Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone CorpfiledCriticalNippon Telegraph and Telephone Corp
Priority to JP59138927ApriorityCriticalpatent/JPS6119147A/ja
Publication of JPS6119147ApublicationCriticalpatent/JPS6119147A/ja
Publication of JPH0244142B2publicationCriticalpatent/JPH0244142B2/ja
Method of selectively exposing the sidewalls of a trench and its use to the forming of a metal silicide substrate contact for dielectric filled deep trench isolated devices