JPH0293064A - イオンプレーティング装置 - Google Patents
イオンプレーティング装置Info
- Publication number
- JPH0293064A JPH0293064A JP24432288A JP24432288A JPH0293064A JP H0293064 A JPH0293064 A JP H0293064A JP 24432288 A JP24432288 A JP 24432288A JP 24432288 A JP24432288 A JP 24432288A JP H0293064 A JPH0293064 A JP H0293064A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- plasma
- substrate
- shaft
- direction slider
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007733 ion plating Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 230000007246 mechanism Effects 0.000 claims abstract description 19
- 238000000151 deposition Methods 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 2
- 230000010355 oscillation Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 23
- 238000007740 vapor deposition Methods 0.000 description 19
- 238000001704 evaporation Methods 0.000 description 15
- 230000008020 evaporation Effects 0.000 description 14
- 238000010894 electron beam technology Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 235000015429 Mirabilis expansa Nutrition 0.000 description 1
- 244000294411 Mirabilis expansa Species 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 235000013536 miso Nutrition 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24432288A JPH0293064A (ja) | 1988-09-30 | 1988-09-30 | イオンプレーティング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24432288A JPH0293064A (ja) | 1988-09-30 | 1988-09-30 | イオンプレーティング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0293064A true JPH0293064A (ja) | 1990-04-03 |
| JPH0548300B2 JPH0548300B2 (enrdf_load_stackoverflow) | 1993-07-21 |
Family
ID=17116997
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24432288A Granted JPH0293064A (ja) | 1988-09-30 | 1988-09-30 | イオンプレーティング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0293064A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009114525A (ja) * | 2007-11-08 | 2009-05-28 | Stanley Electric Co Ltd | プラズマ処理装置 |
-
1988
- 1988-09-30 JP JP24432288A patent/JPH0293064A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009114525A (ja) * | 2007-11-08 | 2009-05-28 | Stanley Electric Co Ltd | プラズマ処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0548300B2 (enrdf_load_stackoverflow) | 1993-07-21 |
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