JPH0283017U - - Google Patents
Info
- Publication number
- JPH0283017U JPH0283017U JP16094588U JP16094588U JPH0283017U JP H0283017 U JPH0283017 U JP H0283017U JP 16094588 U JP16094588 U JP 16094588U JP 16094588 U JP16094588 U JP 16094588U JP H0283017 U JPH0283017 U JP H0283017U
- Authority
- JP
- Japan
- Prior art keywords
- filter
- outlet
- center
- filtration material
- porous filtration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims description 4
- 239000012530 fluid Substances 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims 2
- 238000011144 upstream manufacturing Methods 0.000 claims 1
- 238000001020 plasma etching Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
Description
第１図は本考案による濾過器の概略断面図、第
２図は第１図の濾過器の平面図、第３図は本考案
による濾過器をプラズマエツチング装置用電極と
して用いたプラズマエツチング装置を示す概略断
面図、第４図は本考案による濾過器の他の例を示
す概略断面図、第５図は従来の濾過器の概略断面
図、第６図は従来の濾過器をプラズマエツチング
装置用電極として用いたプラズマエツチング装置
を示す概略断面図である。
１，２１，３１…濾過器、２，２２，３２…流
出口、３，２３，３３…多孔質濾過材、４，２４
，３４…流入口、５，２５，３５…流体、１１，
４１…ケーシング、１２，４２…エツチング室、
１３，４３…上部電極（濾過器）、１３ａ，４３
ａ…流入口、１３ｂ，４３ｂ…流出口、１３ｃ，
４３ｃ…多孔質濾過材、１４，４４…下部電極、
１４ａ，４４ａ…水冷部分、１５，４５…反応性
ガス、１６，４６…基板、１７，４７…高周波電
源、１８，４８…排気口。
FIG. 1 is a schematic sectional view of a filter according to the present invention, FIG. 2 is a plan view of the filter shown in FIG. 4 is a schematic sectional view showing another example of a filter according to the present invention, FIG. 5 is a schematic sectional view of a conventional filter, and FIG. 6 is a schematic sectional view of a conventional filter for plasma etching equipment. FIG. 2 is a schematic cross-sectional view showing a plasma etching device used as an electrode. 1, 21, 31... Filter, 2, 22, 32... Outlet, 3, 23, 33... Porous filter material, 4, 24
, 34... inlet, 5, 25, 35... fluid, 11,
41...Casing, 12,42...Etching chamber,
13, 43... Upper electrode (filter), 13a, 43
a... Inlet, 13b, 43b... Outlet, 13c,
43c... Porous filter material, 14, 44... Lower electrode,
14a, 44a...water cooling part, 15,45...reactive gas, 16,46...substrate, 17,47...high frequency power supply, 18,48...exhaust port.
Claims (1)
、下流に大径の流出口を具え、この流出口に多孔
質濾過材を配設した濾過器であつて、前記多孔質
濾過材を、中央部を厚肉とするとともに、端部に
向けて順次薄肉とした凸レンズ形状としたことを
特徴とする濾過器。 A filter having a small-diameter fluid inlet at the center of the upstream, a large-diameter outlet at the downstream, and a porous filtration material disposed at the outlet, the porous filtration material being disposed at the center of the filter. A filter characterized by having a thick wall and a convex lens shape that gradually becomes thinner toward the end.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988160945U JPH069020Y2 (en) | 1988-12-12 | 1988-12-12 | Porous electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988160945U JPH069020Y2 (en) | 1988-12-12 | 1988-12-12 | Porous electrode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0283017U true JPH0283017U (en) | 1990-06-27 |
| JPH069020Y2 JPH069020Y2 (en) | 1994-03-09 |
Family
ID=31443459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988160945U Expired - Lifetime JPH069020Y2 (en) | 1988-12-12 | 1988-12-12 | Porous electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH069020Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11149995A (en) * | 1997-11-14 | 1999-06-02 | Foi:Kk | Plasma treating device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59162918U (en) * | 1983-04-18 | 1984-10-31 | 株式会社共立 | air cleaner |
-
1988
- 1988-12-12 JP JP1988160945U patent/JPH069020Y2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59162918U (en) * | 1983-04-18 | 1984-10-31 | 株式会社共立 | air cleaner |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11149995A (en) * | 1997-11-14 | 1999-06-02 | Foi:Kk | Plasma treating device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH069020Y2 (en) | 1994-03-09 |
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