JPH0257142B2 - - Google Patents

Info

Publication number
JPH0257142B2
JPH0257142B2 JP19957182A JP19957182A JPH0257142B2 JP H0257142 B2 JPH0257142 B2 JP H0257142B2 JP 19957182 A JP19957182 A JP 19957182A JP 19957182 A JP19957182 A JP 19957182A JP H0257142 B2 JPH0257142 B2 JP H0257142B2
Authority
JP
Japan
Prior art keywords
discharge
cathode
lab
current
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19957182A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5989762A (ja
Inventor
Joshin Uramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP19957182A priority Critical patent/JPS5989762A/ja
Publication of JPS5989762A publication Critical patent/JPS5989762A/ja
Publication of JPH0257142B2 publication Critical patent/JPH0257142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241—High voltage power supply or regulation circuits

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP19957182A 1982-11-12 1982-11-12 複合型ＬａＢ６陰極のための電源及びプラズマ生成方法 Granted JPS5989762A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19957182A JPS5989762A (ja) 1982-11-12 1982-11-12 複合型ＬａＢ６陰極のための電源及びプラズマ生成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19957182A JPS5989762A (ja) 1982-11-12 1982-11-12 複合型ＬａＢ６陰極のための電源及びプラズマ生成方法

Publications (2)

Publication Number Publication Date
JPS5989762A JPS5989762A (ja) 1984-05-24
JPH0257142B2 true JPH0257142B2 (enrdf_load_stackoverflow) 1990-12-04

Family

ID=16410040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19957182A Granted JPS5989762A (ja) 1982-11-12 1982-11-12 複合型ＬａＢ６陰極のための電源及びプラズマ生成方法

Country Status (1)

Country Link
JP (1) JPS5989762A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5086861B2 (ja) * 2008-03-28 2012-11-28 新明和工業株式会社 プラズマ装置
JP5357695B2 (ja) * 2009-10-20 2013-12-04 株式会社Ｓｕｍｃｏ 石英ガラスルツボ製造装置

Also Published As

Publication number Publication date
JPS5989762A (ja) 1984-05-24

Similar Documents

Publication Publication Date Title
CN110486243B (zh) 一种微阴极电弧推进系统
WO1994009560A1 (en) Energy conversion system
EP0358502A1 (en) Ballast circuit
JP3738712B2 (ja) 高圧放電灯点灯装置
CN108561283B (zh) 一种霍尔推力器点火装置及方法
JPH0257142B2 (enrdf_load_stackoverflow)
JPH07192882A (ja) 放電ランプ点弧点灯用回路装置
US1534251A (en) Electric light
JP3454388B2 (ja) イオンビーム発生装置のアーク放電方法
RU2094965C1 (ru) Система электропитания источника плазмы с безнакальным катодом-компенсатором
US2900548A (en) Plasma generator
JP3254819B2 (ja) イオン源装置
US2344086A (en) Welding control system
RU2775741C1 (ru) Цепь зажигания и поддержания электронного разряда для электрической двигательной установки, содержащей бесподогревный диспенсерный катод
KR102194893B1 (ko) 자기소호 코일의 구동회로 및 이를 구비한 직류차단기
JPS5856961B2 (ja) クウシンリアクトルツキデンリユウヘンカンキ
RU2395865C1 (ru) Устройство для электропитания накала катодов газоразрядной камеры стационарного ионного источника и способ его работы
JPH09512664A (ja) 直列動作アークランプの順次差動点弧
US2248625A (en) Electric valve control circuit
Prelec The BNL volume H− ion source
US2234117A (en) Welding control system
SU1450086A1 (ru) Генератор импульсов напр жени
JP4924793B2 (ja) アーク電気炉設備
SU886091A1 (ru) Индуктивный накопитель энергии
JPS6459747A (en) Ion beam shaping device