JPH0238928Y2 - - Google Patents
Info
- Publication number
- JPH0238928Y2 JPH0238928Y2 JP1982187350U JP18735082U JPH0238928Y2 JP H0238928 Y2 JPH0238928 Y2 JP H0238928Y2 JP 1982187350 U JP1982187350 U JP 1982187350U JP 18735082 U JP18735082 U JP 18735082U JP H0238928 Y2 JPH0238928 Y2 JP H0238928Y2
- Authority
- JP
- Japan
- Prior art keywords
- cylindrical chamber
- workpiece
- rail
- chamber
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Landscapes
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18735082U JPS5991361U (ja) | 1982-12-12 | 1982-12-12 | 被膜蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18735082U JPS5991361U (ja) | 1982-12-12 | 1982-12-12 | 被膜蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5991361U JPS5991361U (ja) | 1984-06-21 |
| JPH0238928Y2 true JPH0238928Y2 (enrdf_load_stackoverflow) | 1990-10-19 |
Family
ID=30404430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18735082U Granted JPS5991361U (ja) | 1982-12-12 | 1982-12-12 | 被膜蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5991361U (enrdf_load_stackoverflow) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU507748B2 (en) * | 1976-06-10 | 1980-02-28 | University Of Sydney, The | Reactive sputtering |
| JPS5917192B2 (ja) * | 1980-08-05 | 1984-04-19 | 日本真空技術株式会社 | 真空処理装置 |
| JPS5912867U (ja) * | 1982-07-19 | 1984-01-26 | 富士電機株式会社 | 電子写真用感光体製造装置 |
-
1982
- 1982-12-12 JP JP18735082U patent/JPS5991361U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5991361U (ja) | 1984-06-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6641702B2 (en) | Sputtering device | |
| US4692233A (en) | Vacuum coating apparatus | |
| GB2150600A (en) | Improvements in or relating to coating apparatus | |
| US20080217170A1 (en) | Sputtering system | |
| JP2000054131A (ja) | 真空室内の基板をコ―ティングするための装置 | |
| US3407783A (en) | Vapor deposition apparatus | |
| JPH0238928Y2 (enrdf_load_stackoverflow) | ||
| US20050172898A1 (en) | Web coating apparatus with a vacuum chamber and a coating cylinder | |
| JPH05190464A (ja) | 気相成長装置 | |
| JPH09246192A (ja) | 薄膜気相成長装置 | |
| US4051010A (en) | Sputtering apparatus | |
| GB2310434A (en) | Cathode sputtering | |
| US4472453A (en) | Process for radiation free electron beam deposition | |
| JPH0238927Y2 (enrdf_load_stackoverflow) | ||
| JPH11350136A (ja) | 真空成膜装置 | |
| JPS6214218B2 (enrdf_load_stackoverflow) | ||
| JPS62167882A (ja) | 移動電極式コ−テイング方法 | |
| JPS5970764A (ja) | プラズマｃｖｄ装置 | |
| JPH06306600A (ja) | 冷却機構を備えた粉末コーティング装置 | |
| JPS61288064A (ja) | イオンビ−ムアシスト成膜装置 | |
| JPH01208449A (ja) | ダブルチャンバ真空成膜装置 | |
| JP2963145B2 (ja) | Ｃｖｄ膜の形成方法及び形成装置 | |
| JPS6320464A (ja) | 真空蒸着装置 | |
| JP2001049432A (ja) | ワーク移動式反応性スパッタ装置とワーク移動式反応性スパッタ方法 | |
| JPS6141764A (ja) | 真空ア−ク反応性蒸着法及びその蒸着装置 |