JPH0240371B2 - - Google Patents

Info

Publication number
JPH0240371B2
JPH0240371B2 JP57148992A JP14899282A JPH0240371B2 JP H0240371 B2 JPH0240371 B2 JP H0240371B2 JP 57148992 A JP57148992 A JP 57148992A JP 14899282 A JP14899282 A JP 14899282A JP H0240371 B2 JPH0240371 B2 JP H0240371B2
Authority
JP
Japan
Prior art keywords
gas
reaction
reaction chamber
reaction gas
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57148992A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5939339A (ja
Inventor
Shinji Nishiura
Masakazu Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Corporate Research and Development Ltd
Priority to JP14899282A priority Critical patent/JPS5939339A/ja
Publication of JPS5939339A publication Critical patent/JPS5939339A/ja
Publication of JPH0240371B2 publication Critical patent/JPH0240371B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP14899282A 1982-08-27 1982-08-27 気相成長反応装置 Granted JPS5939339A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14899282A JPS5939339A (ja) 1982-08-27 1982-08-27 気相成長反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14899282A JPS5939339A (ja) 1982-08-27 1982-08-27 気相成長反応装置

Publications (2)

Publication Number Publication Date
JPS5939339A JPS5939339A (ja) 1984-03-03
JPH0240371B2 true JPH0240371B2 (cs) 1990-09-11

Family

ID=15465274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14899282A Granted JPS5939339A (ja) 1982-08-27 1982-08-27 気相成長反応装置

Country Status (1)

Country Link
JP (1) JPS5939339A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9162209B2 (en) * 2012-03-01 2015-10-20 Novellus Systems, Inc. Sequential cascading of reaction volumes as a chemical reuse strategy
JP5867204B2 (ja) * 2012-03-16 2016-02-24 株式会社アルバック 真空処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA752827B (en) * 1974-05-20 1976-04-28 Univ Leeds Ind Service Ltd Improvements in or relating to the production of nitric acid
JPS51131813A (en) * 1975-05-07 1976-11-16 Mitsubishi Gas Chem Co Inc Process for methanol production

Also Published As

Publication number Publication date
JPS5939339A (ja) 1984-03-03

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