JPH0257974B2 - - Google Patents
Info
- Publication number
- JPH0257974B2 JPH0257974B2 JP57011205A JP1120582A JPH0257974B2 JP H0257974 B2 JPH0257974 B2 JP H0257974B2 JP 57011205 A JP57011205 A JP 57011205A JP 1120582 A JP1120582 A JP 1120582A JP H0257974 B2 JPH0257974 B2 JP H0257974B2
- Authority
- JP
- Japan
- Prior art keywords
- silane
- aqueous solution
- caustic soda
- waste gas
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Treating Waste Gases (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57011205A JPS58128146A (ja) | 1982-01-27 | 1982-01-27 | 吸収処理剤 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57011205A JPS58128146A (ja) | 1982-01-27 | 1982-01-27 | 吸収処理剤 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62293194A Division JPS63156537A (ja) | 1987-11-20 | 1987-11-20 | 揮発性無機水素化物および揮発性無機ハロゲン化物の吸収処理剤並びにその吸収処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58128146A JPS58128146A (ja) | 1983-07-30 |
JPH0257974B2 true JPH0257974B2 (enrdf_load_stackoverflow) | 1990-12-06 |
Family
ID=11771510
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57011205A Granted JPS58128146A (ja) | 1982-01-27 | 1982-01-27 | 吸収処理剤 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58128146A (enrdf_load_stackoverflow) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5949822A (ja) * | 1982-09-14 | 1984-03-22 | Nippon Sanso Kk | 揮発性無機水素化物等を含有するガスの処理方法 |
JPS60125233A (ja) * | 1983-12-08 | 1985-07-04 | Mitsui Toatsu Chem Inc | 排ガスの高度処理方法 |
JPS60175522A (ja) * | 1984-02-23 | 1985-09-09 | World Giken:Kk | 半導体生産工程中の廃ガス乾式処理組成物 |
JPS60187335A (ja) * | 1984-03-07 | 1985-09-24 | Nippon Sanso Kk | 粒状吸収処理剤 |
JPS6190726A (ja) * | 1984-10-12 | 1986-05-08 | Nippon Paionikusu Kk | 除去剤 |
JPS61129026A (ja) * | 1984-11-27 | 1986-06-17 | Nippon Paionikusu Kk | 排ガスの浄化方法 |
JPS6372338A (ja) * | 1986-09-16 | 1988-04-02 | Sadaka Sonobe | 有害ガス吸着剤 |
JPH0749093B2 (ja) * | 1987-02-28 | 1995-05-31 | 高純度シリコン株式会社 | 珪素化合物を含むガスの処理方法 |
JPS63156537A (ja) * | 1987-11-20 | 1988-06-29 | Nippon Sanso Kk | 揮発性無機水素化物および揮発性無機ハロゲン化物の吸収処理剤並びにその吸収処理方法 |
DE4243389A1 (de) * | 1992-12-21 | 1994-06-23 | Sued Chemie Ag | Verfahren zur Herstellung von Sorptionsmitteln zur Aufnahme von Flüssigkeiten |
US5858909A (en) * | 1996-09-27 | 1999-01-12 | W. R. Grace & Co.-Conn. | Siliceous oxide comprising an alkaline constituent |
PL343430A1 (en) * | 1998-04-09 | 2001-08-13 | Uhp Materials | Preparation and purification of diborane |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5067784A (enrdf_load_stackoverflow) * | 1973-10-23 | 1975-06-06 |
-
1982
- 1982-01-27 JP JP57011205A patent/JPS58128146A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58128146A (ja) | 1983-07-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0257974B2 (enrdf_load_stackoverflow) | ||
JPS6151935B2 (enrdf_load_stackoverflow) | ||
JPS6161619A (ja) | 排ガスの処理方法 | |
JPS6215246B2 (enrdf_load_stackoverflow) | ||
KR20010086217A (ko) | 할로겐계 배기가스 정화제 및 정화방법 | |
KR960010382B1 (ko) | 폐가스 처리방법 | |
JP2013138097A (ja) | 酸混合液の回収システム、酸混合液の回収方法、および、シリコン材料の洗浄方法 | |
JP3129945B2 (ja) | 半導体製造排ガスの処理方法 | |
TWI329530B (enrdf_load_stackoverflow) | ||
KR920007856B1 (ko) | 기체상태의 산성 할로겐 화합물의 제거방법 | |
JPH04210293A (ja) | 排水の水銀回収方法及び水銀回収装置 | |
JPH0494723A (ja) | フッ化塩素を含む排ガスの乾式処理方法 | |
JPS61101231A (ja) | フツ素ガスの除去方法 | |
JP4979160B2 (ja) | 脱硫化水素剤の再生処理方法 | |
JPH0378132B2 (enrdf_load_stackoverflow) | ||
JP3260825B2 (ja) | 有害ガスの浄化方法 | |
JPS60175522A (ja) | 半導体生産工程中の廃ガス乾式処理組成物 | |
JPH07213862A (ja) | 塩素含有ガスの処理方法 | |
JP2005169370A (ja) | 硫化水素を含有するガスの脱硫化水素処理剤および処理方法および処理装置 | |
JP2004181299A (ja) | ベントガスの除害方法 | |
JPS62176592A (ja) | 次亜塩素酸ナトリウム含有廃液の処理装置 | |
JP3265589B2 (ja) | 二硫化炭素の除去方法 | |
JP2767856B2 (ja) | 排ガス処理装置及び排ガスの処理方法 | |
JPH04210236A (ja) | ドライエッチング排ガスの処理剤 | |
JPH0457368B2 (enrdf_load_stackoverflow) |