JPH0258766B2 - - Google Patents
Info
- Publication number
- JPH0258766B2 JPH0258766B2 JP56104453A JP10445381A JPH0258766B2 JP H0258766 B2 JPH0258766 B2 JP H0258766B2 JP 56104453 A JP56104453 A JP 56104453A JP 10445381 A JP10445381 A JP 10445381A JP H0258766 B2 JPH0258766 B2 JP H0258766B2
- Authority
- JP
- Japan
- Prior art keywords
- position detection
- wafer
- reticle
- detector
- projection device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 7
- 238000010894 electron beam technology Methods 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56104453A JPS587823A (ja) | 1981-07-06 | 1981-07-06 | アライメント方法およびその装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56104453A JPS587823A (ja) | 1981-07-06 | 1981-07-06 | アライメント方法およびその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS587823A JPS587823A (ja) | 1983-01-17 |
JPH0258766B2 true JPH0258766B2 (fr) | 1990-12-10 |
Family
ID=14381032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56104453A Granted JPS587823A (ja) | 1981-07-06 | 1981-07-06 | アライメント方法およびその装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS587823A (fr) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59161815A (ja) * | 1983-03-07 | 1984-09-12 | Nippon Kogaku Kk <Nikon> | 投影露光装置 |
JPH0612751B2 (ja) * | 1983-03-17 | 1994-02-16 | 日本精工株式会社 | 露光装置における位置合わせ装置 |
JPH0727853B2 (ja) * | 1983-08-10 | 1995-03-29 | 日本電信電話株式会社 | 縮小投影露光方法 |
JPS6338353Y2 (fr) * | 1984-12-26 | 1988-10-11 | ||
JPS62199031A (ja) * | 1986-02-27 | 1987-09-02 | Rohm Co Ltd | 露光装置 |
JPS62213123A (ja) * | 1986-03-14 | 1987-09-19 | Canon Inc | 照度分布測定方法および装置 |
JPH10294268A (ja) * | 1997-04-16 | 1998-11-04 | Nikon Corp | 投影露光装置及び位置合わせ方法 |
JP2002139847A (ja) * | 2000-10-31 | 2002-05-17 | Nikon Corp | 露光装置、露光方法及びデバイス製造方法 |
TW201738932A (zh) | 2003-10-09 | 2017-11-01 | Nippon Kogaku Kk | 曝光裝置及曝光方法、元件製造方法 |
NL2002998A1 (nl) * | 2008-06-18 | 2009-12-22 | Asml Netherlands Bv | Lithographic apparatus. |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5356975A (en) * | 1976-11-01 | 1978-05-23 | Hitachi Ltd | Exposure apparatus |
JPS53144681A (en) * | 1977-05-20 | 1978-12-16 | Siemens Ag | Method of relatively positioning projecting mask and semiconductor wafer |
-
1981
- 1981-07-06 JP JP56104453A patent/JPS587823A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5356975A (en) * | 1976-11-01 | 1978-05-23 | Hitachi Ltd | Exposure apparatus |
JPS53144681A (en) * | 1977-05-20 | 1978-12-16 | Siemens Ag | Method of relatively positioning projecting mask and semiconductor wafer |
Also Published As
Publication number | Publication date |
---|---|
JPS587823A (ja) | 1983-01-17 |
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