JPH031965U

JPH031965U -

Info

Publication number: JPH031965U
Application number: JP6168289U
Authority: JP
Priority date: 1989-05-26
Filing date: 1989-05-26
Publication date: 1991-01-10

Description

[Brief explanation of the drawing]

第１図は本考案によるプラズマエツチング装置
用電極を配設したプラズマエツチング装置の概略
説明図、第２図は本考案によるプラズマエツチン
グ装置用電極に用いた多孔質積層体の斜視図、第
３図は従来のプラズマエツチング装置用電極を配
設したプラズマエツチング装置の概略説明図、第
４図は従来の他のプラズマエツチング装置用電極
の要部の断面図である。１，２１……ケーシング、２，２２……エツチ
ング室、３，２３，４３……上部電極、４，２４
……下部電極、５，２５，４５……反応性ガス、
６，２６，４６…導入口、７，２７，４７……中
空部、８，４８……流出口、９……多孔質積層体
、９ａ……多孔質体（通気率小）、９ｂ……多孔
質体（通気率大）、１０，２９……基板、１１，
３０……高周波電源、１２，３１……排気口、２
８……小孔、４９……多孔質体。 Fig. 1 is a schematic explanatory diagram of a plasma etching apparatus equipped with an electrode for a plasma etching apparatus according to the present invention, Fig. 2 is a perspective view of a porous laminate used for an electrode for a plasma etching apparatus according to the present invention, and Fig. 3 4 is a schematic explanatory diagram of a plasma etching apparatus equipped with a conventional plasma etching apparatus electrode, and FIG. 4 is a sectional view of a main part of another conventional plasma etching apparatus electrode. 1, 21... Casing, 2, 22... Etching chamber, 3, 23, 43... Upper electrode, 4, 24
... lower electrode, 5, 25, 45 ... reactive gas,
6, 26, 46... Inlet, 7, 27, 47... Hollow part, 8, 48... Outlet, 9... Porous laminate, 9a... Porous body (low air permeability), 9b... Porous body (high air permeability), 10, 29...Substrate, 11,
30... High frequency power supply, 12, 31... Exhaust port, 2
8...Small pore, 49...Porous body.

Claims

[Scope of utility model registration request]

An upper electrode is disposed inside the casing and has a hollow shape, and a reactive gas flows out from inside the casing, and a lower electrode is disposed opposite to the upper electrode and a substrate is placed on the surface of the upper electrode. An electrode for a plasma etching apparatus for use in a plasma etching apparatus for etching a substrate placed on the lower electrode by applying a high frequency voltage between the two electrodes, the upper electrode of the plasma etching electrode In this method, a porous laminate in which at least two layers of porous bodies with different air permeability are laminated is provided at the outlet of the reactive gas, and the porous body on the side facing the lower electrode of this porous laminate is ventilated. An electrode for a plasma etching device, characterized in that the permeability of a porous body inside the electrode is increased to have a good permeability.