JPH0548299B2 - - Google Patents

Info

Publication number
JPH0548299B2
JPH0548299B2 JP17197688A JP17197688A JPH0548299B2 JP H0548299 B2 JPH0548299 B2 JP H0548299B2 JP 17197688 A JP17197688 A JP 17197688A JP 17197688 A JP17197688 A JP 17197688A JP H0548299 B2 JPH0548299 B2 JP H0548299B2
Authority
JP
Japan
Prior art keywords
chamber
plasma
counter electrode
substrate
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP17197688A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0222464A (ja
Inventor
Torao Tazo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SURFACE HIGH PERFORMANCE RES
Original Assignee
SURFACE HIGH PERFORMANCE RES
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SURFACE HIGH PERFORMANCE RES filed Critical SURFACE HIGH PERFORMANCE RES
Priority to JP17197688A priority Critical patent/JPH0222464A/ja
Publication of JPH0222464A publication Critical patent/JPH0222464A/ja
Publication of JPH0548299B2 publication Critical patent/JPH0548299B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP17197688A 1988-07-12 1988-07-12 イオンプレーティング装置 Granted JPH0222464A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17197688A JPH0222464A (ja) 1988-07-12 1988-07-12 イオンプレーティング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17197688A JPH0222464A (ja) 1988-07-12 1988-07-12 イオンプレーティング装置

Publications (2)

Publication Number Publication Date
JPH0222464A JPH0222464A (ja) 1990-01-25
JPH0548299B2 true JPH0548299B2 (enrdf_load_stackoverflow) 1993-07-21

Family

ID=15933232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17197688A Granted JPH0222464A (ja) 1988-07-12 1988-07-12 イオンプレーティング装置

Country Status (1)

Country Link
JP (1) JPH0222464A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015127450A (ja) * 2013-12-27 2015-07-09 昭和電工株式会社 炭素膜の形成装置、炭素膜の形成方法、及び、磁気記録媒体の製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762243B2 (ja) * 1991-03-19 1995-07-05 株式会社ライムズ イオンプレーティング装置
JP5968666B2 (ja) * 2012-04-09 2016-08-10 中外炉工業株式会社 プラズマ発生装置および蒸着装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015127450A (ja) * 2013-12-27 2015-07-09 昭和電工株式会社 炭素膜の形成装置、炭素膜の形成方法、及び、磁気記録媒体の製造方法
US10134435B2 (en) 2013-12-27 2018-11-20 Showa Denko K.K. Carbon film forming apparatus, carbon film forming method, and magnetic recording medium manufacturing method

Also Published As

Publication number Publication date
JPH0222464A (ja) 1990-01-25

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