JPS57203770A - Vacuum vapor-deposition device - Google Patents

Vacuum vapor-deposition device

Info

Publication number
JPS57203770A
JPS57203770A JP8938181A JP8938181A JPS57203770A JP S57203770 A JPS57203770 A JP S57203770A JP 8938181 A JP8938181 A JP 8938181A JP 8938181 A JP8938181 A JP 8938181A JP S57203770 A JPS57203770 A JP S57203770A
Authority
JP
Japan
Prior art keywords
vapor
heating
mandrel
base body
heating medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8938181A
Other languages
Japanese (ja)
Other versions
JPH028022B2 (en
Inventor
Ryohei Shintani
Rikio Aozuka
Yukimoto Aizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP8938181A priority Critical patent/JPS57203770A/en
Publication of JPS57203770A publication Critical patent/JPS57203770A/en
Publication of JPH028022B2 publication Critical patent/JPH028022B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Abstract

PURPOSE:To obtain a titled device for uniformly heating a cylindrical base body through a mandrel, by making the mandrel tightly sealed up with a heating medium pass through the cylindrical base body being an object to be vapor- deposited, and constituting the heating medium so as to be heated by a heater. CONSTITUTION:To a mandrel 1, a cylindrical base body 10 being an object to be vapor-deposited is installed so as to be rotatable in one body, and a vacuum chamber which is not shown in the figure is set to a prescribed degree of vacuum. Subsequently, a heating medum 2 in the mandrel 1 is detected 4 by a heater 5, is heated up to a prescribed temperature by watt density by which the heating medium 2 is not thermal-cracked, and the heating medium 2 is evaporated. In such a state, the base body 10 is rotated together with the mandrel 1 by a rotary shaft 7, also a vapor-deposition substance (m) is evaporated by heating a heating crucible 12, and the vapor-deposition substrance (m) is vapor- deposited to uniform coating film thickness on the outside surface of the base body 10. In this regard, as for the heating medium 2 and the vapor-depositin substance (m), for instance, diphenyl, and MgF2, ClF3, etc. are used, respectively.
JP8938181A 1981-06-10 1981-06-10 Vacuum vapor-deposition device Granted JPS57203770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8938181A JPS57203770A (en) 1981-06-10 1981-06-10 Vacuum vapor-deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8938181A JPS57203770A (en) 1981-06-10 1981-06-10 Vacuum vapor-deposition device

Publications (2)

Publication Number Publication Date
JPS57203770A true JPS57203770A (en) 1982-12-14
JPH028022B2 JPH028022B2 (en) 1990-02-22

Family

ID=13969089

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8938181A Granted JPS57203770A (en) 1981-06-10 1981-06-10 Vacuum vapor-deposition device

Country Status (1)

Country Link
JP (1) JPS57203770A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7150792B2 (en) 2002-10-15 2006-12-19 Kobe Steel, Ltd. Film deposition system and film deposition method using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6573814B2 (en) * 2015-10-13 2019-09-11 株式会社神戸製鋼所 Deposition equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55100973A (en) * 1979-01-23 1980-08-01 Ricoh Co Ltd Heating of base plate in vacuum deposition
JPS55159868U (en) * 1979-04-27 1980-11-17

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55100973A (en) * 1979-01-23 1980-08-01 Ricoh Co Ltd Heating of base plate in vacuum deposition
JPS55159868U (en) * 1979-04-27 1980-11-17

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7150792B2 (en) 2002-10-15 2006-12-19 Kobe Steel, Ltd. Film deposition system and film deposition method using the same

Also Published As

Publication number Publication date
JPH028022B2 (en) 1990-02-22

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