JPH0246668B2 - - Google Patents

Info

Publication number
JPH0246668B2
JPH0246668B2 JP57045710A JP4571082A JPH0246668B2 JP H0246668 B2 JPH0246668 B2 JP H0246668B2 JP 57045710 A JP57045710 A JP 57045710A JP 4571082 A JP4571082 A JP 4571082A JP H0246668 B2 JPH0246668 B2 JP H0246668B2
Authority
JP
Japan
Prior art keywords
substrate
processed
vacuum container
metal compound
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57045710A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58164777A (ja
Inventor
Takeshi Yasui
Masahiko Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP4571082A priority Critical patent/JPS58164777A/ja
Publication of JPS58164777A publication Critical patent/JPS58164777A/ja
Publication of JPH0246668B2 publication Critical patent/JPH0246668B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP4571082A 1982-03-24 1982-03-24 金属化合物被膜の形成方法 Granted JPS58164777A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4571082A JPS58164777A (ja) 1982-03-24 1982-03-24 金属化合物被膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4571082A JPS58164777A (ja) 1982-03-24 1982-03-24 金属化合物被膜の形成方法

Publications (2)

Publication Number Publication Date
JPS58164777A JPS58164777A (ja) 1983-09-29
JPH0246668B2 true JPH0246668B2 (enrdf_load_stackoverflow) 1990-10-16

Family

ID=12726901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4571082A Granted JPS58164777A (ja) 1982-03-24 1982-03-24 金属化合物被膜の形成方法

Country Status (1)

Country Link
JP (1) JPS58164777A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5953837U (ja) * 1982-09-27 1984-04-09 光洋機械産業株式会社 セメントペ−スト用のミキサ−
JPS6328871A (ja) * 1986-07-22 1988-02-06 Toshiba Corp プラズマｃｖｄ処理装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2811942C2 (de) * 1977-03-23 1986-09-18 Vide et Traitement S.A., Neuilly-en-Thelle Ofen zur ionischen Nitrierbehandlung von metallischen Werkstücken

Also Published As

Publication number Publication date
JPS58164777A (ja) 1983-09-29

Similar Documents

Publication Publication Date Title
GB2055403A (en) Method for depositing hard wear-resistant coatings on substrates
JPS61295377A (ja) 薄膜形成方法
JPS62294163A (ja) 低接触低抗組成物及びその製造方法
JPS61214312A (ja) 電気接触部材用複合体およびその製法
WO1995016058A1 (en) Magnetron sputtering apparatus for compound thin films
US3243363A (en) Method of producing metallic and dielectric deposits by electro-chemical means
JPH02247393A (ja) 耐久性電解用電極及びその製造方法
EP0064884A1 (en) Method and apparatus for coating by glow discharge
US3321337A (en) Process for preparing boron nitride coatings
US3564565A (en) Process for adherently applying boron nitride to copper and article of manufacture
EP0068464B1 (en) Method for forming a decorative metallic nitride coating
US3239368A (en) Method of preparing thin films on substrates by an electrical discharge
JPH0246668B2 (enrdf_load_stackoverflow)
US3481854A (en) Preparation of thin cermet films by radio frequency sputtering
US1019394A (en) Reduction of chemical compounds.
JPS58174569A (ja) 金属化合物被膜の形成方法
JPS6134507B2 (enrdf_load_stackoverflow)
JPH0387373A (ja) プラズマｃｖｄ薄膜の形成法
JPS5848664A (ja) 被覆方法および被覆物
US3344055A (en) Apparatus for polymerizing and forming thin continuous films using a glow discharge
JPS6134506B2 (enrdf_load_stackoverflow)
JP2646582B2 (ja) プラズマｃｖｄ装置
JP6797068B2 (ja) 原子層堆積法による炭化チタン含有薄膜の製造方法
JPH03267361A (ja) 硬質被膜とその製造方法
JPH02115359A (ja) 化合物薄膜作成方法および装置