JPS5989762A - 複合型LaB6陰極のための電源及びプラズマ生成方法 - Google Patents

複合型LaB6陰極のための電源及びプラズマ生成方法

Info

Publication number
JPS5989762A
JPS5989762A JP19957182A JP19957182A JPS5989762A JP S5989762 A JPS5989762 A JP S5989762A JP 19957182 A JP19957182 A JP 19957182A JP 19957182 A JP19957182 A JP 19957182A JP S5989762 A JPS5989762 A JP S5989762A
Authority
JP
Japan
Prior art keywords
discharge
power source
cathode
power
ion plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19957182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0257142B2 (enrdf_load_stackoverflow
Inventor
Joshin Uramoto
上進 浦本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP19957182A priority Critical patent/JPS5989762A/ja
Publication of JPS5989762A publication Critical patent/JPS5989762A/ja
Publication of JPH0257142B2 publication Critical patent/JPH0257142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/24Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241High voltage power supply or regulation circuits

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP19957182A 1982-11-12 1982-11-12 複合型LaB6陰極のための電源及びプラズマ生成方法 Granted JPS5989762A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19957182A JPS5989762A (ja) 1982-11-12 1982-11-12 複合型LaB6陰極のための電源及びプラズマ生成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19957182A JPS5989762A (ja) 1982-11-12 1982-11-12 複合型LaB6陰極のための電源及びプラズマ生成方法

Publications (2)

Publication Number Publication Date
JPS5989762A true JPS5989762A (ja) 1984-05-24
JPH0257142B2 JPH0257142B2 (enrdf_load_stackoverflow) 1990-12-04

Family

ID=16410040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19957182A Granted JPS5989762A (ja) 1982-11-12 1982-11-12 複合型LaB6陰極のための電源及びプラズマ生成方法

Country Status (1)

Country Link
JP (1) JPS5989762A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009238670A (ja) * 2008-03-28 2009-10-15 Shinmaywa Industries Ltd プラズマ装置
JP2011088762A (ja) * 2009-10-20 2011-05-06 Japan Siper Quarts Corp 石英ガラスルツボ製造装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009238670A (ja) * 2008-03-28 2009-10-15 Shinmaywa Industries Ltd プラズマ装置
JP2011088762A (ja) * 2009-10-20 2011-05-06 Japan Siper Quarts Corp 石英ガラスルツボ製造装置

Also Published As

Publication number Publication date
JPH0257142B2 (enrdf_load_stackoverflow) 1990-12-04

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