JPH0258766B2 - - Google Patents
Info
- Publication number
- JPH0258766B2 JPH0258766B2 JP56104453A JP10445381A JPH0258766B2 JP H0258766 B2 JPH0258766 B2 JP H0258766B2 JP 56104453 A JP56104453 A JP 56104453A JP 10445381 A JP10445381 A JP 10445381A JP H0258766 B2 JPH0258766 B2 JP H0258766B2
- Authority
- JP
- Japan
- Prior art keywords
- position detection
- wafer
- reticle
- detector
- projection device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 7
- 238000010894 electron beam technology Methods 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56104453A JPS587823A (ja) | 1981-07-06 | 1981-07-06 | アライメント方法およびその装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56104453A JPS587823A (ja) | 1981-07-06 | 1981-07-06 | アライメント方法およびその装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS587823A JPS587823A (ja) | 1983-01-17 |
| JPH0258766B2 true JPH0258766B2 (un) | 1990-12-10 |
Family
ID=14381032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56104453A Granted JPS587823A (ja) | 1981-07-06 | 1981-07-06 | アライメント方法およびその装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS587823A (un) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59161815A (ja) * | 1983-03-07 | 1984-09-12 | Nippon Kogaku Kk <Nikon> | 投影露光装置 |
| JPH0612751B2 (ja) * | 1983-03-17 | 1994-02-16 | 日本精工株式会社 | 露光装置における位置合わせ装置 |
| JPH0727853B2 (ja) * | 1983-08-10 | 1995-03-29 | 日本電信電話株式会社 | 縮小投影露光方法 |
| JPS6338353Y2 (un) * | 1984-12-26 | 1988-10-11 | ||
| JPS62199031A (ja) * | 1986-02-27 | 1987-09-02 | Rohm Co Ltd | 露光装置 |
| JPS62213123A (ja) * | 1986-03-14 | 1987-09-19 | Canon Inc | 照度分布測定方法および装置 |
| JPH10294268A (ja) * | 1997-04-16 | 1998-11-04 | Nikon Corp | 投影露光装置及び位置合わせ方法 |
| JP2002139847A (ja) * | 2000-10-31 | 2002-05-17 | Nikon Corp | 露光装置、露光方法及びデバイス製造方法 |
| TW200514138A (en) | 2003-10-09 | 2005-04-16 | Nippon Kogaku Kk | Exposure equipment and exposure method, manufacture method of component |
| NL2002998A1 (nl) * | 2008-06-18 | 2009-12-22 | Asml Netherlands Bv | Lithographic apparatus. |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5356975A (en) * | 1976-11-01 | 1978-05-23 | Hitachi Ltd | Exposure apparatus |
| JPS53144681A (en) * | 1977-05-20 | 1978-12-16 | Siemens Ag | Method of relatively positioning projecting mask and semiconductor wafer |
-
1981
- 1981-07-06 JP JP56104453A patent/JPS587823A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5356975A (en) * | 1976-11-01 | 1978-05-23 | Hitachi Ltd | Exposure apparatus |
| JPS53144681A (en) * | 1977-05-20 | 1978-12-16 | Siemens Ag | Method of relatively positioning projecting mask and semiconductor wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS587823A (ja) | 1983-01-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4741622A (en) | Method and apparatus for detecting diversion | |
| US4908656A (en) | Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision | |
| US6057908A (en) | Exposure condition measurement method | |
| JPS6358349A (ja) | 投影光学装置 | |
| KR101963012B1 (ko) | 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법 | |
| US5262822A (en) | Exposure method and apparatus | |
| US4614432A (en) | Pattern detector | |
| JPH0258766B2 (un) | ||
| JPS5994032A (ja) | 投影露光装置 | |
| KR100499188B1 (ko) | 투영노광방법및투영노광장치 | |
| JP4392914B2 (ja) | 面位置検出装置、露光装置、およびデバイス製造方法 | |
| TWI358529B (en) | Shape measuring apparatus, shape measuring method, | |
| JP3203676B2 (ja) | 投影露光装置 | |
| JP3428825B2 (ja) | 面位置検出方法および面位置検出装置 | |
| JPH06101427B2 (ja) | 露光装置 | |
| JPH06104158A (ja) | 位置検出装置 | |
| JPH07240367A (ja) | 投影露光装置 | |
| JPH06267824A (ja) | 露光方法 | |
| JPH09115820A (ja) | 走査型露光装置及び露光方法 | |
| JP3209189B2 (ja) | 露光装置及び方法 | |
| JPH10172900A (ja) | 露光装置 | |
| JP2006013266A (ja) | 計測方法、露光方法、及び露光装置 | |
| JPH0547631A (ja) | 半導体露光方法およびその装置 | |
| JP3209186B2 (ja) | 露光装置及び方法 | |
| JPS60238836A (ja) | パタ−ン検出方法と該方法を用いた投影光学装置 |