JPH0261629B2 - - Google Patents
Info
- Publication number
- JPH0261629B2 JPH0261629B2 JP59077897A JP7789784A JPH0261629B2 JP H0261629 B2 JPH0261629 B2 JP H0261629B2 JP 59077897 A JP59077897 A JP 59077897A JP 7789784 A JP7789784 A JP 7789784A JP H0261629 B2 JPH0261629 B2 JP H0261629B2
- Authority
- JP
- Japan
- Prior art keywords
- cryopanel
- exhaust
- cryopump
- condensing
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7789784A JPS60222572A (ja) | 1984-04-18 | 1984-04-18 | クライオポンプ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7789784A JPS60222572A (ja) | 1984-04-18 | 1984-04-18 | クライオポンプ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60222572A JPS60222572A (ja) | 1985-11-07 |
JPH0261629B2 true JPH0261629B2 (enrdf_load_stackoverflow) | 1990-12-20 |
Family
ID=13646864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7789784A Granted JPS60222572A (ja) | 1984-04-18 | 1984-04-18 | クライオポンプ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60222572A (enrdf_load_stackoverflow) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04103885A (ja) * | 1990-08-24 | 1992-04-06 | Daikin Ind Ltd | クライオポンプにおけるクライオパネル |
US5301511A (en) * | 1992-06-12 | 1994-04-12 | Helix Technology Corporation | Cryopump and cryopanel having frost concentrating device |
US6361618B1 (en) | 1994-07-20 | 2002-03-26 | Applied Materials, Inc. | Methods and apparatus for forming and maintaining high vacuum environments |
DE69510132T2 (de) * | 1994-07-20 | 2000-01-05 | Applied Materials, Inc. | Vakuumkammer für Ultrahochvakuumbehandlung bei hoher Temperatur |
US6109880A (en) * | 1994-10-31 | 2000-08-29 | Saes Pure Gas, Inc. | Getter pump module and system including focus shields |
US5972183A (en) * | 1994-10-31 | 1999-10-26 | Saes Getter S.P.A | Getter pump module and system |
US5911560A (en) * | 1994-10-31 | 1999-06-15 | Saes Pure Gas, Inc. | Getter pump module and system |
US5685963A (en) * | 1994-10-31 | 1997-11-11 | Saes Pure Gas, Inc. | In situ getter pump system and method |
US6142742A (en) * | 1994-10-31 | 2000-11-07 | Saes Pure Gas, Inc. | Getter pump module and system |
US6077404A (en) | 1998-02-17 | 2000-06-20 | Applied Material, Inc. | Reflow chamber and process |
JP4500265B2 (ja) | 2003-11-20 | 2010-07-14 | 住友重機械工業株式会社 | クライオポンプ |
US8197222B2 (en) | 2006-07-05 | 2012-06-12 | Von Ardenne Anlagentechnik Gmbh | Getter pump and vacuum coating installation comprising a getter pump |
GB2596832A (en) | 2020-07-08 | 2022-01-12 | Edwards Vacuum Llc | Cryopump |
GB2596831A (en) | 2020-07-08 | 2022-01-12 | Edwards Vacuum Llc | Cryopump |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60178982A (ja) * | 1984-02-27 | 1985-09-12 | Toshiba Corp | クライオポンプ |
-
1984
- 1984-04-18 JP JP7789784A patent/JPS60222572A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60222572A (ja) | 1985-11-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |