JPS5989762A - 複合型LaB6陰極のための電源及びプラズマ生成方法 - Google Patents
複合型LaB6陰極のための電源及びプラズマ生成方法Info
- Publication number
- JPS5989762A JPS5989762A JP19957182A JP19957182A JPS5989762A JP S5989762 A JPS5989762 A JP S5989762A JP 19957182 A JP19957182 A JP 19957182A JP 19957182 A JP19957182 A JP 19957182A JP S5989762 A JPS5989762 A JP S5989762A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- power source
- cathode
- power
- ion plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007733 ion plating Methods 0.000 title abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 6
- 238000010891 electric arc Methods 0.000 abstract description 4
- 229910025794 LaB6 Inorganic materials 0.000 abstract 2
- 230000007704 transition Effects 0.000 description 6
- 230000005684 electric field Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
- H01J37/241—High voltage power supply or regulation circuits
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19957182A JPS5989762A (ja) | 1982-11-12 | 1982-11-12 | 複合型LaB6陰極のための電源及びプラズマ生成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19957182A JPS5989762A (ja) | 1982-11-12 | 1982-11-12 | 複合型LaB6陰極のための電源及びプラズマ生成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5989762A true JPS5989762A (ja) | 1984-05-24 |
JPH0257142B2 JPH0257142B2 (enrdf_load_stackoverflow) | 1990-12-04 |
Family
ID=16410040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19957182A Granted JPS5989762A (ja) | 1982-11-12 | 1982-11-12 | 複合型LaB6陰極のための電源及びプラズマ生成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5989762A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009238670A (ja) * | 2008-03-28 | 2009-10-15 | Shinmaywa Industries Ltd | プラズマ装置 |
JP2011088762A (ja) * | 2009-10-20 | 2011-05-06 | Japan Siper Quarts Corp | 石英ガラスルツボ製造装置 |
-
1982
- 1982-11-12 JP JP19957182A patent/JPS5989762A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009238670A (ja) * | 2008-03-28 | 2009-10-15 | Shinmaywa Industries Ltd | プラズマ装置 |
JP2011088762A (ja) * | 2009-10-20 | 2011-05-06 | Japan Siper Quarts Corp | 石英ガラスルツボ製造装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0257142B2 (enrdf_load_stackoverflow) | 1990-12-04 |
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