JPH028022B2 - - Google Patents

Info

Publication number
JPH028022B2
JPH028022B2 JP56089381A JP8938181A JPH028022B2 JP H028022 B2 JPH028022 B2 JP H028022B2 JP 56089381 A JP56089381 A JP 56089381A JP 8938181 A JP8938181 A JP 8938181A JP H028022 B2 JPH028022 B2 JP H028022B2
Authority
JP
Japan
Prior art keywords
mandrel
vapor deposition
condensable
temperature
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56089381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57203770A (en
Inventor
Ryohei Shintani
Rikio Aozuka
Yukimoto Aizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP8938181A priority Critical patent/JPS57203770A/ja
Publication of JPS57203770A publication Critical patent/JPS57203770A/ja
Publication of JPH028022B2 publication Critical patent/JPH028022B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP8938181A 1981-06-10 1981-06-10 Vacuum vapor-deposition device Granted JPS57203770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8938181A JPS57203770A (en) 1981-06-10 1981-06-10 Vacuum vapor-deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8938181A JPS57203770A (en) 1981-06-10 1981-06-10 Vacuum vapor-deposition device

Publications (2)

Publication Number Publication Date
JPS57203770A JPS57203770A (en) 1982-12-14
JPH028022B2 true JPH028022B2 (OSRAM) 1990-02-22

Family

ID=13969089

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8938181A Granted JPS57203770A (en) 1981-06-10 1981-06-10 Vacuum vapor-deposition device

Country Status (1)

Country Link
JP (1) JPS57203770A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017075342A (ja) * 2015-10-13 2017-04-20 株式会社神戸製鋼所 成膜装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7150792B2 (en) 2002-10-15 2006-12-19 Kobe Steel, Ltd. Film deposition system and film deposition method using the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55100973A (en) * 1979-01-23 1980-08-01 Ricoh Co Ltd Heating of base plate in vacuum deposition
JPS55159868U (OSRAM) * 1979-04-27 1980-11-17

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017075342A (ja) * 2015-10-13 2017-04-20 株式会社神戸製鋼所 成膜装置
WO2017064988A1 (ja) * 2015-10-13 2017-04-20 株式会社神戸製鋼所 成膜装置

Also Published As

Publication number Publication date
JPS57203770A (en) 1982-12-14

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