JPH0247698B2 - - Google Patents

Info

Publication number
JPH0247698B2
JPH0247698B2 JP58249426A JP24942683A JPH0247698B2 JP H0247698 B2 JPH0247698 B2 JP H0247698B2 JP 58249426 A JP58249426 A JP 58249426A JP 24942683 A JP24942683 A JP 24942683A JP H0247698 B2 JPH0247698 B2 JP H0247698B2
Authority
JP
Japan
Prior art keywords
wavelength
characteristic
state
wavelengths
peak
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58249426A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60135850A (ja
Inventor
Hiroyoshi Soejima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP58249426A priority Critical patent/JPS60135850A/ja
Publication of JPS60135850A publication Critical patent/JPS60135850A/ja
Publication of JPH0247698B2 publication Critical patent/JPH0247698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP58249426A 1983-12-26 1983-12-26 状態マツプ方法及びその装置 Granted JPS60135850A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58249426A JPS60135850A (ja) 1983-12-26 1983-12-26 状態マツプ方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58249426A JPS60135850A (ja) 1983-12-26 1983-12-26 状態マツプ方法及びその装置

Publications (2)

Publication Number Publication Date
JPS60135850A JPS60135850A (ja) 1985-07-19
JPH0247698B2 true JPH0247698B2 (cs) 1990-10-22

Family

ID=17192792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58249426A Granted JPS60135850A (ja) 1983-12-26 1983-12-26 状態マツプ方法及びその装置

Country Status (1)

Country Link
JP (1) JPS60135850A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2536019B2 (ja) * 1988-02-17 1996-09-18 株式会社島津製作所 Ｘ線マイクロアナライザによる分析方法
US6787773B1 (en) * 2000-06-07 2004-09-07 Kla-Tencor Corporation Film thickness measurement using electron-beam induced x-ray microanalysis
JP7342629B2 (ja) * 2019-11-06 2023-09-12 株式会社島津製作所 試料成分推定方法、試料成分推定装置、試料成分推定プログラム、学習方法および学習プログラム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142551A (en) * 1981-02-27 1982-09-03 Nippon Steel Corp Determination of foreign matter in metal
JPS5814039A (ja) * 1981-07-17 1983-01-26 Seiko Instr & Electronics Ltd 電子ビ−ムマクロアナライザ装置

Also Published As

Publication number Publication date
JPS60135850A (ja) 1985-07-19

Similar Documents

Publication Publication Date Title
JP6769402B2 (ja) 電子線マイクロアナライザー及びデータ処理プログラム
US20080067379A1 (en) X-ray analyzer using electron beam
JP3461208B2 (ja) 試料に含まれる物質の同定方法および分布測定方法
CN1823270B (zh) 能量色散类型x射线衍射光谱仪
US6310935B1 (en) Fluorescent x-ray analyzer
US5418826A (en) Fluorescent X-ray qualitative analytical method
EP0204855B1 (en) Method and apparatus for state analysis
US4962516A (en) Method and apparatus for state analysis
JP2821656B2 (ja) 複数条件蛍光ｘ線定性分析方法
JPH0247698B2 (cs)
JP3160135B2 (ja) Ｘ線分析装置
Bergslien Portable X-ray fluorescence (PXRF) spectrometry of earth materials: considerations for forensic analysis
JPS5997044A (ja) 回折デ−タ及び分光写真デ−タの同時捕集装置
JP2006118941A (ja) 面分析データを表示する電子プローブｘ線分析装置
US6462340B1 (en) Device for measuring crystal orientation and crystal distortion in polycrystalline materials
US5049736A (en) Apparatus for measurement of geological age by measuring zirconium color
JP2002062270A (ja) 電子線を用いた表面分析装置における面分析データ表示方法
JP4486438B2 (ja) 波高分布表示機能を備えたｘ線分析装置
JP2568491B2 (ja) 定性分析装置
US5990480A (en) KLM marker display controller for EPMA or the like
JPH08201320A (ja) Ｘ線分析装置
JP2645226B2 (ja) 蛍光ｘ線分析方法
JP3312001B2 (ja) 蛍光ｘ線分析装置
JP2645227B2 (ja) 蛍光ｘ線分析方法
JPS62285048A (ja) 元素濃度分布測定方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees