JPH0238942B2 - - Google Patents

Info

Publication number
JPH0238942B2
JPH0238942B2 JP54062226A JP6222679A JPH0238942B2 JP H0238942 B2 JPH0238942 B2 JP H0238942B2 JP 54062226 A JP54062226 A JP 54062226A JP 6222679 A JP6222679 A JP 6222679A JP H0238942 B2 JPH0238942 B2 JP H0238942B2
Authority
JP
Japan
Prior art keywords
developer
xylene
butyl acetate
solution
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP54062226A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55155353A (en
Inventor
Akira Yokota
Shingo Asaumi
Hisashi Nakane
Uichi Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP6222679A priority Critical patent/JPS55155353A/ja
Publication of JPS55155353A publication Critical patent/JPS55155353A/ja
Publication of JPH0238942B2 publication Critical patent/JPH0238942B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6222679A 1979-05-22 1979-05-22 Developer composition Granted JPS55155353A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6222679A JPS55155353A (en) 1979-05-22 1979-05-22 Developer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6222679A JPS55155353A (en) 1979-05-22 1979-05-22 Developer composition

Publications (2)

Publication Number Publication Date
JPS55155353A JPS55155353A (en) 1980-12-03
JPH0238942B2 true JPH0238942B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-09-03

Family

ID=13194023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6222679A Granted JPS55155353A (en) 1979-05-22 1979-05-22 Developer composition

Country Status (1)

Country Link
JP (1) JPS55155353A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56101148A (en) * 1980-01-16 1981-08-13 Toshiba Corp Photoresist developing method
JPS592043A (ja) * 1982-06-29 1984-01-07 Fujitsu Ltd フオトレジストの現像方法
JPS6043826A (ja) * 1983-08-19 1985-03-08 Rohm Co Ltd 半導体装置の製造方法
JP2000292938A (ja) 1999-04-09 2000-10-20 Fujitsu Ltd レジストパターン現像液及び形成方法、並びにそれらを使用して製造されたフォトマスク

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
DE2817256A1 (de) * 1977-05-06 1978-11-09 Allied Chem Verfahren zur entwicklung einer mit fotoaetzgrund bedeckten flaeche

Also Published As

Publication number Publication date
JPS55155353A (en) 1980-12-03

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