JPH0239086B2 - - Google Patents

Info

Publication number
JPH0239086B2
JPH0239086B2 JP60213129A JP21312985A JPH0239086B2 JP H0239086 B2 JPH0239086 B2 JP H0239086B2 JP 60213129 A JP60213129 A JP 60213129A JP 21312985 A JP21312985 A JP 21312985A JP H0239086 B2 JPH0239086 B2 JP H0239086B2
Authority
JP
Japan
Prior art keywords
resist film
light
processing chamber
vacuum processing
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60213129A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6272127A (ja
Inventor
Kazutoshi Oota
Eiichi Hoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60213129A priority Critical patent/JPS6272127A/ja
Publication of JPS6272127A publication Critical patent/JPS6272127A/ja
Publication of JPH0239086B2 publication Critical patent/JPH0239086B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60213129A 1985-09-25 1985-09-25 パタ−ン形成方法 Granted JPS6272127A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60213129A JPS6272127A (ja) 1985-09-25 1985-09-25 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60213129A JPS6272127A (ja) 1985-09-25 1985-09-25 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6272127A JPS6272127A (ja) 1987-04-02
JPH0239086B2 true JPH0239086B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-09-04

Family

ID=16634057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60213129A Granted JPS6272127A (ja) 1985-09-25 1985-09-25 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6272127A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2717855B2 (ja) * 1989-07-11 1998-02-25 東京エレクトロン株式会社 アッシング方法
JPH03154330A (ja) * 1989-11-13 1991-07-02 Matsushita Electron Corp 半導体装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933971B2 (ja) * 1975-08-01 1984-08-20 株式会社日立製作所 回路パタ−ン形成方法及びその装置
JPS57162330A (en) * 1981-03-31 1982-10-06 Kazuyuki Sugita Dry formation of pattern or dry removal of resist pattern

Also Published As

Publication number Publication date
JPS6272127A (ja) 1987-04-02

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