JPH0248425Y2 - - Google Patents
Info
- Publication number
- JPH0248425Y2 JPH0248425Y2 JP1985170698U JP17069885U JPH0248425Y2 JP H0248425 Y2 JPH0248425 Y2 JP H0248425Y2 JP 1985170698 U JP1985170698 U JP 1985170698U JP 17069885 U JP17069885 U JP 17069885U JP H0248425 Y2 JPH0248425 Y2 JP H0248425Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- disk
- hook
- vacuum evaporation
- flat surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007738 vacuum evaporation Methods 0.000 claims description 16
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 69
- 238000000151 deposition Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985170698U JPH0248425Y2 (US07582779-20090901-C00044.png) | 1985-11-05 | 1985-11-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985170698U JPH0248425Y2 (US07582779-20090901-C00044.png) | 1985-11-05 | 1985-11-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6279872U JPS6279872U (US07582779-20090901-C00044.png) | 1987-05-21 |
| JPH0248425Y2 true JPH0248425Y2 (US07582779-20090901-C00044.png) | 1990-12-19 |
Family
ID=31105656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985170698U Expired JPH0248425Y2 (US07582779-20090901-C00044.png) | 1985-11-05 | 1985-11-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0248425Y2 (US07582779-20090901-C00044.png) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5818711B2 (ja) * | 2012-02-14 | 2015-11-18 | 三菱電機株式会社 | ウェハ保持構造およびそれを備えた蒸着装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61194175A (ja) * | 1985-02-21 | 1986-08-28 | Murata Mfg Co Ltd | 薄膜形成装置 |
-
1985
- 1985-11-05 JP JP1985170698U patent/JPH0248425Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61194175A (ja) * | 1985-02-21 | 1986-08-28 | Murata Mfg Co Ltd | 薄膜形成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6279872U (US07582779-20090901-C00044.png) | 1987-05-21 |
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