JPS6310310B2 - - Google Patents
Info
- Publication number
- JPS6310310B2 JPS6310310B2 JP8572083A JP8572083A JPS6310310B2 JP S6310310 B2 JPS6310310 B2 JP S6310310B2 JP 8572083 A JP8572083 A JP 8572083A JP 8572083 A JP8572083 A JP 8572083A JP S6310310 B2 JPS6310310 B2 JP S6310310B2
- Authority
- JP
- Japan
- Prior art keywords
- helium
- helium refrigerator
- refrigerator
- thin film
- shroud
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000001307 helium Substances 0.000 claims description 61
- 229910052734 helium Inorganic materials 0.000 claims description 61
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 61
- 239000010409 thin film Substances 0.000 claims description 33
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 29
- 239000007789 gas Substances 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 7
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 5
- 238000003860 storage Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 12
- 238000002360 preparation method Methods 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 238000009835 boiling Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
- F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8572083A JPS59211778A (ja) | 1983-05-18 | 1983-05-18 | 真空排気装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8572083A JPS59211778A (ja) | 1983-05-18 | 1983-05-18 | 真空排気装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59211778A JPS59211778A (ja) | 1984-11-30 |
| JPS6310310B2 true JPS6310310B2 (enrdf_load_stackoverflow) | 1988-03-05 |
Family
ID=13866671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8572083A Granted JPS59211778A (ja) | 1983-05-18 | 1983-05-18 | 真空排気装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59211778A (enrdf_load_stackoverflow) |
-
1983
- 1983-05-18 JP JP8572083A patent/JPS59211778A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59211778A (ja) | 1984-11-30 |
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