル,コノ1りl’l
’2ジメチル、コノ・り酸ジエチル、アジピン酸ンメブ
ールなど)。Dinotyl malonate, malonate ether, Kono1ri l'l
2-dimethyl, diethyl phosphate, dimethyl adipate, etc.).
これらの現像液に添加する有機酸r11重ii:%」−
J、上で効果があるが好1しくは5屯セ)φ以上である
。Organic acid r11 weight ii added to these developers: %”-
Although it is effective at J and above, it is preferably at least 5 tons)φ.
寸だ炭素数の小さな有機酸においてはそれ一jl+独で
も良好な現像が可能である。In the case of an organic acid having a relatively small number of carbon atoms, good development can be achieved even with just one.
本発明において,露光により画像Ii像を形成した湿し
水不要平版印刷版を浸漬することによりi3iJ処Jj
+!を施して有機酸を含有させた水を現像液上して使用
する場合に、前処理液として上に挙げた炭化水素、極性
溶剤をそれぞれ単独あるいは混合して使用することがで
きる。In the present invention, the i3iJ treatment Jj is performed by dipping the lithographic printing plate that does not require dampening water and on which the image Ii has been formed by exposure.
+! When water containing an organic acid is used on top of a developer, the above-mentioned hydrocarbons and polar solvents can be used alone or in combination as the pre-treatment liquid.
本発明において使用される有機酸としては1%に限定さ
れるものてはなく9例えばカルボン酸。The organic acids used in the present invention are not limited to 1%, but include, for example, carboxylic acids.
スルホ7酸、ホスホン酸などのいずれでもよいが。Any of sulfoheptacic acid, phosphonic acid, etc. may be used.
in″に好捷しい有機酸はギ酸、酢酸、プロピオン酸。Organic acids suitable for in'' are formic acid, acetic acid, and propionic acid.
n−酪酸、イソ酪酸、n−吉草酸、イソ吉草酸。n-butyric acid, isobutyric acid, n-valeric acid, isovaleric acid.
メチルエチル酢酸、トリメチル酢酸、カプロン酸。Methyl ethyl acetic acid, trimethyl acetic acid, caproic acid.
イノカブロン酸、α−メチル吉草酸、2−エチル−n−
醋酸、エナント酸、カグリル酸、2−エチルへキザ/酸
、ペラルゴン酸などのアルカン酸である。他の官能基を
有する有機酸は版拐のシリコーンゴノ・層を通して露光
きれた画像部の感光層への作用が小さく、lSとんどI
Jl像性に効果がない。Inocabronic acid, α-methylvaleric acid, 2-ethyl-n-
These are alkanoic acids such as acetic acid, enanthic acid, calylic acid, 2-ethylhexyl acid, and pelargonic acid. Organic acids having other functional groups have a small effect on the photosensitive layer in the image area that has been exposed through the silicone layer of the printing plate, and
No effect on JL image quality.
脣だ、塩基処理後水単独からなる。−1′たけ水を主成
分とする現像液を用いる場合にも上に述べたような有機
酸を現像液に添加することによって。It consists of water alone after base treatment. -1' Even when using a developer containing water as a main component, the above-mentioned organic acid can be added to the developer.
その現像性を大幅に改良することができる。Its developability can be significantly improved.
本発明においては、有機酸を含む現像液を用いることに
よって9.現像性が大幅に向上し且つ現像速度が速くな
り、その効果r↓現像液中の水が多いほど顕著である。In the present invention, by using a developer containing an organic acid, 9. The developability is greatly improved and the development speed becomes faster, and the effect r↓ becomes more pronounced as the amount of water in the developer increases.
その結果1作業者が長時間(+イ’:’に溶剤の蒸気に
さらされることがなくなるほか、水単独ないしは不の多
い現像液を用いることができるため引火の危険性も減じ
ることができる。As a result, one worker is not exposed to solvent vapor for a long period of time, and the risk of ignition can be reduced because water alone or a developer with a high content of water can be used.
以下実施例を挙げてさらに具体的に説明する。The present invention will be described in more detail below with reference to Examples.
なお、実施例中に記載した「部」は「重:1ニ一部−1
を示す。In addition, "part" described in the examples is "weight: 1 d part - 1
shows.
実施例1
厚み 0.24nunのアルミ板(住友軽金属製)にフ
ェノールホルムアルデヒドレゾール樹脂(スミシイトレ
ジンPC−1.住友デュレス製)を27rの厚み(キュ
ア後の)に塗布し、190℃、ろ分間・λ・ニアしたも
のを支持体として、この上に下記の感光性組成物を塗布
し、120℃、2分間加熱処JII して厚さ2μの感
光層を設けた。Example 1 Phenol formaldehyde resol resin (Sumishi Resin PC-1, manufactured by Sumitomo Duress) was coated on an aluminum plate (manufactured by Sumitomo Light Metal) with a thickness of 0.24 nm to a thickness of 27 r (after curing), and heated at 190°C for a filtration period of λ.・The following photosensitive composition was coated on the nipped substrate as a support, and heat treated at 120° C. for 2 minutes to form a photosensitive layer with a thickness of 2 μm.
(1) ナフトキノン−1,2−ジアジド−5−スルホ
ン酸トフェノールホルムアルデヒドノボラツク樹脂の部
分エステル(IR法によるエステル化度47%) 10
0重量部
(214,4’−ジフェニルメタンジイソシアネ−1・
30重量部
(3) ジブチル錫ジラウレート 02重量部(4)
ジオキサン 740i量部
続いてこの上に下記の組成の7リコ一ンゴム組成物を回
転塗布後、120℃、露点30℃、2分間湿熱硬化させ
て2μのシリコーンゴム層を設けて。(1) Partial ester of naphthoquinone-1,2-diazido-5-sulfonic acid tophenol formaldehyde novolak resin (degree of esterification 47% by IR method) 10
0 parts by weight (214,4'-diphenylmethane diisocyanate-1.
30 parts by weight (3) Dibutyltin dilaurate 02 parts by weight (4)
740 i parts of dioxane Subsequently, a silicone rubber composition having the following composition was spin-coated thereon and cured with moist heat at 120° C. and a dew point of 30° C. for 2 minutes to form a 2 μm silicone rubber layer.
湿し水不要平版印刷版を作製した。A lithographic printing plate that does not require dampening water was prepared.
(1) ジメチルボリシロキザン(分子量約25,00
0゜末端水酸基) 100重量部
(21ヒニルl−’J (ソチルエテルケトオキシム)
ンラン 8重量部
(3) ジブチル錫ジアセテート 02重量部(4)r
−アミノブロピルトリメトキンンラン1重量部
(5)アイソパーE(エクソン化学製、脂肪族炭化水素
系放炎) 1soo重量部
かかる湿し水不要平版印刷版にメタル・・ライトランプ
(岩崎電機面製アイドルフィン2000)を用い、1m
の距離でUVメーター(鼎オークで((14作所ラうト
メジャータイプuv−402A)で11 mW/cn+
’の照度で全面露光を6秒施し2だ。(1) Dimethylborisiloxane (molecular weight approximately 25,00
0° terminal hydroxyl group) 100 parts by weight (21 hinyl l-'J (sotyl ether ketoxime)
Nran 8 parts by weight (3) Dibutyltin diacetate 02 parts by weight (4) r
- Aminopropyltrimethquine 1 part by weight (5) Isopar E (manufactured by Exxon Chemical Co., Ltd., aliphatic hydrocarbon-based flame release) 1 soo parts by weight of a metal light lamp (manufactured by Iwasaki Electric Co., Ltd.) on a lithographic printing plate that does not require dampening water 1m using idle fin 2000)
At a distance of
2 with a 6 second full exposure at an illuminance of '.
上記のように全面露光をしてHjJられた湿[−2水不
要平版印刷版に、150線、2裂から98係の網点を有
するグラデーションネガフィルムを真空密2″jし、そ
れを通して上記のメタルノ・ライドランプ6−用いて、
1mの距R1Fから60秒1曲像露光することによって
画像形成能を有するネガ型?!+ii L水不彎・17
版印刷版を得た。A gradation negative film having 150 lines and halftone dots from 2 to 98 was vacuum-tightly applied to the wet [-2 water-less lithographic printing plate which had been fully exposed and subjected to HjJ as described above, and the above-mentioned film was passed through it. Using the Metalno Ride Lamp 6-,
A negative type that can form an image by exposing one curved image for 60 seconds from a distance R1F of 1m? ! +ii L water inflexibility・17
A printed version was obtained.
次いで、塩基処理液(メチルカルビ)・−ル/−1モノ
エタノールアミン= 100重用部/ 5 ’、iRi
if部)を/1i7j シた平型バットに、上記の露光
済版を1分間浸漬する。浸漬後ゴムスキーンで版面おま
ひ虐面に付着した塩基処理液を除去し1次いて版面と現
像パッドにn−酪酸5重量部、水95重IW部からなる
現像液を庄き、現像パットで面圧10 g/m2をかけ
約1分間版面をこすると1画像状に露光された部分の7
リコ一ンゴム層が除去され、感光層が露Sj Lで画線
部を形成し、−万全面露光のみを受け/ζ部分には/リ
コーンゴム層が強固に残存して非画線部を形成し、ネガ
フィルムに忠実な画像を再現した印刷版が得られた。次
いでこの印刷版をオフセット印刷(幾(ハマダスター)
にとりつけ。Next, base treatment solution (methylcarbyl)/-1 monoethanolamine = 100 parts/5', iRi
The above-exposed plate was immersed for 1 minute in a flat vat containing /1i7j (if part). After soaking, remove the base treatment solution adhering to the surface of the printing plate with a rubber skein. Next, apply a developer consisting of 5 parts by weight of n-butyric acid and 95 parts by weight of water to the printing plate and developing pad. Applying a pressure of 10 g/m2 and rubbing the plate for about 1 minute, 7 of the exposed area in one image
The silicone rubber layer is removed, and the photosensitive layer is exposed to Sj L to form an image area, and the silicone rubber layer remains firmly in the ζ area, which is exposed only to full surface light and forms a non-image area. , a printing plate was obtained that reproduced an image faithful to the negative film. This printing plate is then offset printed (Hamada Star).
Attached to.
東洋インキ製゛ウルトう70紅″を用いて、湿し水を用
いないで2万枚印刷した。印刷物r1何ら汚れることな
くきわめて良好なものであった。また印刷版の版面の損
傷も認められなかった。20,000 sheets were printed using Toyo Ink's ``Ulto 70'' without using dampening water.Prints R1 were in very good condition without any stains.Also, no damage was observed to the surface of the printing plate. There wasn't.
比較例1
実施例1の記載の通り製造し2かつ露光して得られた画
像形成能を有する湿し水不要平版印刷版を同様に塩基処
理(メチルカルピトール/モノエタノールアミン−10
0重411部15ffi量部)する。Comparative Example 1 A lithographic printing plate that did not require dampening water and had an image-forming ability was produced as described in Example 1 and exposed to light.
0 weight 411 parts 15ffi parts).
次いで、水を版面と現fSコバノドに注ぎ2面圧10g
/Cm2で約ろ分間版面をこすったが、はとんど露光部
の/リコーンゴム層を除去することができず。Next, pour water on the plate and the current fS Kobanodo and apply a pressure of 10g between the two surfaces.
The plate surface was rubbed with /Cm2 for about a minute, but the silicone rubber layer in the exposed areas could not be removed.
印刷が不可能な印刷版となった。It became a printed version that was impossible to print.
実施例2
実施例1で製造しまた湿し水工−要平版印刷版に150
線の2%から98%の網点を有するグラデーションフィ
ルムを、常法に従って真空密Xi l−、実施例1で用
いたメタルハライドランプを用いて1mの距離で60秒
画像露光することによって画像形成能を有するネガ型の
湿し7水不吸平版印刷版をイ!Iた。次いで、前処理液
(メチルカルピト−ル)を/1j71だした縦型バット
に、上記の露光箔版を1分間浸漬する。浸漬後ゴムスギ
ージで版面および裏面に伺着し/ζ前処理液を除去シフ
、次いで版面とJJI像バットにプロピオン酸5重量部
、水95申11:、’ :’dlからなる現像液を注き
、現像バットで面バー1[J(ψII2をかけ約1分間
版面をこすると、 1iJj像状に露光7N〕上た部分
の/1ノコーンゴム層が除去ざノと、感光層がM出した
画線部を形成し、ネガフィルl、に竣実を画像を再現し
た印刷版が得られた。次いて、この印刷版を実施例1と
同様の条件で印刷したところ、極めて良好な印刷物が得
られた。Example 2 The dampening process produced in Example 1 and the lithographic printing plate required 150
Image forming ability was obtained by exposing a gradation film having halftone dots from 2% to 98% of the line for 60 seconds at a distance of 1 m using the metal halide lamp used in Example 1 in a vacuum-tight Xi l- according to a conventional method. A negative type dampening 7 water-absorbent lithographic printing plate with ! I was. Next, the above-mentioned exposed foil plate was immersed for 1 minute in a vertical vat into which a pretreatment liquid (methylcarpitol) was poured at a rate of /1j71. After immersion, the plate and back were covered with a rubber siege and the ζ pretreatment liquid was removed using a sifter, and then a developer consisting of 5 parts by weight of propionic acid and 95 parts of water and 11:,':'dl was poured onto the plate and the JJI image vat. , When the surface bar 1 [J (applying ψII2 and rubbing the printing plate for about 1 minute, 1iJj image-wise exposure 7N) with a developing vat, the /1 cone rubber layer on the upper part is removed, and the image line M produced by the photosensitive layer. A printing plate was obtained which reproduced the completed image on the negative film L. Next, when this printing plate was printed under the same conditions as in Example 1, extremely good printed matter was obtained. .
比較例2
実施例1で製造した湿し水不要平版印刷版を実施例2と
同様に露光して得られた湿し水不要平版印刷版を、前処
理液(メチルカルピトール)を満たした縦型バットに1
分間浸漬する。浸漬後ゴムスキージで版面および裏面に
付着した前処理液を除去し1次いで版面と現像−ζノド
に水を注ぎ2面圧i o g7m2で約6分間版面をこ
すったが、はとんど露光部の/リコーンゴム層を除去す
ることができず印刷が不可能な印刷版となった。Comparative Example 2 The dampening water-free lithographic printing plate produced in Example 1 was exposed in the same manner as in Example 2. 1 in the mold bat
Soak for minutes. After dipping, the pre-treatment liquid adhering to the plate surface and back surface was removed using a rubber squeegee, and then water was poured onto the plate surface and the development throat.The plate surface was rubbed for about 6 minutes at a surface pressure of 7 m2, but the exposed area The silicone rubber layer could not be removed, resulting in a printing plate that could not be printed.
実施例ろ 実施例1で製造した湿し水不要平版印刷版に。Example To the lithographic printing plate that does not require dampening water and was produced in Example 1.
150線の2係から98%の網点を有するグラデーショ
ンフィルム、を、常法にしたがって真空密着し。A gradation film having halftone dots of 98% from the 2nd line of 150 lines was vacuum-adhered according to a conventional method.
実施例1で用いたメタルノ・ライドランプを用いて1m
の距離で照度60秒露光を施すことによって画像形成能
を有するイ・ガ型湿し水不要平版印刷版を得た。1m using the metalno-ride lamp used in Example 1
By exposing the plate to light at a distance of 60 seconds at an illuminance of 60 seconds, an I-Ga type lithographic printing plate that did not require dampening water and had an image-forming ability was obtained.
次いでこれを、現像パッドに氷西1酸を注き1面圧10
g/m2で1分間こすると露光部のレリコ〜ンゴム層
が除去されて感光層表面が露出[画商部を形成した。こ
の印刷版を実施例1と同(11<の条flで印刷したと
ころ、網点再現域5〜95%で、微少欠点や現像バット
によるスリ傷因の欠点の、Q、 l、)印刷物が得られ
た。Next, pour Hyosei 1 acid onto the developing pad and apply a surface pressure of 10
When rubbed for 1 minute at a pressure of g/m2, the resin rubber layer in the exposed area was removed and the surface of the photosensitive layer was exposed (forming an image trading area). When this printing plate was printed with the same stripes fl as in Example 1 (11<), the printed matter had a halftone reproduction range of 5 to 95%, and was free of minute defects and defects caused by scratches caused by the development bat. Obtained.
実施例4
実施例1で製造した湿し水不要平版印刷版に150線の
2%から98%の網点をイ1−するり゛ラブージョンフ
ィルムを、常法に従って真空’sl*1L、 、実施例
1で用いたメタルノ凡うイトランゾロー用いで11nの
距離で60秒露光を施すことに」:つて画f′が形成能
を有するネガ型湿し水不要平版印刷版?C(!f k−
n次いでこの原版を、現像・ζノドにアイノ、;−I+
10重昂部、ブチルカルピトール40 ll’tl :
、置“il、−+二チルカルヒトール40重−rf 部
、2−エチル−\・)゛″1ノン酸10重−fA一部か
らなる現像液をl]き、 i/lil+:1 tJg/
m2 で1分間こすると露光γXt+のノリml −7
mlノ・層が除去されて感光層表面が露出し7画像部を
形成した。この印刷版を実施例1と同様の条件で印刷し
たところ、網点再現域2〜98%で、微少欠点や現像パ
ットによるスリ傷状の欠点のない印刷物が得られた。Example 4 A lithographic printing plate that does not require dampening water produced in Example 1 was coated with a 150-line duplex film with halftone dots ranging from 2% to 98%, and vacuum 1L*1L was applied in accordance with a conventional method. Exposure was carried out for 60 seconds at a distance of 11 nm using the metal compound used in Example 1.A negative type lithographic printing plate that does not require dampening water and has the ability to form an image f'? C(!f k-
Next, this original plate was developed,
10 parts, butylcarpitol 40 ll'tl:
, place a developer solution consisting of "il, - + 40 parts of dithylcalhitol, 1 part of 2-ethyl-\.
When rubbing with m2 for 1 minute, the exposure γXt+ paste ml -7
The ml layer was removed to expose the surface of the photosensitive layer and form 7 image areas. When this printing plate was printed under the same conditions as in Example 1, a printed matter with a dot reproduction range of 2 to 98% and no minute defects or defects such as scratches caused by the development pad was obtained.
比1咬例ろ
実施例1で製造した湿し水不要平版印刷版を実M12例
ろと同様にして画像形成能を有するネガ型湿し水不要平
版印刷版を得た。次いでこの印刷版を。The dampening water-less lithographic printing plate produced in Example 1 was treated in the same manner as the actual M12 example to obtain a negative-working dampening water-less lithographic printing plate having image-forming ability. Next, this printed version.
現像パッドにアイソパーH20重量部、プチルカルヒl
−−ル” fj t 部、エチルカルピトール40重量
部からなる現像液を注き2面圧I D g/m2で6分
間こすることによって露光部のシリコーンコム層が完全
に除去されて感光層が露出し画像部を形成した。この印
刷版を実施例1と同様の条件で印刷したところ、網点再
現域5〜95%の印刷物がイIIられんが、非画像部に
現像バンドによるものと思われる傷が8.Uめられだ。20 parts by weight of Isopar H and Petyl Calhi l on the developing pad.
By pouring a developing solution consisting of 40 parts by weight of ethyl carpitol and 40 parts by weight of ethyl carpitol, the silicone comb layer in the exposed area was completely removed and the photosensitive layer was exposed to form an image area. When this printing plate was printed under the same conditions as in Example 1, a printed matter with a halftone dot reproduction area of 5 to 95% was not obtained. The scar that seems to be 8.U is merare.
Claims (3)
光層およびシリコーンゴム層をこの順に塗設してなる湿
し水不要平版印刷版を露光後1画像を現像するだめの現
像液において、現像液に有機酸が含″Xとれていること
を特徴とする湿し水不要平版印刷版用現像液。(1) After exposing a lithographic printing plate that does not require dampening water, which is prepared by coating a photosensitive layer containing an orthoquinonediazide compound and a silicone rubber layer on a support in this order, in a developer for developing one image. A developer for lithographic printing plates that does not require dampening water and is characterized by containing no organic acid.
を特徴とする特許請求の範囲第1項記載の湿し水不要平
版印刷版用現像液。(2) A developer for a lithographic printing plate that does not require dampening water as set forth in claim 1, wherein the content of organic acid is 1 to 100% by weight.
¥1゛請求の範囲第1項記載の湿し水不要平版印刷版用
現像液。(3) A developer for a lithographic printing plate that does not require dampening water according to claim 1, wherein the organic acid is an alkali/acid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13596183A JPS6028655A (en) | 1983-07-27 | 1983-07-27 | Developing liquid for lithographic plate using no dampening water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13596183A JPS6028655A (en) | 1983-07-27 | 1983-07-27 | Developing liquid for lithographic plate using no dampening water |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6028655A true JPS6028655A (en) | 1985-02-13 |
JPH0311462B2 JPH0311462B2 (en) | 1991-02-18 |
Family
ID=15163889
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13596183A Granted JPS6028655A (en) | 1983-07-27 | 1983-07-27 | Developing liquid for lithographic plate using no dampening water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6028655A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6352145A (en) * | 1986-08-22 | 1988-03-05 | Toray Ind Inc | Developing solution for dry lithographic plate |
JPS63214757A (en) * | 1987-03-04 | 1988-09-07 | Toray Ind Inc | Method for making waterless planographic lithographic printing plate |
EP0290917A2 (en) * | 1987-05-12 | 1988-11-17 | Hoechst Aktiengesellschaft | Process for developing dry lithographic printing plates |
JPH03167553A (en) * | 1989-11-27 | 1991-07-19 | Toray Ind Inc | Developer for waterless planographic printing plate |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
JPS5835539A (en) * | 1981-08-27 | 1983-03-02 | Toray Ind Inc | Method for making negative lithographic plate requiring no dampening water |
-
1983
- 1983-07-27 JP JP13596183A patent/JPS6028655A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
JPS5835539A (en) * | 1981-08-27 | 1983-03-02 | Toray Ind Inc | Method for making negative lithographic plate requiring no dampening water |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6352145A (en) * | 1986-08-22 | 1988-03-05 | Toray Ind Inc | Developing solution for dry lithographic plate |
JPS63214757A (en) * | 1987-03-04 | 1988-09-07 | Toray Ind Inc | Method for making waterless planographic lithographic printing plate |
JPH0429053B2 (en) * | 1987-03-04 | 1992-05-15 | Toray Industries | |
EP0290917A2 (en) * | 1987-05-12 | 1988-11-17 | Hoechst Aktiengesellschaft | Process for developing dry lithographic printing plates |
JPH03167553A (en) * | 1989-11-27 | 1991-07-19 | Toray Ind Inc | Developer for waterless planographic printing plate |
Also Published As
Publication number | Publication date |
---|---|
JPH0311462B2 (en) | 1991-02-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4576743A (en) | Plate cleaner for lithographic printing plate | |
JPH0432377B2 (en) | ||
US4358522A (en) | Dry planographic printing plate | |
JPS60192948A (en) | Negative type photosensitive lithographic plate requiring no dampening water and its manufacture | |
US4743527A (en) | Dry presensitized plate including an overlying silicone rubber layer | |
US4963472A (en) | Developing method for printing plates for waterless offset printing with glycol diether containing developer | |
JPS645560B2 (en) | ||
JPS6154222B2 (en) | ||
JPS6028655A (en) | Developing liquid for lithographic plate using no dampening water | |
JPH01244892A (en) | Composing method for lithographic printing plate and burning pretreatment solution | |
US5017457A (en) | Presensitized printing plate for waterless lithographic printing and process for production thereof | |
JPS6154223B2 (en) | ||
JPH0213295B2 (en) | ||
JPH043866B2 (en) | ||
JPH043865B2 (en) | ||
JPH0740134B2 (en) | Waterless planographic processing solution | |
JPS6323546B2 (en) | ||
JP2507376B2 (en) | Waterless planographic processing solution | |
JP2507390B2 (en) | Waterless planographic processing solution | |
JPS6227190A (en) | Correcting agent for planographic plate | |
JPS6322304B2 (en) | ||
JPS63214757A (en) | Method for making waterless planographic lithographic printing plate | |
JPS61230989A (en) | Correction agent for lithographic printing block | |
JPS6224261A (en) | Modifier for lithographic plate | |
JPH0356623B2 (en) |