JPH03112933U

JPH03112933U -

Info

Publication number: JPH03112933U
Application number: JP2130990U
Authority: JP
Priority date: 1990-03-02
Filing date: 1990-03-02
Publication date: 1991-11-19

Description

[Brief explanation of drawings]

第１図は、この考案の一実施例によるガス流調
整装置の使用状況を示す拡散炉断面図、第２図は
、プレートホルダの斜視図、第３図乃至第７図は
、種々のバツフアプレートを立てた状態で示す前
面図、第８図及び第９図は、炉内のバツフアプレ
ート配置を示す前面図である。１０……プロセスチユーブ、１４……ヒータ、
１４……プレートホルダ、１４ａ〜１４ｉ，１４
ａ′〜１４ｉ′……プレート保持用凹部、１４Ａ
……ガス流通孔、１６……ウエハホルダ、Ｐ_１〜
Ｐ_３，ＰＡ_１〜ＰＡ_４，ＰＢ……バツフアプレー
ト、Ｗ……半導体ウエハ。 FIG. 1 is a cross-sectional view of a diffusion furnace showing the usage status of a gas flow regulating device according to an embodiment of the invention, FIG. 2 is a perspective view of a plate holder, and FIGS. 3 to 7 show various buffers. FIGS. 8 and 9 are front views showing the arrangement of the buffer plates in the furnace. 10... Process tube, 14... Heater,
14...Plate holder, 14a to 14i, 14
a' to 14i'... Plate holding recess, 14A
...Gas flow hole, 16...Wafer holder, P ₁ ~
_P3 , _PA1 to _PA4 , PB...Buffer plate, W...Semiconductor wafer.

Claims

[Claims for Utility Model Registration] In a horizontal heat treatment furnace, a workpiece placed in the furnace is heat-treated while a gas is flowing through the furnace, and the workpiece is placed between a point where the gas is introduced and a place where the workpiece is placed. (a) A plurality of plate holders are arranged in parallel along a predetermined direction on the upper part of the holder body, and the holder body has at least a plurality of plate holders sandwiched between adjacent plate holders. A plate holder having a gas flow hole formed in a portion thereof, the plate holder being configured to be placed in a furnace so that the predetermined direction is along the flow direction of the gas and a gas flow path is formed between the plate holder and the bottom surface of the furnace. (b) A plurality of buffer plates having mutually different shapes, each buffer plate being held upright by any one of the plurality of plate holders in a furnace; a gas flow regulating device configured to be placed in a gas flow regulating device;