JPH02848B2 - - Google Patents

Info

Publication number
JPH02848B2
JPH02848B2 JP55145463A JP14546380A JPH02848B2 JP H02848 B2 JPH02848 B2 JP H02848B2 JP 55145463 A JP55145463 A JP 55145463A JP 14546380 A JP14546380 A JP 14546380A JP H02848 B2 JPH02848 B2 JP H02848B2
Authority
JP
Japan
Prior art keywords
ray
resist
chamber
exposure
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55145463A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5769739A (en
Inventor
Koichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55145463A priority Critical patent/JPS5769739A/ja
Publication of JPS5769739A publication Critical patent/JPS5769739A/ja
Publication of JPH02848B2 publication Critical patent/JPH02848B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation

Landscapes

  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55145463A 1980-10-17 1980-10-17 Exposing method and device for x-ray Granted JPS5769739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55145463A JPS5769739A (en) 1980-10-17 1980-10-17 Exposing method and device for x-ray

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55145463A JPS5769739A (en) 1980-10-17 1980-10-17 Exposing method and device for x-ray

Publications (2)

Publication Number Publication Date
JPS5769739A JPS5769739A (en) 1982-04-28
JPH02848B2 true JPH02848B2 (enrdf_load_stackoverflow) 1990-01-09

Family

ID=15385813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55145463A Granted JPS5769739A (en) 1980-10-17 1980-10-17 Exposing method and device for x-ray

Country Status (1)

Country Link
JP (1) JPS5769739A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60178627A (ja) * 1984-02-24 1985-09-12 Canon Inc Ｘ線転写装置
JPH04136901U (ja) * 1991-06-13 1992-12-21 関東自動車工業株式会社 自動ブレーキ付キヤスタ

Also Published As

Publication number Publication date
JPS5769739A (en) 1982-04-28

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